Disclosed are monomers for copolymerization with alkenes, dienes, vinyl compounds, and/or vinylidene compounds, a process for preparing a copolymer, a copolymer prepared by the process, a sulfur-crosslinkable rubber mixture, and the use of the sulfur-crosslinkable rubber mixture for production of motor vehicle tires. In one embodiment, the monomer has the formula A-SP, wherein A is a chemical group containing at least one CC aliphatic double bond, S is a sulfur atom, and P is a protecting group.

A radiation-sensitive composition is to be used in exposure with an extreme ultraviolet ray or an electron beam, and includes a first polymer and a solvent, wherein the first polymer includes a first structural unit including: at least one metal atom; and at least one carbon atom that each bonds to the metal atom by a chemical bond and does not constitute an unsaturated bond, and at least one chemical bond is a covalent bond. Every chemical bond is preferably a covalent bond. The metal atom is preferably tin, germanium, lead or a combination thereof.

Provided is a coating agent which can be stably immobilized on metal surface, and which can give blood compatibility. Provided is a copolymer which is usable as the above-mentioned coating agent that comprises PEG segment and a segment which has a phosphoric acid residue (PO(OH).sub.2) and a cyclic nitroxideradical randomly as a side chain or a pendant group.

Provided is a coating agent which can be stably immobilized on metal surface, and which can give blood compatibility. Provided is a copolymer which is usable as the above-mentioned coating agent that comprises PEG segment and a segment which has a phosphoric acid residue (PO(OH).sub.2) and a cyclic nitroxideradical randomly as a side chain or a pendant group.

There is provided a resist composition containing a resin. The resin includes a repeating unit (a) having one or more *OY.sub.0 groups substituted for an aromatic ring; and a phenolic hydroxyl group (b) or a partial structure (c) represented by Formula (X). Here, the *OY.sub.0 group is a group that is decomposed due to an action of an acid to generate a phenolic hydroxyl group, and Y.sub.0 is a specific protective group. In a case where the repeating unit (a) includes none of the phenolic hydroxyl group (b) and the partial structure (c), the repeating unit (a) is a repeating unit in which the *OY.sub.0 group is decomposed due to an action of an acid to generate two or more phenolic hydroxyl groups.

##STR00001##

A colored composition of the present invention includes a dye compound having an anionic moiety including at least one of a structure represented by the following General Formula (A1), a structure represented by the following General Formula (A2), and a structure containing a boron atom, and a dye structure having a cationic moiety, in which the anionic moiety and the cationic moiety are bonded to each other via a covalent bond and present in the same molecule; a curable compound; and a solvent.

##STR00001## (in General Formula (A1), R.sup.1 and R.sup.2 each independently represent SO.sub.2 or CO)

##STR00002## (in General Formula (A2), R.sup.3 represents SO.sub.2 or CO; and R.sup.4 and R.sup.5 each independently represent SO.sub.2, CO, or CN)

A colored composition of the present invention includes a dye compound having an anionic moiety including at least one of a structure represented by the following General Formula (A1), a structure represented by the following General Formula (A2), and a structure containing a boron atom, and a dye structure having a cationic moiety, in which the anionic moiety and the cationic moiety are bonded to each other via a covalent bond and present in the same molecule; a curable compound; and a solvent.

##STR00001## (in General Formula (A1), R.sup.1 and R.sup.2 each independently represent SO.sub.2 or CO)

##STR00002## (in General Formula (A2), R.sup.3 represents SO.sub.2 or CO; and R.sup.4 and R.sup.5 each independently represent SO.sub.2, CO, or CN)

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having (A) a repeating unit having a group that is decomposed by the action of an acid to generate a carboxylic acid and represented by a specified general formula (a) and (B) a repeating unit having a group that is decomposed by irradiation with an actinic ray or a radiation to generate an acid and represented by a specified general formula (b), and a solvent including a solvent having a boiling point of 150? C. or more, a solvent having a boiling point of 150? C. or more being contained in 45 mass % or more with respect to the total amount of the solvent.

A noncovalent soft elastomer includes a binary block copolymer composed of an A block and a B block and a solvent, wherein the B block has a noncovalent-bonding functional group, and the solvent is a nonvolatile liquid which has a property of dissolving the B block but not dissolving the A block and which forms a functional group capable of noncovalent-bonding of the B block.

A polymer comprising recurring units derived from a sulfonium salt of specific structure having a polymerizable group is coated to form a resist film which is amenable to precise micropatterning because of improved LWR, CDU and resolution.