C07C62/24

HYPDH INHIBITORS AND METHODS OF USE FOR THE TREATMENT OF KIDNEY STONES
20180002275 · 2018-01-04 ·

Provided herein are compounds of Formula (I), Formula (II), and Formula (III), and compositions comprising the same, as well as methods of use thereof for controlling or inhibiting the formation of calcium oxalate kidney stones, inhibiting the production of glyoxylate and/or oxalate, and/or inhibiting hydroxyproline dehydrogenase (HYPDH).

HYPDH INHIBITORS AND METHODS OF USE FOR THE TREATMENT OF KIDNEY STONES
20180002275 · 2018-01-04 ·

Provided herein are compounds of Formula (I), Formula (II), and Formula (III), and compositions comprising the same, as well as methods of use thereof for controlling or inhibiting the formation of calcium oxalate kidney stones, inhibiting the production of glyoxylate and/or oxalate, and/or inhibiting hydroxyproline dehydrogenase (HYPDH).

METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND METHOD FOR PRODUCING ONIUM SALT
20230123203 · 2023-04-20 · ·

A method for producing an actinic ray-sensitive or radiation-sensitive resin composition, the method including passing a solution including an acid compound having a pKa of 2.0 or more through a column packed with an ion-exchange resin, producing an onium salt by using the acid compound having been passed through the column, and mixing together the onium salt and a resin that undergoes an increase in polarity due to action of acid.

METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND METHOD FOR PRODUCING ONIUM SALT
20230123203 · 2023-04-20 · ·

A method for producing an actinic ray-sensitive or radiation-sensitive resin composition, the method including passing a solution including an acid compound having a pKa of 2.0 or more through a column packed with an ion-exchange resin, producing an onium salt by using the acid compound having been passed through the column, and mixing together the onium salt and a resin that undergoes an increase in polarity due to action of acid.

USE OF KAURANE COMPOUNDS IN PREPARATION OF DRUG FOR PREVENTION AND TREATMENT OF SEPSIS AND MULTIPLE ORGAN DAMAGE
20230103774 · 2023-04-06 ·

The invention discloses the medicinal use of kaurene compound in the prevention and treatment of sepsis, systemic inflammatory response syndrome (SIRS) and multiple organ failure caused by sepsis, including acute pulmonary failure, acute heart failure and renal failure.

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Disclosed are a compound represented by formula (I), a resin and a resist composition:

##STR00001##

wherein R.sup.1 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; L.sup.1 represents a single bond or —CO—O*; R.sup.3 represents an alkyl group, and —CH.sub.2— included in the group may be replaced by —O— or —CO; R.sup.4 represents a fluorine atom, an alkyl fluoride group or an alkyl group, and —CH.sub.2—included in the alkyl fluoride group and the alkyl group may be replaced by —O— or —CO—; R.sup.5 represents a hydrogen atom, an alkylcarbonyl group or an acid-labile group; m2 and m3 represent an integer of 1 to 3, m4 represents an integer of 0 to 2, and m5 represents 1 or 2, in which 3≤m2+m3+m4+m5≤5.

New Kaurane analogues, their preparation and therapeutically uses
20220204437 · 2022-06-30 ·

Synthesis of novel kaurane analogues , their preparation, and their uses in cardiac protection against ischemia, hypertrophy and chemotherapy induced cardiomyopathy as well as cerebral ischemia.

##STR00001## Wherein R.sup.1: formyl, carboxylic acid (carboxyl), salt of carboxylic acid R.sup.2: oxygen, C-16 ketone to hydroxyl

Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern

Disclosed are a carboxylate represented by formula (I), and a carboxylic acid generator and a resist composition, including the same: ##STR00001## wherein R.sup.1 represents a fluorine atom or a fluorinated alkyl group having 1 to 4 carbon atoms; R.sup.2, R.sup.3 and R.sup.4 each independently represent a halogen atom, a fluorinated alkyl group having 1 to 4 carbon atoms or a hydrocarbon group having 1 to 12 carbon atoms, and —CH.sub.2— included in the hydrocarbon group may be replaced by —O— or —CO—; m2 and m3 represent an integer of 0 to 4, and m4 represents an integer of 0 to 5; and X.sup.0 represents a hydrocarbon group having 1 to 72 carbon atoms which may have a substituent, and —CH.sub.2— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —SO.sub.2—.

Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern

Disclosed are a carboxylate represented by formula (I), and a carboxylic acid generator and a resist composition, including the same: ##STR00001## wherein R.sup.1 represents a fluorine atom or a fluorinated alkyl group having 1 to 4 carbon atoms; R.sup.2, R.sup.3 and R.sup.4 each independently represent a halogen atom, a fluorinated alkyl group having 1 to 4 carbon atoms or a hydrocarbon group having 1 to 12 carbon atoms, and —CH.sub.2— included in the hydrocarbon group may be replaced by —O— or —CO—; m2 and m3 represent an integer of 0 to 4, and m4 represents an integer of 0 to 5; and X.sup.0 represents a hydrocarbon group having 1 to 72 carbon atoms which may have a substituent, and —CH.sub.2— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —SO.sub.2—.

Compound, resin, resist composition and method for producing resist pattern

Disclosed are a compound represented by formula (I), a resin and a resist composition: ##STR00001##
wherein R.sup.1 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; L.sup.1 represents a single bond or —CO—O*; R.sup.3 represents an alkyl group, and —CH.sub.2— included in the group may be replaced by —O— or —CO; R.sup.4 represents a fluorine atom, an alkyl fluoride group or an alkyl group, and —CH.sub.2— included in the alkyl fluoride group and the alkyl group may be replaced by —O— or —CO—; R.sup.5 represents a hydrogen atom, an alkylcarbonyl group or an acid-labile group; m2 and m3 represent an integer of 1 to 3, m4 represents an integer of 0 to 2, and m5 represents 1 or 2, in which 3≤m2+m3+m4+m5≤5.