Disclosed is a method for preparing a 2-fluoroacrylate, comprising the steps of: (1) mixing a vinyl ether having the structure of formula A with dichloromonofluoromethane to yield a substituted cyclopropane compound having the structure of formula B; (2) mixing the substituted cyclopropane compound having the structure of formula B with R.sup.2OH to yield an acetal product having the structure of formula C, followed by hydrolysis to yield 2-fluoroacrylaldehyde having the structure of formula D; or reacting the substituted cyclopropane compound having the structure of formula B with water to yield 2-fluoroacrylaldehyde having the structure of formula D via hydrolysis; (3) oxidizing 2-fluoroacrylaldehyde having the structure of formula D to yield 2-fluoroacrylic acid having the structure of formula E; and (4) mixing 2-fluoroacrylic acid having the structure of formula E with R.sup.3OH to yield a 2-fluoroacrylate having the structure of formula F.

A monomer of formula (1a) or (1b) is provided wherein A is a polymerizable group, R.sup.1-R.sup.6 are monovalent hydrocarbon groups, X.sup.1 is a divalent hydrocarbon, group, Z.sup.1 is an aliphatic group, Z.sup.2 forms an alicyclic group, k=0 or 1, m=1 or 2, n=1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer. ##STR00001##

A monomer of formula (1a) or (1b) is provided wherein A is a polymerizable group, R.sup.1-R.sup.6 are monovalent hydrocarbon groups, X.sup.1 is a divalent hydrocarbon, group, Z.sup.1 is an aliphatic group, Z.sup.2 forms an alicyclic group, k=0 or 1, m=1 or 2, n=1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer. ##STR00001##

An object of the present invention is to provide a method for stabilizing an acrylic acid derivative, and a composition containing an acrylic acid derivative in which the acrylic acid derivative is stabilized. The present invention provides a composition comprising: (A) an acrylic acid derivative represented by Formula (I): ##STR00001##
(wherein, R.sup.1 and R.sup.2 are the same or different, and each represents alkyl, fluoroalkyl, aryl that may have one or more substituents, halogen, or hydrogen; R.sup.c represents a group: OR.sup.3 (wherein R.sup.3 represents alkyl, fluoroalkyl, aryl that may have one or more substituents, or hydrogen) or halogen; and X represents fluoroalkyl, alkyl, hydrogen, or halogen); and (B) amide, wherein the content of acrylic acid derivative (A) is 30% (w/w) or more.

An object of the present invention is to provide a method for stabilizing an acrylic acid derivative, and a composition containing an acrylic acid derivative in which the acrylic acid derivative is stabilized. The present invention provides a composition comprising: (A) an acrylic acid derivative represented by Formula (I): ##STR00001##
(wherein, R.sup.1 and R.sup.2 are the same or different, and each represents alkyl, fluoroalkyl, aryl that may have one or more substituents, halogen, or hydrogen; R.sup.c represents a group: OR.sup.3 (wherein R.sup.3 represents alkyl, fluoroalkyl, aryl that may have one or more substituents, or hydrogen) or halogen; and X represents fluoroalkyl, alkyl, hydrogen, or halogen); and (B) amide, wherein the content of acrylic acid derivative (A) is 30% (w/w) or more.

An object of the present invention is to provide a method for stabilizing an acrylic acid derivative, and a composition containing an acrylic acid derivative in which the acrylic acid derivative is stabilized. The present invention provides a composition comprising: (A) an acrylic acid derivative represented by Formula (I): ##STR00001##
(wherein, R.sup.1 and R.sup.2 are the same or different, and each represents alkyl, fluoroalkyl, aryl that may have one or more substituents, halogen, or hydrogen; R.sup.c represents a group: OR.sup.3 (wherein R.sup.3 represents alkyl, fluoroalkyl, aryl that may have one or more substituents, or hydrogen) or halogen; and X represents fluoroalkyl, alkyl, hydrogen, or halogen); and (B) amide, wherein the content of acrylic acid derivative (A) is 30% (w/w) or more.

A monomer of formula (1a) or (1b) is provided wherein A is a polymerizable group, R.sup.1-R.sup.6 are monovalent hydrocarbon groups, X.sup.1 is a divalent hydrocarbon group, Z.sup.1 is an aliphatic group, Z.sup.2 forms an alicyclic group, k=0 or 1, m=1 or 2, n=1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer. ##STR00001##

A monomer of formula (1a) or (1b) is provided wherein A is a polymerizable group, R.sup.1-R.sup.6 are monovalent hydrocarbon groups, X.sup.1 is a divalent hydrocarbon group, Z.sup.1 is an aliphatic group, Z.sup.2 forms an alicyclic group, k=0 or 1, m=1 or 2, n=1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer. ##STR00001##

The present invention relates to a method for preparing a fluorinated methacrylate compound which can be used as a fluorine monomer for synthesizing a functional polymer having high oxygen permeability, water repellency and stain resistance. Specifically, the method can be carried out by a process of reacting an alcohol derivative and methacrylic acid anhydride in the presence of an imidazole-based base to obtain a fluorinated methacrylate. According to the preparation method of the present invention, since the reaction is carried out at room temperature and there is no process of removing the byproducts formed during the reaction, a high yield of fluorinated methacrylate can be obtained by a simple method within a short period of time.

The present invention relates to a method for preparing a fluorinated methacrylate compound which can be used as a fluorine monomer for synthesizing a functional polymer having high oxygen permeability, water repellency and stain resistance. Specifically, the method can be carried out by a process of reacting an alcohol derivative and methacrylic acid anhydride in the presence of an imidazole-based base to obtain a fluorinated methacrylate. According to the preparation method of the present invention, since the reaction is carried out at room temperature and there is no process of removing the byproducts formed during the reaction, a high yield of fluorinated methacrylate can be obtained by a simple method within a short period of time.