C07C321/24

URAT1 INHIBITOR

Provided are a compound represented by the following Formula (III), a tautomer or stereoisomer of the compound, or a pharmaceutically acceptable salt or solvate thereof used as a therapeutic agent for gout or hyperuricemia. (In the Formula (III), R.sup.1a, R.sup.2a, R.sup.6a, and R.sup.7a represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, or a cyano group, R.sup.3a and R.sup.8a form a benzene ring or a 5-membered heteroaryl ring containing 1 to 3 heteroatoms, as a ring constituent element, selected from nitrogen atoms, oxygen atoms, and sulfur atoms together with two carbon atoms to which R.sup.3a and R.sup.8a are bonded, R.sup.4a and R.sup.5a form a benzene ring together with two carbon atoms to which R.sup.4a and R.sup.5a are bonded or represent any of the groups represented by R.sup.1a described above, W.sup.a represents CR.sup.10a or N, and where, R.sup.10a represents any of the groups represented by R.sup.1a, X.sup.a represents an oxygen atom or a sulfur atom, Y.sup.a represents an alkylene chain having 1 to 8 carbon atoms, and where, the alkylene chain may be substituted with an alkyl group having 1 to 8 carbon atoms and the alkylene chain may be a linear or branched alkylene chain, the branched alkylene chain may have a 3- to 7-membered ring formed by side chains bonded to carbon atoms which are the same as or different from each other, together with the carbon atoms to which the side chains are bonded and may have a double bond in the middle thereof, and Z.sup.a represents CO.sub.2H.)

##STR00001##

Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound

A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND
20190121233 · 2019-04-25 ·

A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of footing in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

URAT1 inhibitor

Provided are a compound represented by the following Formula (III), a tautomer or stereoisomer of the compound, or a pharmaceutically acceptable salt or solvate thereof used as a therapeutic agent for gout or hyperuricemia. (In the Formula (III), R.sup.1a, R.sup.2a, R.sup.6a, and R.sup.7a represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, or a cyano group, R.sup.3a and R.sup.8a form a benzene ring or a 5-membered heteroaryl ring containing 1 to 3 heteroatoms, as a ring constituent element, selected from nitrogen atoms, oxygen atoms, and sulfur atoms together with two carbon atoms to which R.sup.3a and R.sup.8a are bonded, R.sup.4a and R.sup.5a form a benzene ring together with two carbon atoms to which R.sup.4a and R.sup.5a are bonded or represent any of the groups represented by R.sup.1a described above, W.sup.a represents CR.sup.10a or N, and where, R.sup.10a represents any of the groups represented by R.sup.1a, X.sup.a represents an oxygen atom or a sulfur atom, Y.sup.a represents an alkylene chain having 1 to 8 carbon atoms, and where, the alkylene chain may be substituted with an alkyl group having 1 to 8 carbon atoms and the alkylene chain may be a linear or branched alkylene chain, the branched alkylene chain may have a 3- to 7-membered ring formed by side chains bonded to carbon atoms which are the same as or different from each other, together with the carbon atoms to which the side chains are bonded and may have a double bond in the middle thereof, and Z.sup.a represents CO.sub.2H). ##STR00001##

URAT1 inhibitor

Provided are a compound represented by the following Formula (III), a tautomer or stereoisomer of the compound, or a pharmaceutically acceptable salt or solvate thereof used as a therapeutic agent for gout or hyperuricemia. (In the Formula (III), R.sup.1a, R.sup.2a, R.sup.6a, and R.sup.7a represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, or a cyano group, R.sup.3a and R.sup.8a form a benzene ring or a 5-membered heteroaryl ring containing 1 to 3 heteroatoms, as a ring constituent element, selected from nitrogen atoms, oxygen atoms, and sulfur atoms together with two carbon atoms to which R.sup.3a and R.sup.8a are bonded, R.sup.4a and R.sup.5a form a benzene ring together with two carbon atoms to which R.sup.4a and R.sup.5a are bonded or represent any of the groups represented by R.sup.1a described above, W.sup.a represents CR.sup.10a or N, and where, R.sup.10a represents any of the groups represented by R.sup.1a, X.sup.a represents an oxygen atom or a sulfur atom, Y.sup.a represents an alkylene chain having 1 to 8 carbon atoms, and where, the alkylene chain may be substituted with an alkyl group having 1 to 8 carbon atoms and the alkylene chain may be a linear or branched alkylene chain, the branched alkylene chain may have a 3- to 7-membered ring formed by side chains bonded to carbon atoms which are the same as or different from each other, together with the carbon atoms to which the side chains are bonded and may have a double bond in the middle thereof, and Z.sup.a represents CO.sub.2H). ##STR00001##

PROCESS FOR OXIDIZING ONE OR MORE THIOL COMPOUNDS AND SUBSEQUENT SEPARATION IN A SINGLE VESSEL
20180170864 · 2018-06-21 ·

One exemplary embodiment can be a process for oxidizing one or more thiol compounds from an alkaline stream. The process may include passing a mixed stream having the alkaline stream to a vessel having an oxidation section, a separation section and a vent gas section. Often, the oxidation section includes a body containing one or more packing elements. The process can further include passing an oxidized alkaline stream to the separation section containing a first chamber and a second chamber. Usually, the first chamber contains a coated mesh and packing. The two sections further form a neck contains a packing, a distributor, and a mesh.