C07C69/653

FLUORINE COMPOUNDS
20170349761 · 2017-12-07 · ·

The present invention relates to compounds of the formula (I) (Rf—CHF—CF.sub.2—CHR).sub.m-L-(X).sub.n, where Rf=a perfluorinated alkyl group, optionally containing heteroatoms, R=H or an alkyl group, L=a single bond or a divalent organic group, X=an anchor group, m is ≧1 and n is ≧1, and to the use thereof in, for example, dirt-repellent coatings.

FLUORINE COMPOUNDS
20170349761 · 2017-12-07 · ·

The present invention relates to compounds of the formula (I) (Rf—CHF—CF.sub.2—CHR).sub.m-L-(X).sub.n, where Rf=a perfluorinated alkyl group, optionally containing heteroatoms, R=H or an alkyl group, L=a single bond or a divalent organic group, X=an anchor group, m is ≧1 and n is ≧1, and to the use thereof in, for example, dirt-repellent coatings.

FLUORINE COMPOUNDS
20170349760 · 2017-12-07 · ·

The present invention relates to novel compounds containing fluorinated end groups and to the use thereof in, for example, dirt-repellent coatings.

FLUORINE COMPOUNDS
20170349760 · 2017-12-07 · ·

The present invention relates to novel compounds containing fluorinated end groups and to the use thereof in, for example, dirt-repellent coatings.

COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUND, AND METHOD FOR PRODUCING (CO)POLYMER

An iodine-containing (meth)acrylate compound represented by formula (1):

##STR00001##

wherein R.sup.1 represents a hydrogen atom, methyl, or halogen; each R.sup.2 independently represents a hydrogen atom, a linear organic group having 1 to 20 carbon atoms, a branched organic group having 3 to 20 carbon atoms, or a cyclic organic group having 3 to 20 carbon atoms; A represents an organic group having 1 to 30 carbon atoms; A contains at least one acyl group; n.sup.1 represents 0 or 1; and n.sup.2 represents an integer of 1 to 20.

COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUND, AND METHOD FOR PRODUCING (CO)POLYMER

An iodine-containing (meth)acrylate compound represented by formula (1):

##STR00001##

wherein R.sup.1 represents a hydrogen atom, methyl, or halogen; each R.sup.2 independently represents a hydrogen atom, a linear organic group having 1 to 20 carbon atoms, a branched organic group having 3 to 20 carbon atoms, or a cyclic organic group having 3 to 20 carbon atoms; A represents an organic group having 1 to 30 carbon atoms; A contains at least one acyl group; n.sup.1 represents 0 or 1; and n.sup.2 represents an integer of 1 to 20.

COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUND, AND METHOD FOR PRODUCING (CO)POLYMER

An iodine-containing (meth)acrylate compound represented by formula (1):

##STR00001##

wherein R.sup.1 represents a hydrogen atom, methyl, or halogen; each R.sup.2 independently represents a hydrogen atom, a linear organic group having 1 to 20 carbon atoms, a branched organic group having 3 to 20 carbon atoms, or a cyclic organic group having 3 to 20 carbon atoms; A represents an organic group having 1 to 30 carbon atoms; A contains at least one acyl group; n.sup.1 represents 0 or 1; and n.sup.2 represents an integer of 1 to 20.

Process for the manufacture of alkylfluoroacrylate

The invention relates to a process for the manufacture of an alkylfluoroacrylate starting from alkylfluoroacetate and an oxalic acid ester, wherein an alkane liquid under the reaction conditions is applied as the solvent in one of the reaction steps.

Process for the manufacture of alkylfluoroacrylate

The invention relates to a process for the manufacture of an alkylfluoroacrylate starting from alkylfluoroacetate and an oxalic acid ester, wherein an alkane liquid under the reaction conditions is applied as the solvent in one of the reaction steps.

Salt, resin, resist composition and method for producing resist pattern

A salt represented by formula (I): ##STR00001##
wherein Q.sup.1 and Q.sup.2 independently represent a fluorine atom or a C.sub.1 to C.sub.6 perfluoroalkyl group, R.sup.1 and R.sup.2 each independently represent a hydrogen atom, a fluorine atom or a C.sub.1 to C.sub.6 perfluoroalkyl group, z represents an integer of 0 to 6, R.sup.3 represents a hydrogen atom, a fluorine atom, a C.sub.1 to C.sub.12 alkyl group or a C.sub.1 to C.sub.12 fluorinated alkyl group, R.sup.4 represents a C.sub.1 to C.sub.12 fluorinated alkyl group, L.sup.2 represents a single bond, a C.sub.1 to C.sub.12 divalent saturated hydrocarbon group, etc., R.sup.5 represents a hydrogen atom, a halogen atom or a C.sub.1 to C.sub.6 alkyl group that may have a halogen atom, L.sup.1 represents a group represented by formula (b1-1), etc., * represents a bonding site to —CR.sup.3R.sup.4; L.sup.b2 and L.sup.b3 each independently represent a single bond or a C.sub.1 to C.sub.22 divalent saturated hydrocarbon group; Z.sup.+ represents an organic cation.