The invention relates to a method for (I) producing a carboxylic ester of formula (I). Said method comprises the steps of: a) bringing an organosilane/borane of formula Si or B into contact with CO.sub.2, in the presence of a catalyst and an electrophilic compound of formula (III), the groups R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, Y, and M′ being as defined in claim 1; and optionally b) recovering the compound of formula (I) produced.

##STR00001##

The invention relates to a method for (I) producing a carboxylic ester of formula (I). Said method comprises the steps of: a) bringing an organosilane/borane of formula Si or B into contact with CO.sub.2, in the presence of a catalyst and an electrophilic compound of formula (III), the groups R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, Y, and M′ being as defined in claim 1; and optionally b) recovering the compound of formula (I) produced.

##STR00001##

A phenalene-1-one compound, a photosensitizer composition including the phenalene-1-one compound, an article including the phenalene-1-one compound and/or photosensitizer composition and the use thereof.

A phenalene-1-one compound, a photosensitizer composition including the phenalene-1-one compound, an article including the phenalene-1-one compound and/or photosensitizer composition and the use thereof.

A pattern forming material is configured to use for forming an organic film on a film to be processed, patterning the organic film, and then forming a composite film by infiltrating a metallic compound into the patterned organic film. The pattern forming material contains a polymer including a monomer unit represented by a general formula (1) described below, ##STR00001##
wherein, R.sup.5 is a hydrogen atom or a methyl group, each R.sup.6 independently is an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, or an s-butyl group, and a monomer unit derived from a compound represented by a general formula (2) described below, ##STR00002##
wherein, R.sup.11 is a hydrogen atom or a methyl group, each R.sup.12 independently is a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, an s-butyl group, or a t-butyl group.

A method for controlling a soybean rust fungus having an amino acid substitution of F129L in a mitochondrial cytochrome b protein. A compound of formula (I) can be used for controlling a soybean rust fungus having an amino acid substitution of F129L in a mitochondrial cytochrome b protein,

##STR00001##

wherein: R.sup.1 represents a C1-C4 alkyl group or the like; n represents 0, 1, or 2; Q represents the group of Q1 or the like;

##STR00002##

represents the binding site to the rest of molecule; X.sup.1 represents —C(H)═ or the like; X.sup.2 represents -C(O)OCH.sub.3 or the like; J represents the group represented by J1 or the like;

##STR00003##

# represents the binding position to E; Y.sup.1 represents an oxygen atom or the like; Y.sup.2 represents ═C(R.sup.6)— or the like; R.sup.6 represents a C1-C4 alkyl group or the like; and E represents a C1-C6 chain hydrocarbon group or the like.

A phenalene-1-one compound, a photosensitizer composition including the phenalene-1-one compound, an article including the phenalene-1-one compound and/or photosensitizer composition and the use thereof.

A phenalene-1-one compound, a photosensitizer composition including the phenalene-1-one compound, an article including the phenalene-1-one compound and/or photosensitizer composition and the use thereof.

The patent application relates to a method of producing a monomer component from a genetically modified polyhydroxyalkanoate (PHA) biomass, wherein the biomass is heated in the presence of a catalyst to release a monomer component from the PHA.

The patent application relates to a method of producing a monomer component from a genetically modified polyhydroxyalkanoate (PHA) biomass, wherein the biomass is heated in the presence of a catalyst to release a monomer component from the PHA.