C07C63/49

METAL-ORGANIC FRAMEWORK HAVING TEREPHTHALIC ACID BASED LIGAND

Despite the fact that the amount and type of gas to be stored may vary in accordance with the type of substituent, metal-organic frameworks only using a terephthalic acid having substituents within the limited range have been produced conventionally. An object of the present invention is to provide a novel metal-organic framework using a 2,5-disubstituted terephthalic acid. A metal-organic framework comprising a carboxylate ion of formula (I) and a multivalent metal ion bound to each other is a novel metal-organic framework, enabling a gas such as hydrogen and nitrogen to be store efficiently. (wherein in formula (I), X is an unsubstituted or substituted cycloalkyl group, an unsubstituted or substituted aryl group, an unsubstituted or substituted heterocyclyl group or —Si(R.sup.1) (R.sup.2) (R.sup.3) ; and Y is a single bond, an alkylene group, —O—, —S—, —S(O)—, —SO.sub.2—, —N(R.sup.4)— or a group formed by a combination thereof; provided that X—Y— is a phenyl group, a benzyloxy group, a pyrazol-1-yl group or a group of formula (II) except for a case where m is 3, 6, 8, 9, 10, 11 and 12).

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METAL-ORGANIC FRAMEWORK WITH CARBOXYLIC ACID ION HAVING TERPHENYL SKELETON AS LIGAND

An object of the present invention is to provide a novel metal-organic framework with a dicarboxylic acid having a terphenyl skeleton as an organic ligand and a gas storage method using such a metal-organic framework. A metal-organic framework comprising a carboxylate ion of formula (I) and a multivalent metal ion bonded to each other. (In formula (I), R.sup.1 and R.sup.2 each independently are a hydroxy group or an unsubstituted or substituted C1-6 alkyl group. R.sup.10 and R.sup.11 each independently are an unsubstituted or substituted C1-6 alkyl group. R.sup.20 is an unsubstituted or substituted C1-6 alkyl group. Provided that, as substituents on R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.10, R.sup.11, and R.sup.20, a carboxy group (COOH) and a carboxylate ion group (COO—) are excluded. In addition, R.sup.10 and R.sup.11 are not a methyl group at the same time.)

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Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component

Provided is a compound that can be used as a base resin for a photosensitive resin composition. The photosensitive resin can form a fine pattern and can achieve high resolution without impairing mechanical strength and solubility. The compound is represented by the general formula (1): ##STR00001##
wherein Z represents a linear, branched or cyclic divalent hydrocarbon group having 2 to 30 carbon atoms; X.sup.1 to X.sup.3 represent any of —CO.sub.2—, —CONR.sup.X1—, —O—, —NR.sup.X1—, —S—, —SO.sub.2—, —SO.sub.3— and —SO.sub.2NR.sup.X1— and may be the same as or different from each other, provided that R.sup.X1 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 30 carbon atoms; Ar represents a divalent aromatic group having 2 to 30 carbon atoms; L.sup.1 and L.sup.2 independently represent a divalent hydrocarbon group having 1 to 30 carbon atoms; and x and y are each independently 0 or 1.

Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component

Provided is a compound that can be used as a base resin for a photosensitive resin composition. The photosensitive resin can form a fine pattern and can achieve high resolution without impairing mechanical strength and solubility. The compound is represented by the general formula (1): ##STR00001##
wherein Z represents a linear, branched or cyclic divalent hydrocarbon group having 2 to 30 carbon atoms; X.sup.1 to X.sup.3 represent any of —CO.sub.2—, —CONR.sup.X1—, —O—, —NR.sup.X1—, —S—, —SO.sub.2—, —SO.sub.3— and —SO.sub.2NR.sup.X1— and may be the same as or different from each other, provided that R.sup.X1 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 30 carbon atoms; Ar represents a divalent aromatic group having 2 to 30 carbon atoms; L.sup.1 and L.sup.2 independently represent a divalent hydrocarbon group having 1 to 30 carbon atoms; and x and y are each independently 0 or 1.

SMALL-MOLECULE INHIBITOR TARGETING EB VIRUS NUCLEAR ANTIGEN PROTEIN, PREPARATION METHOD AND USE THEREOF

The present application provides a small-molecule inhibitor targeting an EB virus nuclear antigen protein, and/or a pharmaceutical composition containing the same, which can be used for the treatment of a disease caused by EBNA1 activity, such as, but not limited to, cancer, infectious mononucleosis, chronic fatigue syndrome, multiple sclerosis, systemic lupus erythematosus and/or rheumatoid arthritis. The present application further provides a small-molecule inhibitor targeting an EB virus nuclear antigen protein, and/or a pharmaceutical composition containing the same, which can be used for the treatment of a disease caused by EBV infection in a lytic and/or latent phase.

COMPOUND FOR MODULATING DDAH AND ADMA LEVELS, AS WELL AS METHODS OF USING THEREOF TO TREAT DISEASE
20220144795 · 2022-05-12 ·

Disclosed are compounds that can modulate DDAH and the amount of asymmetric dimethylarginine (ADMA) in a subject. Also provided are pharmaceutical compositions comprising these compounds, as well as methods of using these compositions to treat and/or prevent diseases associated with elevated or low levels of DDAH and ADMA.

COMPOUND FOR MODULATING DDAH AND ADMA LEVELS, AS WELL AS METHODS OF USING THEREOF TO TREAT DISEASE
20220144795 · 2022-05-12 ·

Disclosed are compounds that can modulate DDAH and the amount of asymmetric dimethylarginine (ADMA) in a subject. Also provided are pharmaceutical compositions comprising these compounds, as well as methods of using these compositions to treat and/or prevent diseases associated with elevated or low levels of DDAH and ADMA.

BEXAROTENE DERIVATIVES AND THEIR USE IN TREATING CANCER
20210363093 · 2021-11-25 ·

This disclosure relates to compositions and methods for treating cancer. Specifically, this disclosure relates to bexarotene derivatives, methods for treating cancer, autoimmune disorders, and/or skin dermatitis, and/or methods for increasing peripheral blood counts and/or improving immune system function.

BEXAROTENE DERIVATIVES AND THEIR USE IN TREATING CANCER
20210363093 · 2021-11-25 ·

This disclosure relates to compositions and methods for treating cancer. Specifically, this disclosure relates to bexarotene derivatives, methods for treating cancer, autoimmune disorders, and/or skin dermatitis, and/or methods for increasing peripheral blood counts and/or improving immune system function.

METAL-ORGANIC STRUCTURAL BODY

An object of the present invention is to provide a metal-organic framework capable of adsorbing a gas such as a hydrogen molecule or carbon dioxide at a practical level. The metal-organic framework is used for adsorbing a gas such as hydrogen or carbon dioxide and comprises a multivalent metal ion and a carboxylate ion of formula [I] [wherein in formula [I], X.sup.1 to X.sup.3 each independently represent a functional group of formula [II] (wherein in formula [II], Z is a single bond or a multivalent linking group, k is an integer of 1 to 4, and * is the position at which a bond is formed with a benzene ring); and Y.sup.1 and Y.sup.2 each independently represent a hydrogen atom, a halogeno group, a C1-6 alkyl group or the like, provided that when the multivalent metal ion is a trivalent metal ion, Y.sup.1 and Y.sup.2 each independently represent a halogeno group, a C1-6 alkyl group or the like], wherein the carboxylate ion and the multivalent metal ion are bound to each other.

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