Provided are ion channel antagonists/blockers and uses thereof. Specifically, it provides the compounds of formula (I) or pharmaceutically acceptable salts, stereoisomers, solvates or prodrugs, preparation method therefor and application thereof. Definition of each group in the formula can be found in the specification for details. Provided is also pharmaceutical composition useful for treatment of heart disease and other ion channel related diseases.

##STR00001##

Provided are ion channel antagonists/blockers and uses thereof. Specifically, it provides the compounds of formula (I) or pharmaceutically acceptable salts, stereoisomers, solvates or prodrugs, preparation method therefor and application thereof. Definition of each group in the formula can be found in the specification for details. Provided is also pharmaceutical composition useful for treatment of heart disease and other ion channel related diseases.

##STR00001##

The invention relates to a process for preparing a semi-aromatic polyamide from diamine and dicarboxylic acid, comprising steps of •(i) dosing a liquid diamine to an agitated powder comprising an aromatic dicarboxylic acid thereby forming a powder comprising a diamine/dicarboxylic acid salt (DD-salt), and •(ii) solid-state polymerizing the DD-salt to obtain the polyamide.

The invention relates to a process for preparing a semi-aromatic polyamide from diamine and dicarboxylic acid, comprising steps of •(i) dosing a liquid diamine to an agitated powder comprising an aromatic dicarboxylic acid thereby forming a powder comprising a diamine/dicarboxylic acid salt (DD-salt), and •(ii) solid-state polymerizing the DD-salt to obtain the polyamide.

The present disclosure provides compounds of the formula (I), (II), (III), wherein the variables are as defined herein for use in the treatment of fungal infections. In some embodiments, the fungal infection is an infection of Cryptococcus neojormans fungus. Also provided herein are compositions comprising a compound of formula I, II, or III and a second anti-fungal agent. ##STR00001##

A naphthalenedicarboxylic acid dichloride production method includes causing a reaction between naphthalenedicarboxylic acid and a chlorinating agent at a reaction temperature of 20 C. or higher and 75 C. or lower in presence of a solvent including tetrahydrofuran. The causing a reaction in the naphthalenedicarboxylic acid dichloride production method is preferably performed in presence of N,N-disubstituted formamide.

A naphthalenedicarboxylic acid dichloride production method includes causing a reaction between naphthalenedicarboxylic acid and a chlorinating agent at a reaction temperature of 20 C. or higher and 75 C. or lower in presence of a solvent including tetrahydrofuran. The causing a reaction in the naphthalenedicarboxylic acid dichloride production method is preferably performed in presence of N,N-disubstituted formamide.

A naphthalenedicarboxylic acid dichloride production method includes causing a reaction between naphthalenedicarboxylic acid and a chlorinating agent at a reaction temperature of 20 C. or higher and 75 C. or lower in presence of a solvent including tetrahydrofuran. The causing a reaction in the naphthalenedicarboxylic acid dichloride production method is preferably performed in presence of N,N-disubstituted formamide.

A naphthalenedicarboxylic acid dichloride production method includes causing a reaction between naphthalenedicarboxylic acid and a chlorinating agent at a reaction temperature of 20 C. or higher and 75 C. or lower in presence of a solvent including tetrahydrofuran. The causing a reaction in the naphthalenedicarboxylic acid dichloride production method is preferably performed in presence of N,N-disubstituted formamide.

A resist composition which generates an acid upon exposure and whose solubility in a developing solution is changed due to an action of the acid, the resist composition including a base material component whose solubility in a developing solution is changed due to the action of an acid; and a compound represented by Formula (d1) in which R.sup.b1 and R.sup.b2 each independently represents COO.sup., COOH, or a hydroxyl group, where at least one of R.sup.b1 and R.sup.b2 represents COO.sup., R.sup.b3, R.sup.b4, and R.sup.b5 each independently represents a hydroxyl group or a halogen atom, R.sup.b6 to R.sup.b8 each independently represents an alkyl group, nb3 represents an integer of 0 to 4, nb4 and nb5 each independently represents an integer of 0 to 2, nb6 to nb8 each independently represents an integer of 0 to 5, m represents 1 or 2, and q represents an integer of 0 to 3.)

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