C08F112/14

Inorganic-Polymeric Hybrid Solid-State Electrolytes, Lithium Batteries Containing Same, and Production Processes
20230231181 · 2023-07-20 · ·

A hybrid solid electrolyte particulate (or multiple particulates) for use in a rechargeable lithium battery cell, wherein the particulate comprises one or more than one inorganic solid electrolyte particles encapsulated by a shell of polymer electrolyte wherein the hybrid solid electrolyte particulate has a lithium-ion conductivity from 10.sup.−6 S/cm to 5×10.sup.−2 S/cm and both the inorganic solid electrolyte and the polymer electrolyte individually have a lithium-ion conductivity no less than 10.sup.31 6 S/cm. Also provided is a lithium-ion or lithium metal cell containing multiple hybrid solid electrolyte particulates in the anode, cathode and/or the separator. Processes for producing hybrid solid electrolyte particulates are also disclosed.

FLAME-RETARDANT POLYMERIC COMPOSITIONS
20230125570 · 2023-04-27 ·

A polymeric composition includes a silane functionalized polyolefin, a brominated flame retardant having a Temperature of 5% Mass Loss from 300° C. to 700° C. as measured according to Thermogravimetric Analysis, wherein the brominated flame retardant is polymeric and has a weight average molecular weight of from 1,000 g/mol to 30,000 g/mol as measured using Gel Permeation Chromatography, and antimony trioxide. The polymeric composition has an antimony (Sb) to bromine (Br) molar ratio (Sb:Br molar ratio) of 0.35 to 0.98.

RESIST PATTERN FORMATION METHOD
20230127914 · 2023-04-27 ·

A resist pattern formation method including forming a resist film on a support by using a resist composition; exposing the resist film; and subjecting the exposed resist film to alkali development to form a positive-tone resist pattern. The resist composition contains a first resin component and a second resin component. The first resin component contains a polymeric compound having a constitutional unit derived from acrylic acid in which a hydrogen atom bonded to a carbon atom at an α-position may be substituted with a substituent, and the second resin component contains a polymeric compound having both a constitutional unit containing a phenolic hydroxyl group and a constitutional unit containing an acid decomposable group having a polarity that is increased under action of acid.

Polylactide/silicon-containing block copolymers for nanolithography

The present invention includes a diblock copolymer system that self-assembles at very low molecular weights to form very small features. In one embodiment, one polymer in the block copolymer contains silicon, and the other polymer is a polylactide. In one embodiment, the block copolymer is synthesized by a combination of anionic and ring opening polymerization reactions. In one embodiment, the purpose of this block copolymer is to form nanoporous materials that can be used as etch masks in lithographic patterning.

Polylactide/silicon-containing block copolymers for nanolithography

The present invention includes a diblock copolymer system that self-assembles at very low molecular weights to form very small features. In one embodiment, one polymer in the block copolymer contains silicon, and the other polymer is a polylactide. In one embodiment, the block copolymer is synthesized by a combination of anionic and ring opening polymerization reactions. In one embodiment, the purpose of this block copolymer is to form nanoporous materials that can be used as etch masks in lithographic patterning.

Polylactide/silicon-containing block copolymers for nanolithography

The present invention includes a diblock copolymer system that self-assembles at very low molecular weights to form very small features. In one embodiment, one polymer in the block copolymer contains silicon, and the other polymer is a polylactide. In one embodiment, the block copolymer is synthesized by a combination of anionic and ring opening polymerization reactions. In one embodiment, the purpose of this block copolymer is to form nanoporous materials that can be used as etch masks in lithographic patterning.

ALKENYL (PERFLUOROALKYL) PHOSPHINIC ACIDS

The invention relates to alkenyl(perfluoroalkyl)phosphinic acids, to the preparation and intermediates thereof, to the use thereof as monomers for the preparation of oligomers and/or polymers, to the corresponding oligomers/polymers, to the corresponding support materials comprising the oligomers/polymers, and to the use thereof as ion exchangers, as catalysts or extraction medium and corresponding salts thereof.

ALKENYL (PERFLUOROALKYL) PHOSPHINIC ACIDS

The invention relates to alkenyl(perfluoroalkyl)phosphinic acids, to the preparation and intermediates thereof, to the use thereof as monomers for the preparation of oligomers and/or polymers, to the corresponding oligomers/polymers, to the corresponding support materials comprising the oligomers/polymers, and to the use thereof as ion exchangers, as catalysts or extraction medium and corresponding salts thereof.

POLYMERIC HYBRID PARTICLE CONTAINING NANO PARTICLES AND USES
20170240435 · 2017-08-24 · ·

A polymeric hybrid particle or composition comprising of polymers, such as polystyrene or methylated polystyrenes with cyclic amines and their halogenated forms, and nanoparticles (NPs). The method for the preparation thereof and uses as nano-adsorbent, or a biocide, or a dual function combination of biocide and adsorbent for use in a fluid system for the purpose of purification or remediation are also disclosed.