C07D317/44

Spirobicyclic analogues

The present invention relates to novel spirobicyclic analogues of Formula (I) ##STR00001##
wherein the variables have the meaning defined in the claims. The compounds according to the present invention are useful as PRMT5 inhibitors. The invention further relates to pharmaceutical compositions comprising said compounds as an active ingredient as well as the use of said compounds as a medicament.

CATALYST COMPOSITION FOR CYCLIC CARBONATE PRODUCTION FROM CO2 AND EPOXIDES

The present invention relates to catalyst composition for cyclic carbonate production from CO.sub.2 and epoxides under mild conditions, which can effectively catalyze the cyclic carbonate synthesis and provides good selectivity to cyclic carbonate, wherein said catalyst composition comprising: a) the metal complex as shown in structure (I):

##STR00001## wherein, M represents transition metal atom; R.sub.1, R.sub.2, and R.sub.3 represent independent group selected from hydrogen atom, halogen atom, alkyl group, alkenyl group, alkynyl group, alkoxy group, amine group, phenyl group, benzyl group, cyclic hydrocarbon group comprising hetero atom, perfluoroalkyl group, or nitro group; R.sub.4 represents group selected from alkylene group, cycloalkylene group, or phenylene group; X represents group selected from hydrogen atom, acetate group, or triflate group; and b) the organic compound as the co-catalyst selected from compound containing nitrogen, compound of quaternary ammonium salts, or compound of iminium salts.

CATALYST COMPOSITION FOR CYCLIC CARBONATE PRODUCTION FROM CO2 AND EPOXIDES

The present invention relates to catalyst composition for cyclic carbonate production from CO.sub.2 and epoxides under mild conditions, which can effectively catalyze the cyclic carbonate synthesis and provides good selectivity to cyclic carbonate, wherein said catalyst composition comprising: a) the metal complex as shown in structure (I):

##STR00001## wherein, M represents transition metal atom; R.sub.1, R.sub.2, and R.sub.3 represent independent group selected from hydrogen atom, halogen atom, alkyl group, alkenyl group, alkynyl group, alkoxy group, amine group, phenyl group, benzyl group, cyclic hydrocarbon group comprising hetero atom, perfluoroalkyl group, or nitro group; R.sub.4 represents group selected from alkylene group, cycloalkylene group, or phenylene group; X represents group selected from hydrogen atom, acetate group, or triflate group; and b) the organic compound as the co-catalyst selected from compound containing nitrogen, compound of quaternary ammonium salts, or compound of iminium salts.

COMPOUNDS FOR FAST AND EFFICIENT CLICK RELEASE

The invention disclosed herein relates to compounds, combinations, kits, and methods using same, for use in bioorthogonal release reactions. In particular, the compounds, combinations and kits of the invention can be used to achieve fast and efficient click release. Applications of the compounds, combinations, and kits of the invention include both in vitro and in vivo applications.

METHOD OF STABILIZING PERFLUORODIOXOLANE COMPOUND, PERFLUORODIOXOLANE COMPOUND-CONTAINING COMPOSITION AND METHOD OF PRODUCING PERFLUORODIOXOLANE COMPOUND POLYMER

Provided is a method of stabilizing a perfluorodioxolane compound, which includes having a quinone compound present in a composition containing a perfluorodioxolane compound, wherein the perfluorodioxolane compound is one or more perfluorodioxolane compounds selected from the group consisting of a perfluorodioxolane compound denoted by general formula (1) and a perfluorodioxolane compound denoted by general formula (2).

##STR00001##

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
20230168581 · 2023-06-01 · ·

An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition by which a pattern having excellent LWR performance can be formed. In addition, another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition.

The actinic ray-sensitive or radiation-sensitive resin composition according to an embodiment of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition including an acid-decomposable resin including a repeating unit having an acid-decomposable group in which an acid group having a pKa of 13 or less is protected by a leaving group that leaves by an action of an acid, and one or more compounds that generate an acid upon irradiation with actinic rays or radiation, which are selected from a compound (I) and a compound (II),

in which the content of the acid-decomposable resin is 10% by mass or more with respect to a total solid content of the composition,

the content of the compounds that generate an acid upon irradiation with actinic rays or radiation is 10% by mass or more with respect to the total solid content of the composition, and

the acid-decomposable resin has a halogen atom in a repeating unit other than the repeating unit having a group that generates an acid upon irradiation with actinic rays or radiation.

Coferons and methods of making and using them

The present invention is directed to a monomer useful in preparing therapeutic compounds. The monomer includes one or more pharmacophores which potentially binds to a target molecule with a dissociation constant of less than 300 μM and a linker element connected to the pharmacophore. The linker element has a molecular weight less than 500 daltons, is connected, directly or indirectly through a connector, to the pharmacophore.

Coferons and methods of making and using them

The present invention is directed to a monomer useful in preparing therapeutic compounds. The monomer includes one or more pharmacophores which potentially binds to a target molecule with a dissociation constant of less than 300 μM and a linker element connected to the pharmacophore. The linker element has a molecular weight less than 500 daltons, is connected, directly or indirectly through a connector, to the pharmacophore.

Carbocyclic sulfone RORγ modulators

Described are RORγ modulators of the formula (I), or stereoisomers, tautomers, pharmaceutically acceptable salts, solvates, or prodrugs thereof, wherein all substituents are defined herein. Also provided are pharmaceutical compositions comprising the same. Such compounds and compositions are useful in methods for modulating RORγ activity in a cell and methods for treating a subject suffering from a disease or disorder in which the subject would therapeutically benefit from modulation of RORγ activity, for example, autoimmune and/or inflammatory disorders. ##STR00001##

Carbocyclic sulfone RORγ modulators

Described are RORγ modulators of the formula (I), or stereoisomers, tautomers, pharmaceutically acceptable salts, solvates, or prodrugs thereof, wherein all substituents are defined herein. Also provided are pharmaceutical compositions comprising the same. Such compounds and compositions are useful in methods for modulating RORγ activity in a cell and methods for treating a subject suffering from a disease or disorder in which the subject would therapeutically benefit from modulation of RORγ activity, for example, autoimmune and/or inflammatory disorders. ##STR00001##