The invention relates to polyoxometalates represented by the formula (A.sub.n)m.sup.+[(MR′.sub.t).sub.sO.sub.yH.sub.qR.sub.z(X.sub.8W.sub.48+rO.sub.184+4r)].sup.m− or solvates thereof, corresponding supported polyoxometalates, and processes for their preparation, as well as corresponding metal cluster units, optionally in the form of a dispersion in a liquid carrier medium or immobilized on a solid support, and processes for their preparation, as well as their use in conversion of organic substrate.

The invention relates to polyoxometalates represented by the formula (A.sub.n)m.sup.+[(MR′.sub.t).sub.sO.sub.yH.sub.qR.sub.z(X.sub.8W.sub.48+rO.sub.184+4r)].sup.m− or solvates thereof, corresponding supported polyoxometalates, and processes for their preparation, as well as corresponding metal cluster units, optionally in the form of a dispersion in a liquid carrier medium or immobilized on a solid support, and processes for their preparation, as well as their use in conversion of organic substrate.

The present invention relates to a selective method for carrying out the Buchwald-Hartwig coupling of biphenyl derivatives.

Organometallic precursors and methods of depositing high purity metal films are discussed. Some embodiments utilize a method comprising exposing a substrate surface to an organometallic precursor comprising one or more of molybdenum (Mo), tungsten (W), osmium (Os), technetium (Tc), manganese (Mn), rhenium (Re) or ruthenium (Ru), and an iodine-containing reactant comprising a species having a formula RI.sub.x, where R is one or more of a C.sub.1-C.sub.10 alkyl, C.sub.3-C.sub.10 cycloalkyl, C.sub.2-C.sub.10 alkenyl, or C.sub.2-C.sub.10 alkynyl group, I is an iodine group and x is in a range of 1 to 4 to form a carbon-less iodine-containing metal film. Some embodiments advantageously provide methods of forming metal films having low carbon content (e.g., having greater than or equal to 95% metal species on an atomic basis), without using an oxidizing agent or a reductant.

Organometallic precursors and methods of depositing high purity metal films are discussed. Some embodiments utilize a method comprising exposing a substrate surface to an organometallic precursor comprising one or more of molybdenum (Mo), tungsten (W), osmium (Os), technetium (Tc), manganese (Mn), rhenium (Re) or ruthenium (Ru), and an iodine-containing reactant comprising a species having a formula RI.sub.x, where R is one or more of a C.sub.1-C.sub.10 alkyl, C.sub.3-C.sub.10 cycloalkyl, C.sub.2-C.sub.10 alkenyl, or C.sub.2-C.sub.10 alkynyl group, I is an iodine group and x is in a range of 1 to 4 to form a carbon-less iodine-containing metal film. Some embodiments advantageously provide methods of forming metal films having low carbon content (e.g., having greater than or equal to 95% metal species on an atomic basis), without using an oxidizing agent or a reductant.

A display device including a laminate includes a wavelength selective absorption layer containing a resin, a dye including at least one of four specific dyes A to D, and an antifading agent for a dye, and includes a gas barrier layer, and a wavelength conversion material; the laminate includes a wavelength selective absorption layer containing a resin, a dye, and an electron migration-type antifading agent in which the energy level of the highest occupied molecular orbital and the lowest unoccupied molecular orbital satisfy a specific relational expression in relation to the dye, and includes the gas barrier layer; an organic electroluminescent display device includes this laminate. The gas barrier layer contains a crystalline resin, has a layer thickness of 0.1 μm to 10 μm, has a layer oxygen permeability of 60 cc/m.sup.2.Math.day.Math.atm or less, and is directly arranged on at least one surface of the wavelength selective absorption layer.

A display device including a laminate includes a wavelength selective absorption layer containing a resin, a dye including at least one of four specific dyes A to D, and an antifading agent for a dye, and includes a gas barrier layer, and a wavelength conversion material; the laminate includes a wavelength selective absorption layer containing a resin, a dye, and an electron migration-type antifading agent in which the energy level of the highest occupied molecular orbital and the lowest unoccupied molecular orbital satisfy a specific relational expression in relation to the dye, and includes the gas barrier layer; an organic electroluminescent display device includes this laminate. The gas barrier layer contains a crystalline resin, has a layer thickness of 0.1 μm to 10 μm, has a layer oxygen permeability of 60 cc/m.sup.2.Math.day.Math.atm or less, and is directly arranged on at least one surface of the wavelength selective absorption layer.

The disclosure describes chiral P(V)-based reagents and their uses for the modular, scalable, and stereospecific synthesis of chiral phosphines, phosphine oxides and particular oligonucleotides.

The disclosure describes chiral P(V)-based reagents and their uses for the modular, scalable, and stereospecific synthesis of chiral phosphines, phosphine oxides and particular oligonucleotides.

New bisindenyl ligand complexes and catalysts comprising those complexes. The invention is directed to improving the manufacturing of specific C1-symmetric bisindenyl complexes by modifying one of the indenyl ligands in order to improve the selectivity of the complex synthesis towards the desired anti-isomer, increase the yield and simplify the purification of the complex. The invention also relates to the use of the new bisindenyl metallocene catalysts for the production of polypropylene homopolymers or propylene copolymers.