Patent classifications
C07C53/18
2-(PYRAZIN-2-YLCARBONYLAMINOMETHYL) BENZIMIDAZOLIUM COMPOUNDS AS EPITHELIAL SODIUM CHANNEL INHIBITORS
The present invention relates to compounds of formula (I) or the tautomers or pharmacologically acceptable acid addition salts thereof, characterized by a topological polar surface area value (TPSA) of at least 145, wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, X, and Z.sup.− have one of the meanings as defined in the specification, to the use of compounds of formula (I) as medicaments, to pharmaceutical compositions comprising at least one compound of formula (I), as well as to medicament combinations containing one or more compounds of formula (I). The compounds are ENaC inhibitors useful for the treatment of respiratory diseases and allergic diseases of the airways.
##STR00001##
2-(PYRAZIN-2-YLCARBONYLAMINOMETHYL) BENZIMIDAZOLIUM COMPOUNDS AS EPITHELIAL SODIUM CHANNEL INHIBITORS
The present invention relates to compounds of formula (I) or the tautomers or pharmacologically acceptable acid addition salts thereof, characterized by a topological polar surface area value (TPSA) of at least 145, wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, X, and Z.sup.− have one of the meanings as defined in the specification, to the use of compounds of formula (I) as medicaments, to pharmaceutical compositions comprising at least one compound of formula (I), as well as to medicament combinations containing one or more compounds of formula (I). The compounds are ENaC inhibitors useful for the treatment of respiratory diseases and allergic diseases of the airways.
##STR00001##
Radio-protective and chemo-protective substituted thiols
The present disclosure relates to prodrugs, double prodrugs, derivatives and analogues of 3-(methylamino)-2-((methylamino)methyl)propane-1-thiol. The compounds of this disclosure also relate to ##STR00001##
The use of these compounds as radio— and chemo—protectors is also described.
RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
A resist topcoat composition includes an acrylic polymer including a structural unit containing a hydroxy group and a fluorine; a mixture including a sulfonic acid compound containing at least one fluorine and a carboxylic acid compound containing at least one fluorine in a weight ratio of about 1:0.1 to about 1:50; and a solvent. A method of forming patterns uses the resist topcoat composition to form a topcoat over a patterned substrate.
RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
A resist topcoat composition includes an acrylic polymer including a structural unit containing a hydroxy group and a fluorine; a mixture including a sulfonic acid compound containing at least one fluorine and a carboxylic acid compound containing at least one fluorine in a weight ratio of about 1:0.1 to about 1:50; and a solvent. A method of forming patterns uses the resist topcoat composition to form a topcoat over a patterned substrate.
Nitrogen-containing Derivative of Substituted Phenol Hydroxy Acid Ester, and Preparation and Use Thereof
A nitrogen-containing derivative of substituted phenol hydroxyl acid ester is represented by formula (I). A salt of the compound of formula (I) has good water solubility, and in vivo, can rapidly and completely release substituted phenols having a pharmacological effect, which can improve the water solubility of substituted phenols, rapidly exert the pharmacological effects of substituted phenols in vivo, and has good safety. The method for preparing the above-mentioned compound is provided. This compound can also be used in the preparation of drugs that produce anaesthesia and/or sedative and hypnotic effects on humans and animals.
##STR00001##
Substituted imidazo[4,5-c]pyridine compounds and compositions thereof
Compound of formula (I) or a pharmaceutically acceptable salt, or N-oxide thereof, that are inhibitors of SSAO activity: ##STR00001##
where V, W, X, Y, Z, R.sup.1, and R.sup.3 are as defined herein.
Substituted imidazo[4,5-c]pyridine compounds and compositions thereof
Compound of formula (I) or a pharmaceutically acceptable salt, or N-oxide thereof, that are inhibitors of SSAO activity: ##STR00001##
where V, W, X, Y, Z, R.sup.1, and R.sup.3 are as defined herein.
INTEGRATED PROCESS FOR GENERATING ACID ANHYDRIDES
Provided is a first process of producing an anhydride of an organic mono-acid comprising performing a transanhydridization reaction of an organic mono-acid and a thermally regenerable anhydride to produce the anhydride of the organic mono-acid and an acid of the thermally regenerable anhydride, wherein at least one of the organic mono-acid and thermally regenerable anhydride is provided by a preprocess that is integrated with the first process. An anhydride production system that is integrated with at least one preprocess, a wood acetylation process coupled to an acetic anhydride production process, a process of supplying an acetic acid reactant feed to a transanhydridization reaction unit, and an integrated wood acetylation and anhydride production system also are provided.
INTEGRATED PROCESS FOR GENERATING ACID ANHYDRIDES
Provided is a first process of producing an anhydride of an organic mono-acid comprising performing a transanhydridization reaction of an organic mono-acid and a thermally regenerable anhydride to produce the anhydride of the organic mono-acid and an acid of the thermally regenerable anhydride, wherein at least one of the organic mono-acid and thermally regenerable anhydride is provided by a preprocess that is integrated with the first process. An anhydride production system that is integrated with at least one preprocess, a wood acetylation process coupled to an acetic anhydride production process, a process of supplying an acetic acid reactant feed to a transanhydridization reaction unit, and an integrated wood acetylation and anhydride production system also are provided.