Patent classifications
C07C327/24
Process for the preparation of apalutamide
The present invention relates to a process for the preparation of Apalutamide of formula (A) Apalutamide is a latest-generation androgen receptor inhibitor, used to treat non-metastatic castration-resistant prostate cancer. ##STR00001##
Process for the preparation of apalutamide
The present invention relates to a process for the preparation of Apalutamide of formula (A) Apalutamide is a latest-generation androgen receptor inhibitor, used to treat non-metastatic castration-resistant prostate cancer. ##STR00001##
PROCESS FOR THE PREPARATION OF APALUTAMIDE
The present invention relates to a process for the preparation of Apalutamide of formula (A) Apalutamide is a latest-generation androgen receptor inhibitor, used to treat non-metastatic castration-resistant prostate cancer.
##STR00001##
PROCESS FOR THE PREPARATION OF APALUTAMIDE
The present invention relates to a process for the preparation of Apalutamide of formula (A) Apalutamide is a latest-generation androgen receptor inhibitor, used to treat non-metastatic castration-resistant prostate cancer.
##STR00001##
Method for producing carboxylic acid thioester
According to the present invention, there is provided a method for producing carboxylic acid thioester, comprising reacting a compound represented by the following formula (I), carboxylic acid and thiol in the presence of a catalyst including at least one Group 2 metal compound. The production method is a production method which is simple in reaction operation, which places a small load on the environment and the human body and which enables carboxylic acid thioester to be catalytically obtained at a high yield even at a normal temperature and a normal pressure (25 C., 1 atm). In the formula (I), R.sup.1 and R.sup.2 each independently represent a hydrocarbon group having 1 to 20 carbon atoms. ##STR00001##
Method for producing carboxylic acid thioester
According to the present invention, there is provided a method for producing carboxylic acid thioester, comprising reacting a compound represented by the following formula (I), carboxylic acid and thiol in the presence of a catalyst including at least one Group 2 metal compound. The production method is a production method which is simple in reaction operation, which places a small load on the environment and the human body and which enables carboxylic acid thioester to be catalytically obtained at a high yield even at a normal temperature and a normal pressure (25 C., 1 atm). In the formula (I), R.sup.1 and R.sup.2 each independently represent a hydrocarbon group having 1 to 20 carbon atoms. ##STR00001##
Method for Producing Carboxylic Acid Thioester
According to the present invention, there is provided a method for producing carboxylic acid thioester, comprising reacting a compound represented by the following formula (I), carboxylic acid and thiol in the presence of a catalyst including at least one Group 2 metal compound. The production method is a production method which is simple in reaction operation, which places a small load on the environment and the human body and which enables carboxylic acid thioester to be catalytically obtained at a high yield even at a normal temperature and a normal pressure (25 C., 1 atm). In the formula (I), R.sup.1 and R.sup.2 each independently represent a hydrocarbon group having 1 to 20 carbon atoms.
##STR00001##
Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device
Provided is an active light sensitive or radiation sensitive resin composition which contains a compound (A) represented by General Formula (I) or (II): ##STR00001##
in the formulae, each of Y.sub.1 and Y.sub.2 represents a monovalent organic group; each of M.sub.1.sup.+ and M.sub.2.sup.+ represents an organic onium ion; each of X.sub.1 and X.sub.2 represents a group that is represented by S, NH, or NR.sup.1; R.sup.1 represents a monovalent organic group; each of n1 and n2 represents an integer of 1 or more; and R.sup.1 and Y.sub.1 or Y.sub.2 may bond with each other to form a ring.
Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device
Provided is an active light sensitive or radiation sensitive resin composition which contains a compound (A) represented by General Formula (I) or (II): ##STR00001##
in the formulae, each of Y.sub.1 and Y.sub.2 represents a monovalent organic group; each of M.sub.1.sup.+ and M.sub.2.sup.+ represents an organic onium ion; each of X.sub.1 and X.sub.2 represents a group that is represented by S, NH, or NR.sup.1; R.sup.1 represents a monovalent organic group; each of n1 and n2 represents an integer of 1 or more; and R.sup.1 and Y.sub.1 or Y.sub.2 may bond with each other to form a ring.
SINGLE-MOLECULE PEPTIDE SEQUENCING USING XANTHATE AMINO ACID REACTIVE GROUPS
The present disclosure provides reagents and methods useful for single-molecule sequencing of proteins through use of a unique sequencing reagent comprising a xanthate group. The reagents and methods described herein provide for high-throughput single-molecule peptide and protein sequencing in mild conditions allowing for high resolution investigation of the complex biological systems.