A method for producing an iodine-containing compound includes reacting a halogen-containing organic iodine compound and a compound containing a reactive carbon-carbon double bond in the presence of a compound of Formula (21) or Formula (22). Each of R.sup.21, R.sup.23 and R.sup.24 represents a hydrogen atom, an iodine atom, or an organic group having from 1 to 20 carbon atoms; R.sup.22 represents a hydrogen atom, an iodine atom, an organic group having from 1 to 20 carbon atoms, or a boron-containing group; R.sup.25 represents a hydrogen atom, an iodine atom, an organic group having from 1 to 20 carbon atoms, or a silicon-containing group; and each of A.sup.1 and A.sup.2 represents a hydrogen atom, a chlorine atom, a bromine atom, or an iodine atom.

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A method for producing an iodine-containing compound includes reacting a halogen-containing organic iodine compound and a compound containing a reactive carbon-carbon double bond in the presence of a compound of Formula (21) or Formula (22). Each of R.sup.21, R.sup.23 and R.sup.24 represents a hydrogen atom, an iodine atom, or an organic group having from 1 to 20 carbon atoms; R.sup.22 represents a hydrogen atom, an iodine atom, an organic group having from 1 to 20 carbon atoms, or a boron-containing group; R.sup.25 represents a hydrogen atom, an iodine atom, an organic group having from 1 to 20 carbon atoms, or a silicon-containing group; and each of A.sup.1 and A.sup.2 represents a hydrogen atom, a chlorine atom, a bromine atom, or an iodine atom.

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A resist topcoat composition and a method of forming patterns utilizing the resist topcoat composition are provided. The resist topcoat composition includes a copolymer including a first structural unit represented by Chemical Formula M-1 and a second structural unit represented by Chemical Formula M-2; and a solvent.

A resist topcoat composition and a method of forming patterns utilizing the resist topcoat composition are provided. The resist topcoat composition includes a copolymer including a first structural unit represented by Chemical Formula M-1 and a second structural unit represented by Chemical Formula M-2; and a solvent.

The invention relates to a method for degassing elastomer-containing media, such as elastomer solutions and dispersions in particular, and degassing devices (1) for carrying out said method.

The invention relates to a method for degassing elastomer-containing media, such as elastomer solutions and dispersions in particular, and degassing devices (1) for carrying out said method.

Described herein is a composition comprising a fluorinated polysulfinic acid or a salt thereof having the following formula (I): ##STR00001##
wherein X.sub.1, X.sub.2, and X.sub.3 are independently selected from H, F, Cl, Br, I, CF.sub.3, and CH.sub.3 and wherein at least one of X.sub.1, X.sub.2, or X.sub.3 is H; R.sub.1 is a linking group; Z.sub.1 and Z.sub.2 are independently selected from Br, Cl, I, F, CF.sub.3, and a perfluorinated alkyl group; M is a cation; p is 0 or 1; and n is at least 2. Also described is a method of making the partially fluorinated polysulfinic acid or salt thereof.

Described herein is a composition comprising a fluorinated polysulfinic acid or a salt thereof having the following formula (I): ##STR00001##
wherein X.sub.1, X.sub.2, and X.sub.3 are independently selected from H, F, Cl, Br, I, CF.sub.3, and CH.sub.3 and wherein at least one of X.sub.1, X.sub.2, or X.sub.3 is H; R.sub.1 is a linking group; Z.sub.1 and Z.sub.2 are independently selected from Br, Cl, I, F, CF.sub.3, and a perfluorinated alkyl group; M is a cation; p is 0 or 1; and n is at least 2. Also described is a method of making the partially fluorinated polysulfinic acid or salt thereof.

A method for producing an iodine-containing compound includes reacting a halogen-containing organic iodine compound and a compound containing a reactive carbon-carbon double bond in the presence of a compound of Formula (21) or Formula (22). Each of R.sup.21, R.sup.23 and R.sup.24 represents a hydrogen atom, an iodine atom, or an organic group having from 1 to 20 carbon atoms; R.sup.22 represents a hydrogen atom, an iodine atom, an organic group having from 1 to 20 carbon atoms, or a boron-containing group; R.sup.25 represents a hydrogen atom, an iodine atom, an organic group having from 1 to 20 carbon atoms, or a silicon-containing group; and each of A.sup.1 and A.sup.2 represents a hydrogen atom, a chlorine atom, a bromine atom, or an iodine atom. ##STR00001##

A method for producing an iodine-containing compound includes reacting a halogen-containing organic iodine compound and a compound containing a reactive carbon-carbon double bond in the presence of a compound of Formula (21) or Formula (22). Each of R.sup.21, R.sup.23 and R.sup.24 represents a hydrogen atom, an iodine atom, or an organic group having from 1 to 20 carbon atoms; R.sup.22 represents a hydrogen atom, an iodine atom, an organic group having from 1 to 20 carbon atoms, or a boron-containing group; R.sup.25 represents a hydrogen atom, an iodine atom, an organic group having from 1 to 20 carbon atoms, or a silicon-containing group; and each of A.sup.1 and A.sup.2 represents a hydrogen atom, a chlorine atom, a bromine atom, or an iodine atom. ##STR00001##