Provided is a cross-linkable arylamine-based compound represented by Formula 1a or 1b, a polymer obtained therefrom, a light-emitting device including the polymer, and an electronic apparatus including the light-emitting device. The light-emitting device includes a first electrode; a second electrode facing the first electrode; and an intermediate layer between the first electrode and the second electrode and comprising an emission layer, wherein the intermediate layer includes at least one of the arylamine-based polymer formed by cross-linking a cross-linkable arylamine-based compound represented by Formula 1a or 1b.

Provided is a cross-linkable arylamine-based compound represented by Formula 1a or 1b, a polymer obtained therefrom, a light-emitting device including the polymer, and an electronic apparatus including the light-emitting device. The light-emitting device includes a first electrode; a second electrode facing the first electrode; and an intermediate layer between the first electrode and the second electrode and comprising an emission layer, wherein the intermediate layer includes at least one of the arylamine-based polymer formed by cross-linking a cross-linkable arylamine-based compound represented by Formula 1a or 1b.

The present disclosure relates to an unsaturated group-containing resin, a method of preparing the same, and a composition including the same, wherein the unsaturated group-containing resin includes an oligomer represented by Chemical Formula 1 and an alkali metal ion, wherein an amount of the oligomer with n being 0 in Chemical Formula 1 is 80 wt % or less with respect to the total weight of the resin, and an amount of the alkali metal ion is 1 ppm to 30 ppm.

##STR00001##

In Chemical Formula 1, R.sub.1 to R.sub.3 and n are as described in the present specification.

The present disclosure relates to an unsaturated group-containing resin, a method of preparing the same, and a composition including the same, wherein the unsaturated group-containing resin includes an oligomer represented by Chemical Formula 1 and an alkali metal ion, wherein an amount of the oligomer with n being 0 in Chemical Formula 1 is 80 wt % or less with respect to the total weight of the resin, and an amount of the alkali metal ion is 1 ppm to 30 ppm.

##STR00001##

In Chemical Formula 1, R.sub.1 to R.sub.3 and n are as described in the present specification.

The present invention provides an inkjet ink comprising: 10-50% by weight of one or more monomers each having a log P.sub.octanol/water value of 5.0 or more, based on the total weight of the ink; a photoinitiator package comprising one or more photoinitiators each having a log P.sub.octanol/water value of less than 4.0, and one or more photoinitiators selected from (I) and mixtures thereof, wherein n is a value from 1 to 10 and a+b+c is a value from 1 to 20; and wherein the one or more photoinitiators each having a log P.sub.octanol/water value of less than 4.0 are present in the ink in an amount of 0.5-4.5% by weight, based on the total weight of the ink. The present invention also provides a method of printing the inkjet ink of the present invention.

The present invention provides an inkjet ink comprising: 10-50% by weight of one or more monomers each having a log P.sub.octanol/water value of 5.0 or more, based on the total weight of the ink; a photoinitiator package comprising one or more photoinitiators each having a log P.sub.octanol/water value of less than 4.0, and one or more photoinitiators selected from (I) and mixtures thereof, wherein n is a value from 1 to 10 and a+b+c is a value from 1 to 20; and wherein the one or more photoinitiators each having a log P.sub.octanol/water value of less than 4.0 are present in the ink in an amount of 0.5-4.5% by weight, based on the total weight of the ink. The present invention also provides a method of printing the inkjet ink of the present invention.

A resist pattern formation method including forming a resist film on a support by using a resist composition; exposing the resist film; and subjecting the exposed resist film to alkali development to form a positive-tone resist pattern. The resist composition contains a first resin component and a second resin component. The first resin component contains a polymeric compound having a constitutional unit derived from acrylic acid in which a hydrogen atom bonded to a carbon atom at an α-position may be substituted with a substituent, and the second resin component contains a polymeric compound having both a constitutional unit containing a phenolic hydroxyl group and a constitutional unit containing an acid decomposable group having a polarity that is increased under action of acid.

Compositions are provided for efficient uranium extraction, for example from wastewater, seawater, or other water sources. The compositions can include a functionalized porous organic polymer functionalized with one or more uranium binding moieties, e.g. having a plurality of amidoxime or amidrazone groups covalently attached thereto. The compositions can include covalent organic frameworks, porous aromatic frameworks, and various porous organic polymers, especially those having a hierarchical pore size distribution over a range of pore sizes. The compositions can have functional groups such as amidoxime or an amidrazone covalently attached thereto. The hierarchical pore size distribution can be determined based upon at least 60% of the pore sizes in the range of pore sizes having a pore volume of at least 0.01 cm.sup.3 g.sup.−1 in the pore size distribution at 77 K. Methods of making the compositions and methods of using the compositions are also provided.

Compositions are provided for efficient uranium extraction, for example from wastewater, seawater, or other water sources. The compositions can include a functionalized porous organic polymer functionalized with one or more uranium binding moieties, e.g. having a plurality of amidoxime or amidrazone groups covalently attached thereto. The compositions can include covalent organic frameworks, porous aromatic frameworks, and various porous organic polymers, especially those having a hierarchical pore size distribution over a range of pore sizes. The compositions can have functional groups such as amidoxime or an amidrazone covalently attached thereto. The hierarchical pore size distribution can be determined based upon at least 60% of the pore sizes in the range of pore sizes having a pore volume of at least 0.01 cm.sup.3 g.sup.−1 in the pore size distribution at 77 K. Methods of making the compositions and methods of using the compositions are also provided.

Compositions are provided for efficient uranium extraction, for example from wastewater, seawater, or other water sources. The compositions can include a functionalized porous organic polymer functionalized with one or more uranium binding moieties, e.g. having a plurality of amidoxime or amidrazone groups covalently attached thereto. The compositions can include covalent organic frameworks, porous aromatic frameworks, and various porous organic polymers, especially those having a hierarchical pore size distribution over a range of pore sizes. The compositions can have functional groups such as amidoxime or an amidrazone covalently attached thereto. The hierarchical pore size distribution can be determined based upon at least 60% of the pore sizes in the range of pore sizes having a pore volume of at least 0.01 cm.sup.3 g.sup.−1 in the pore size distribution at 77 K. Methods of making the compositions and methods of using the compositions are also provided.