There are disclosed, inter alia, methods of inhibiting an E1 enzyme, and compounds useful for inhibiting an E1 enzyme.

There are disclosed, inter alia, methods of inhibiting an E1 enzyme, and compounds useful for inhibiting an E1 enzyme.

A novel onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition has a high sensitivity and reduced acid diffusion and is improved in exposure latitude, MEF, and LWR. ##STR00001##

A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W.sub.1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W.sub.2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M.sup.+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source. ##STR00001##

A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W.sub.1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W.sub.2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M.sup.+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source. ##STR00001##

The present invention belongs to the field of medical technology and relates to a class of functional small molecules targeting proteolysis pathways, a preparation and an application thereof. Specifically, the present invention relates to functional small molecules represented by formula (M) and pharmaceutically acceptable salts thereof, as well as the application of said compounds and pharmaceutical compositions thereof in the preparation of tumor-treating drugs. The functional small molecules are obtained by means of linking a compound containing a peroxide bridge linkage and a substrate of an E3 ubiquitin ligase complex. The related functional molecules can promiscuously target and bind to multiple proteins comprising functional proteins in the proteolysis pathway and have anti-tumor biological activity.

##STR00001##

The present invention belongs to the field of medical technology and relates to a class of functional small molecules targeting proteolysis pathways, a preparation and an application thereof. Specifically, the present invention relates to functional small molecules represented by formula (M) and pharmaceutically acceptable salts thereof, as well as the application of said compounds and pharmaceutical compositions thereof in the preparation of tumor-treating drugs. The functional small molecules are obtained by means of linking a compound containing a peroxide bridge linkage and a substrate of an E3 ubiquitin ligase complex. The related functional molecules can promiscuously target and bind to multiple proteins comprising functional proteins in the proteolysis pathway and have anti-tumor biological activity.

##STR00001##

The present invention is directed to an efficient process for preparing benzoxazole derivatives comprising the step of reacting a 4-Amino-3-hydroxybenzoic acid compound of Formula III with a 3,5-Dichlorophenyl ortho ester compound of Formula I to provide the compound of Formula I

##STR00001##

wherein R.sup.1, R.sup.2a, R.sup.2b and R.sup.2c are as described herein.

The present invention is directed to an efficient process for preparing benzoxazole derivatives comprising the step of reacting a 4-Amino-3-hydroxybenzoic acid compound of Formula III with a 3,5-Dichlorophenyl ortho ester compound of Formula I to provide the compound of Formula I

##STR00001##

wherein R.sup.1, R.sup.2a, R.sup.2b and R.sup.2c are as described herein.

Compositions having enhanced cannabicyclol (CBL) or CBL derivative concentrations are disclosed herein as are methods of synthesizing CBL and CBL derivative in high-purity form. Relative to conventional methods, the methods of the present disclosure may: (i) be better suited to large-scale conditions in that they do not require dangerous and/or toxic solvents and/or reagents; (ii) be more tolerant of complex starting compositions, such as cannabinoid extracts, isolates and/or distillates; (iii) provide CBL and/or CBL derivative at higher yield; (iv) provide easier methods to purify product mixtures comprising CBL and/or CBL derivative; (v) provide product mixtures that comprise unique ratios of CBL or CBL derivative relative to other cannabinoids; (vi) provide product mixtures with reduced THC concentrations and/or (vii) provide artificial resins having of a mixture cannabinoids that cannot be produced by extracting cannabis plant material.