C07C59/115

Radiation-sensitive resin composition and resist pattern-forming method

A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R.sup.1, R.sup.2, and R.sup.3 represents a fluorine atom or the like; and R.sup.4 and R.sup.5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R.sup.6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R.sup.6s represents a fluorine atom or the like; and R.sup.8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms. ##STR00001##

Radiation-sensitive resin composition and resist pattern-forming method

A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R.sup.1, R.sup.2, and R.sup.3 represents a fluorine atom or the like; and R.sup.4 and R.sup.5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R.sup.6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R.sup.6s represents a fluorine atom or the like; and R.sup.8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms. ##STR00001##

[18F]-labelled lactate derivative as PET radiotracer

A positron emission tomography (PET) radiotracer for imaging lactate uptake, wherein the tracer is [.sup.18F]-3-fluoro-2-hydroxypropionic acid, or a pharmaceutical acceptable salt and/or solvate thereof. Also, a process for the radiosynthesis of [.sup.18F]-3-fluoro-2-hydroxypropionic acid, or a pharmaceutical acceptable salt and/or solvate thereof. Further, the use of [.sup.18F]-3-fluoro-2-hydroxypropionic acid, or a pharmaceutical acceptable salt and/or solvate thereof, for imaging lactate uptake in living cells, especially in humans.

[18F]-labelled lactate derivative as PET radiotracer

A positron emission tomography (PET) radiotracer for imaging lactate uptake, wherein the tracer is [.sup.18F]-3-fluoro-2-hydroxypropionic acid, or a pharmaceutical acceptable salt and/or solvate thereof. Also, a process for the radiosynthesis of [.sup.18F]-3-fluoro-2-hydroxypropionic acid, or a pharmaceutical acceptable salt and/or solvate thereof. Further, the use of [.sup.18F]-3-fluoro-2-hydroxypropionic acid, or a pharmaceutical acceptable salt and/or solvate thereof, for imaging lactate uptake in living cells, especially in humans.

NOVEL CARBOXYLIC ACID ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS

A carboxylic acid onium salt of formula (1) exerts a satisfactory acid diffusion control (or quencher) function. A resist composition comprising the carboxylic acid onium salt can be processed by DUV or EUV lithography to form a resist pattern with improved resolution, reduced LWR and minimal defects after development.

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NOVEL CARBOXYLIC ACID ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS

A carboxylic acid onium salt of formula (1) exerts a satisfactory acid diffusion control (or quencher) function. A resist composition comprising the carboxylic acid onium salt can be processed by DUV or EUV lithography to form a resist pattern with improved resolution, reduced LWR and minimal defects after development.

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RESIST COMPOSITION AND PATTERNING PROCESS

A resist composition is provided comprising a base polymer and a quencher comprising a cyclic ammonium salt having a fluorinated saturated hydrocarbyl group or fluorinated aryl group. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

RESIST COMPOSITION AND PATTERNING PROCESS

A resist composition is provided comprising a base polymer and a quencher comprising a cyclic ammonium salt having a fluorinated saturated hydrocarbyl group or fluorinated aryl group. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

4-HYDROXYBUTYRIC ACID ANALOGS
20210403407 · 2021-12-30 ·

This invention relates to novel derivatives of 4-hydroxybutyric acid and prodrugs thereof, and pharmaceutically acceptable salts of the foregoing. This invention also provides pharmaceutical compositions comprising a compound of this invention and the use of such compositions in methods of treating narcolepsy, fibromyalgia, other disorders or conditions that are beneficially treated by improving nocturnal sleep or by administering sodium oxybate.

4-HYDROXYBUTYRIC ACID ANALOGS
20210403407 · 2021-12-30 ·

This invention relates to novel derivatives of 4-hydroxybutyric acid and prodrugs thereof, and pharmaceutically acceptable salts of the foregoing. This invention also provides pharmaceutical compositions comprising a compound of this invention and the use of such compositions in methods of treating narcolepsy, fibromyalgia, other disorders or conditions that are beneficially treated by improving nocturnal sleep or by administering sodium oxybate.