A polymer comprising recurring units derived from a sulfonium salt of specific structure having a polymerizable group is coated to form a resist film which is amenable to precise micropatterning because of improved LWR, CDU and resolution.

The invention relates to alkenyl(perfluoroalkyl)phosphinic acids, to the preparation and intermediates thereof, to the use thereof as monomers for the preparation of oligomers and/or polymers, to the corresponding oligomers/polymers, to the corresponding support materials comprising the oligomers/polymers, and to the use thereof as ion exchangers, as catalysts or extraction medium and corresponding salts thereof.

Disclosed are photosensitive resin compositions capable of forming positive resin films with excellent heat shape retention. The photosensitive resin compositions comprises a polymer having a monomer unit represented by the following general formula (I) and a polyamideimide: ##STR00001##
where R.sup.1 is a single chemical bond or a divalent C1-C6 hydrocarbon group which may have a substituent, and R.sup.2 is a hydrogen or a monovalent C1-C6 hydrocarbon group which may have a substituent.

Disclosed are photosensitive resin compositions capable of forming positive resin films with excellent heat shape retention. The photosensitive resin compositions comprises a polymer having a monomer unit represented by the following general formula (I) and a polyamideimide: ##STR00001##
where R.sup.1 is a single chemical bond or a divalent C1-C6 hydrocarbon group which may have a substituent, and R.sup.2 is a hydrogen or a monovalent C1-C6 hydrocarbon group which may have a substituent.

A solid polymer electrolyte and a method of manufacturing the same are provided. More particularly, a solid polymer electrolyte having a high content of solids and exhibiting a flame retardant property and a method of manufacturing the same, wherein the solid polymer electrolyte includes a multifunctional acrylate-based polymer, a C2 to C10 polyalkylene oxide, a lithium salt and a non-aqueous solvent and wherein the multifunctional acrylate-based polymer is cross-linked with the polyalkylene oxide to form a semi-interpenetrating polymer network (semi-IPN).

A noncovalent soft elastomer includes a binary block copolymer composed of an A block and a B block and a solvent, wherein the B block has a noncovalent-bonding functional group, and the solvent is a nonvolatile liquid which has a property of dissolving the B block but not dissolving the A block and which forms a functional group capable of noncovalent-bonding of the B block.

A solid polymer electrolyte and a method of manufacturing the same are provided. More particularly, a solid polymer electrolyte having a high content of solids and exhibiting a flame retardant property and a method of manufacturing the same, wherein the solid polymer electrolyte includes a multifunctional acrylate-based polymer, a C2 to C10 polyalkylene oxide, a lithium salt and a non-aqueous solvent and wherein the multifunctional acrylate-based polymer is cross-linked with the polyalkylene oxide to form a semi-interpenetrating polymer network (semi-IPN).

The invention relates to alkenyl(perfluoroalkyl)phosphinic acids, to the preparation and intermediates thereof, to the use thereof as monomers for the preparation of oligomers and/or polymers, to the corresponding oligomers/polymers, to the corresponding support materials comprising the oligomers/polymers, and to the use thereof as ion exchangers, as catalysts or extraction medium and corresponding salts thereof.

Disclosed are photosensitive resin compositions capable of forming positive resin films with excellent heat shape retention. The photosensitive resin compositions comprises a polymer having a monomer unit represented by the following general formula (I) and a polyamideimide:

##STR00001##

where R.sup.1 is a single chemical bond or a divalent C1-C6 hydrocarbon group which may have a substituent, and R.sup.2 is a hydrogen or a monovalent C1-C6 hydrocarbon group which may have a substituent.

Disclosed are photosensitive resin compositions capable of forming positive resin films with excellent heat shape retention. The photosensitive resin compositions comprises a polymer having a monomer unit represented by the following general formula (I) and a polyamideimide:

##STR00001##

where R.sup.1 is a single chemical bond or a divalent C1-C6 hydrocarbon group which may have a substituent, and R.sup.2 is a hydrogen or a monovalent C1-C6 hydrocarbon group which may have a substituent.