The present invention relates to a plasticizer composition, a resin composition, and a method of preparing the plasticizer composition. The plasticizer composition comprising an isophthalate-based material; and an epoxy-based alkyl ester compound represented by Chemical Formula 1. ##STR00001##

The present invention relates to a plasticizer composition, a resin composition, and a method of preparing the plasticizer composition. The plasticizer composition comprising an isophthalate-based material; and an epoxy-based alkyl ester compound represented by Chemical Formula 1. ##STR00001##

The present disclosure relates to the field of epoxide synthesis, and particularly to a safe, environmentally friendly and controllable method for preparing cycloaliphatic diepoxides. The method comprises the steps of: mixing a diene compound, a carboxylic acid, an alkaline salt, and a solvent, and cooling; dropwise adding a hydrogen peroxide solution thereto over 1-12 h; standing for layering to obtain an underlayer of an organic phase 1, washing the organic phase 1 with a washing liquid, and standing for layering to obtain an underlayer of an organic phase 2; and purifying the organic phase 2. The reaction system of the present disclosure is simple, environmentally friendly, safe and controllable, and the production cost is low, which can meet the technical and economic requirements. The obtained cycloaliphatic diepoxides have high purity, high yield, low solvent content, low chroma and low halogen content, which are suitable for large-scale industrial production.

A compound having Formula (I) or Formula (II):

##STR00001##

or a mixture thereof,

in which R is —H; —CH.sub.3; —CH—(CH.sub.3).sub.2; —CH.sub.2—CH—(CH.sub.3).sub.2; —CH—(CH.sub.3)—CH.sub.2—CH.sub.3; —CH.sub.2—(C.sub.6H.sub.5); —CH.sub.2—(3-indole); —CH.sub.2—CH.sub.2—S—CH.sub.3; —CH.sub.2—OH; —CH—(CH.sub.3)—OH; —CH.sub.2—SH; —CH.sub.2-(p-C.sub.6H.sub.40H); —CH.sub.2—CH.sub.2—CH.sub.2—CH.sub.2—NH.sub.2; —CH.sub.2—CO—NH.sub.2; —CH.sub.2—CH.sub.2—CO—NH.sub.2; —CH.sub.2—CH.sub.2—COOH; —CH.sub.2—COOH; or —CH.sub.2—CH.sub.2—NH—C═NH.sub.2(NH.sub.2);

and X is a suitable non-interfering anion, a process for making the compound having Formula (I) or Formula (II), and a process for reacting the compound having Formula (I) or Formula (II) or a mixture thereof with a (poly)saccharide to form a cationized (poly)saccharide.

A compound having Formula (I) or Formula (II):

##STR00001##

or a mixture thereof,

in which R is —H; —CH.sub.3; —CH—(CH.sub.3).sub.2; —CH.sub.2—CH—(CH.sub.3).sub.2; —CH—(CH.sub.3)—CH.sub.2—CH.sub.3; —CH.sub.2—(C.sub.6H.sub.5); —CH.sub.2—(3-indole); —CH.sub.2—CH.sub.2—S—CH.sub.3; —CH.sub.2—OH; —CH—(CH.sub.3)—OH; —CH.sub.2—SH; —CH.sub.2-(p-C.sub.6H.sub.40H); —CH.sub.2—CH.sub.2—CH.sub.2—CH.sub.2—NH.sub.2; —CH.sub.2—CO—NH.sub.2; —CH.sub.2—CH.sub.2—CO—NH.sub.2; —CH.sub.2—CH.sub.2—COOH; —CH.sub.2—COOH; or —CH.sub.2—CH.sub.2—NH—C═NH.sub.2(NH.sub.2);

and X is a suitable non-interfering anion, a process for making the compound having Formula (I) or Formula (II), and a process for reacting the compound having Formula (I) or Formula (II) or a mixture thereof with a (poly)saccharide to form a cationized (poly)saccharide.

A method for synthesizing functionalized bio-based crosslinkers including forming a first mixture by mixing a bio-based carboxylic acid with an alkaline solution and forming a second mixture containing a functionalized bio-based crosslinker by reacting the bio-based carboxylic acid with a modifier. The modifier includes at least one of an epoxide group and an acrylate group. Reacting the bio-based carboxylic acid with the modifier includes forming a reaction mixture by mixing the first mixture with the modifier and exposing the reaction mixture to at least one of heating, ultrasound radiation, and microwave radiation.

A method for synthesizing functionalized bio-based crosslinkers including forming a first mixture by mixing a bio-based carboxylic acid with an alkaline solution and forming a second mixture containing a functionalized bio-based crosslinker by reacting the bio-based carboxylic acid with a modifier. The modifier includes at least one of an epoxide group and an acrylate group. Reacting the bio-based carboxylic acid with the modifier includes forming a reaction mixture by mixing the first mixture with the modifier and exposing the reaction mixture to at least one of heating, ultrasound radiation, and microwave radiation.

The invention relates to compositions of α,α-branched alkane carboxylic acids glycidyl esters which derived from rosin and or hydrogenated rosin reacted with an epihalohydrin. The above glycidyl esters compositions can be used for example, as monomer in binder compositions for paints or adhesives, as reactive diluent or as acid scavenger. This invention is also about the uses of rosin and or hydrogenated rosin glycidyl ester in combinations with polyester polyols, or acrylic polyols, or polyether polyols.

The present disclosure relates to the field of epoxide resin, and more particularly to an epoxide with a low total chlorine content and no heavy metal residues, and a preparation method thereof. Disclosed is an epoxide prepared from raw materials including an unsaturated cycloaliphatic compound containing a double bond, hydrogen peroxide, an organic acid compound, a solvent and an alkaline salt; wherein a molar ratio of the organic acid compound to the unsaturated cycloaliphatic compound containing a double bond is (1-1.5):1. The obtained epoxides obtained in the present disclosure have a high purity, a high yield, a low solvent content, low chroma, and a low chlorine and metal ion content; the reaction system is simple, environmentally friendly, safe and controllable, and the production cost is low, which can meet the technical and economic requirements and are suitable for large-scale industrial production.

A composition for protective film formation can form a flat film that satisfactorily functions as a mask (protection) against wet etchants during semiconductor substrate processing and has a low dry etching rate, the composition having satisfactory covering and recess-filling properties when applied to rugged substrates and having a small thickness difference after the recess filling. A protective film, a resist underlayer film, and a resist-pattern-coated substrate each produced using the composition; and a method for producing a semiconductor device. The composition, which is for forming films for protection against wet etchants for semiconductors, includes an organic solvent and a compound that has a molecular end having a structure including at least one pair of adjoining hydroxyl groups and has a molecular weight of 1,500 or less, wherein particles present therein have an average particle diameter, as determined by a dynamic light scattering method, of 3 nm or smaller.