A resist topcoat composition includes an acrylic polymer including a structural unit containing a hydroxy group and a fluorine; a mixture including a sulfonic acid compound containing at least one fluorine and a carboxylic acid compound containing at least one fluorine in a weight ratio of about 1:0.1 to about 1:50; and a solvent. A method of forming patterns uses the resist topcoat composition to form a topcoat over a patterned substrate.

A resist topcoat composition and a method of forming patterns using the resist topcoat composition. The resist topcoat composition includes an acrylic copolymer including a first structural unit represented by Chemical Formula M-1, and a second structural unit represented by Chemical Formula M-2; an acid compound; and a solvent

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A method for producing an actinic ray-sensitive or radiation-sensitive resin composition, the method including passing a solution including an acid compound having a pKa of 2.0 or more through a column packed with an ion-exchange resin, producing an onium salt by using the acid compound having been passed through the column, and mixing together the onium salt and a resin that undergoes an increase in polarity due to action of acid.

A method for producing an actinic ray-sensitive or radiation-sensitive resin composition, the method including passing a solution including an acid compound having a pKa of 2.0 or more through a column packed with an ion-exchange resin, producing an onium salt by using the acid compound having been passed through the column, and mixing together the onium salt and a resin that undergoes an increase in polarity due to action of acid.

Method for visible-light driven oxidation of aldehydes to carboxylic acid using carbon dioxide (CO.sub.2) as the oxidant in the absence of any catalyst are provided. In the disclosed process, aldehydes, when reacted with CO.sub.2 in an organic solvent, either in a batch reactor or in a continuous flow reactor, under conditions of ambient temperature and pressure, using a readily available household LED lamp, yield corresponding carboxylic acids along with the formation of carbon monoxide (CO) in the effluent gas.

Method for visible-light driven oxidation of aldehydes to carboxylic acid using carbon dioxide (CO.sub.2) as the oxidant in the absence of any catalyst are provided. In the disclosed process, aldehydes, when reacted with CO.sub.2 in an organic solvent, either in a batch reactor or in a continuous flow reactor, under conditions of ambient temperature and pressure, using a readily available household LED lamp, yield corresponding carboxylic acids along with the formation of carbon monoxide (CO) in the effluent gas.

Methods for rapid, efficient, and safe fluoridation and radiolabeling of established and new biomarkers are described. More specifically, the described herein methods may be used for fluoridation of biomarkers or to facilitate isotopic exchanges, especially .sup.19F/.sup.18F IEX, for rapid and efficient manufacturing of radiotracers, including radiotracers for positron emission tomography (PET), under clinically relevant conditions.

Methods for rapid, efficient, and safe fluoridation and radiolabeling of established and new biomarkers are described. More specifically, the described herein methods may be used for fluoridation of biomarkers or to facilitate isotopic exchanges, especially .sup.19F/.sup.18F IEX, for rapid and efficient manufacturing of radiotracers, including radiotracers for positron emission tomography (PET), under clinically relevant conditions.

Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator: ##STR00001##
wherein, in formula (I), R.sup.1 represents a halogen atom or an alkyl fluoride group having 1 to 6 carbon atoms, m1 represents an integer of 1 to 5, and when m1 is 2 or more, a plurality of R.sup.1 may be the same or different from each other.

Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator: ##STR00001##
wherein, in formula (I), R.sup.1 represents a halogen atom or an alkyl fluoride group having 1 to 6 carbon atoms, m1 represents an integer of 1 to 5, and when m1 is 2 or more, a plurality of R.sup.1 may be the same or different from each other.