Provided are: a radical polymerization initiator which has excellent sensitivity and solubility in water; a composition containing the same; a cured product of the composition; a method of producing the cured product; and a compound. The radical polymerization initiator contains a compound represented by Formula (A) below (wherein Z.sup.1 represents a direct bond or the like; Z.sup.2 represents —C(R.sup.102).sub.2— or the like; R.sup.1 to R.sup.8 each represent a hydrogen atom or the like, or a group containing a salt-forming group, which is represented by Formula (B1) below (wherein L.sub.1 represents a direct bond or the like, B represents an acidic group salt or the like, b represents 1 to 10, and the asterisk (*) represents a binding site), at least one of R.sup.1 to R.sup.8 is the group containing a salt-forming group; R.sup.101 and the like each represent a hydrogen atom or the like; one or more hydrogen atoms in the alkyl group and the like used as R.sup.1 to R.sup.8 and the like are optionally substituted with an ethylenically unsaturated group or the like; one or more methylene groups in R.sup.1 to R.sup.8 and the like are optionally substituted with a double bond or the like; adjacent groups such as R.sup.1 and R.sup.2 are optionally bound together to, form a ring and optionally form a fused ring with a benzene ring in Formula (A); and represents a hydrogen atom or the like). ##STR00001##

Provided are: a radical polymerization initiator which has excellent sensitivity and solubility in water; a composition containing the same; a cured product of the composition; a method of producing the cured product; and a compound. The radical polymerization initiator contains a compound represented by Formula (A) below (wherein Z.sup.1 represents a direct bond or the like; Z.sup.2 represents —C(R.sup.102).sub.2— or the like; R.sup.1 to R.sup.8 each represent a hydrogen atom or the like, or a group containing a salt-forming group, which is represented by Formula (B1) below (wherein L.sub.1 represents a direct bond or the like, B represents an acidic group salt or the like, b represents 1 to 10, and the asterisk (*) represents a binding site), at least one of R.sup.1 to R.sup.8 is the group containing a salt-forming group; R.sup.101 and the like each represent a hydrogen atom or the like; one or more hydrogen atoms in the alkyl group and the like used as R.sup.1 to R.sup.8 and the like are optionally substituted with an ethylenically unsaturated group or the like; one or more methylene groups in R.sup.1 to R.sup.8 and the like are optionally substituted with a double bond or the like; adjacent groups such as R.sup.1 and R.sup.2 are optionally bound together to, form a ring and optionally form a fused ring with a benzene ring in Formula (A); and represents a hydrogen atom or the like). ##STR00001##

Disclosed are a salt represented by formula (I), an acid generator, and a resist composition:

##STR00001##

wherein R.sup.1, R.sup.2 and R.sup.3 each represent a hydroxy group, *—O—R.sup.10, *—O-L.sup.10-CO—O—R.sup.10, etc.; L.sup.10 represents an alkanediyl group; R.sup.10 represents an acid-labile group; R.sup.4 to R.sup.9 each represent a halogen atom, a haloalkyl group, etc.; A.sup.1, A.sup.2 and A.sup.3 each represent a hydrocarbon group, etc.; m1 and m7 represent an integer of 0 to 5, m2 to m6, m8 and m9 represent an integer of 0 to 4, 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X.sup.4 represents a single bond, —CH.sub.2—, etc.; and Al.sup.− represents an organic anion.

Provides a type of gold(III) complex supported by tetradentate ligand having a structure of formula (I). The light-emitting device prepared by using the complex as a light-emitting layer material or dopant in the light-emitting device has a high external quantum efficiency, and a low efficiency roll-off. In addition, the preparation process of the tetradentate ligand provided in the present disclosure is simple and the yield is satisfactory. More importantly, the preparation reaction of the material is controllable and stable, and has a good reproducibility, and is suitable for industrial application.

##STR00001##

The present disclosure provides an antibacterial hydrophilic compound. The antibacterial hydrophilic compound may react, induced by light through a hydrogen abstraction group in the structural formula thereof, with a C—H group and thus bind to a surface of a material having the C—H group (for example, chemical fibers such as polyester, chinlon, and the like; plastics, rubbers, and other similar materials), which can impart a durable antibacterial activity and hydrophilicity to the material. The antibacterial hydrophilic compound has a relatively strong binding force to the surface of the material without damaging the mechanical properties of the raw material. The present disclosure also provides a modified material that is modified by the antibacterial hydrophilic compound.

Latent photoinitiator compounds are described, as well as compositions containing such compounds and their uses in photoinitiated methods for producing photoresist structured.

##STR00001##

Latent photoinitiator compounds are described, as well as compositions containing such compounds and their uses in photoinitiated methods for producing photoresist structured.

##STR00001##

The present disclosure provides an antibacterial hydrophilic compound. The antibacterial hydrophilic compound may react, induced by light through a hydrogen abstraction group in the structural formula thereof, with a C—H group and thus bind to a surface of a material having the C—H group (for example, chemical fibers such as polyester, chinlon, and the like; plastics, rubbers, and other similar materials), which can impart a durable antibacterial activity and hydrophilicity to the material. The antibacterial hydrophilic compound has a relatively strong binding force to the surface of the material without damaging the mechanical properties of the raw material. The present disclosure also provides a modified material that is modified by the antibacterial hydrophilic compound.

The present invention concerns type II photoinitiators for the free-radical crosslinking of silicone compositions, in particular acrylic silicone compositions. The present invention concerns a silicone composition C1 that can be crosslinked by exposure to radiation with a wavelength of between 300 and 450 nm, comprising: —at least one organopolysiloxane A comprising at least one methacrylate group bonded to a silicon atom, at least one organohydrogenopolysiloxane H comprising at least two, and preferably at least three hydrogen atoms each bonded to different silicon atoms, and—at least one free-radical photoinitiator P. The present invention also concerns the provision of a silicone composition that can be polymerized or crosslinked by free-radical process comprising a type II photoinitiator system suitable for crosslinking silicone compositions, in particular by exposure to radiation, and absorbing light radiation with a wavelength greater than 300 nm.

The present invention concerns type II photoinitiators for the free-radical crosslinking of silicone compositions, in particular acrylic silicone compositions. The present invention concerns a silicone composition C1 that can be crosslinked by exposure to radiation with a wavelength of between 300 and 450 nm, comprising:—at least one organopolysiloxane A comprising at least one methacrylate group bonded to a silicon atom, at least one organohydrogenopolysiloxane H comprising at least two, and preferably at least three hydrogen atoms each bonded to different silicon atoms, and—at least one free-radical photoinitiator P. The present invention also concerns the provision of a silicone composition that can be polymerized or crosslinked by free-radical process comprising a type II photoinitiator system suitable for crosslinking silicone compositions, in particular by exposure to radiation, and absorbing light radiation with a wavelength greater than 300 nm.