Patent classifications
C07C69/653
ONE STEP SYNTHESIS FOR ALKYL 2-FLUOROACRYLATES
A process is provided that results in an alkyl haloacrylate that is produced by reaction of a dialkyl or diaryl halomalonate with an aldehyde, preferably formalin or paraformaldehyde, and a base catalyst to produce an intermediate that is not isolated and is heated to produce the alkyl haloacrylate. This synthesis can be one pot, meaning it reacts in the same vessel and/or reaction mixture and does not require isolation of the intermediate, and provides an improved yield. In particular, a process is provided that results in an alkyl 2-fluoroacrylate.
ONE STEP SYNTHESIS FOR ALKYL 2-FLUOROACRYLATES
A process is provided that results in an alkyl haloacrylate that is produced by reaction of a dialkyl or diaryl halomalonate with an aldehyde, preferably formalin or paraformaldehyde, and a base catalyst to produce an intermediate that is not isolated and is heated to produce the alkyl haloacrylate. This synthesis can be one pot, meaning it reacts in the same vessel and/or reaction mixture and does not require isolation of the intermediate, and provides an improved yield. In particular, a process is provided that results in an alkyl 2-fluoroacrylate.
Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-containing polymer, resist composition and patterning process
A fluorocarboxylic acid-containing polymer comprising recurring units having formula (A1), but not acid labile group-containing recurring units is provided. A resist composition comprising the same offers a high sensitivity and is unsusceptible to nano-bridging or pattern collapse independent of whether it is of positive or negative tone. ##STR00001##
Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-containing polymer, resist composition and patterning process
A fluorocarboxylic acid-containing polymer comprising recurring units having formula (A1), but not acid labile group-containing recurring units is provided. A resist composition comprising the same offers a high sensitivity and is unsusceptible to nano-bridging or pattern collapse independent of whether it is of positive or negative tone. ##STR00001##
COMPOSITION FOR THE IMMEDIATE TERMINATION OF A FREE-RADICAL POLYMERIZATION AND USES THEREOF
The invention relates to a composition for the immediate termination of a free-radical polymerization, the use thereof for the stabilization of free-radically polymerizable monomers against free-radical polymerization and a method for the immediate termination of free-radical polymerizations.
COMPOSITION FOR THE IMMEDIATE TERMINATION OF A FREE-RADICAL POLYMERIZATION AND USES THEREOF
The invention relates to a composition for the immediate termination of a free-radical polymerization, the use thereof for the stabilization of free-radically polymerizable monomers against free-radical polymerization and a method for the immediate termination of free-radical polymerizations.
Method for preparing keto-functionalized aromatic (meth)acrylates
The invention relates to a method for preparing keto-functionalized aromatic (meth)acrylates.
Method for preparing keto-functionalized aromatic (meth)acrylates
The invention relates to a method for preparing keto-functionalized aromatic (meth)acrylates.
COMPOUNDS FOR OPTICALLY ACTIVE DEVICES
The present invention relates to novel ophthalmic devices comprising polymerized compounds comprising a photoactive unit, said polymerized compounds, and special monomer compounds being particularly suitable for compositions and ophthalmic devices.
Monomers, polymers and photoresist compositions
In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I): ##STR00001##
Photoresists that comprises such polymers also are provided.