A coating for a medical device is described. The coating comprises: a surface layer; and optionally a base layer; wherein the surface layer comprises a polymer chain attached to an anti-clotting group, wherein the anti-clotting group is selected from a sulfonic acid group, a sulfonamide group, a sulfamic acid group, a hydrogen sulfate group and a conjugate base thereof. Also described is a medical device comprising the coating, and uses and methods involving the coating and the medical device.

The present invention refers to acrylic hydroxyalkyl amide functionalized polymers that can be useful as crosslinking agents or selfcrosslinking systems and to a process for manufacturing them.

Provided is a polishing composition which contains a water-soluble polymer and is suitable for reducing LPDs. The polishing composition provided in this application includes an abrasive, a water-soluble polymer, and a basic compound. In the polishing composition, the content of a reaction product of a polymerization initiator and a polymerization inhibitor is 0.1 ppb or less of the polishing composition on a weight basis.

Provided is a zwitterionic polymer that has a zwitterion that includes an effect of improving the stability of proteins. This zwitterionic polymer is a polymeric protein stabilizer that exhibits a protein stabilizing effect even at a small addition amount of addition, and at the same time has an antioxidant capability. Also provided is a method for producing this zwitterionic polymer. This problem is solved by a zwitterionic polymer containing a repeating unit represented by formula (1) and having a number-average molecular weight of 1,000 to 1,000,000. On formula (1), R.sup.1 and R.sup.2 are each independently selected from a hydrogen atom; linear, branched or cyclic alkyl groups having 1 to 6 carbons; aromatic groups having 6 to 20 carbons; or alkylene groups having 1 to 6 carbons and formed by linking R.sup.1 to R.sup.2. R.sup.3 represents a hydrogen atom or a methyl group).

Aqueous compositions can be thickened without increasing stringiness, by using polymers of polyacrylic acid, poly(2-acryamide-2-methylpropanesulfonate), or salts thereof, having a weight average molecular weights of 500,000 to 8,000,000 as thickeners. The polymers contain no more than 10 mass % of polymers having a molecular weight of 10,000,00 or more, and/or contain no more than 10 mass % of polymers having more than three times the weight average molecular weight. Aqueous solutions of these polymers exhibit a low degree of stringiness, and are particularly useful as thickeners for cosmetics.

Aqueous compositions can be thickened without increasing stringiness, by using polymers of polyacrylic acid, poly(2-acryamide-2-methylpropanesulfonate), or salts thereof, having a weight average molecular weights of 500,000 to 8,000,000 as thickeners. The polymers contain no more than 10 mass % of polymers having a molecular weight of 10,000,00 or more, and/or contain no more than 10 mass % of polymers having more than three times the weight average molecular weight. Aqueous solutions of these polymers exhibit a low degree of stringiness, and are particularly useful as thickeners for cosmetics.

Provided is a polishing composition which contains a water-soluble polymer and is suitable for reducing LPDs. The polishing composition provided in this application includes an abrasive, a water-soluble polymer, and a basic compound. In the polishing composition, the content of a reaction product of a polymerization initiator and a polymerization inhibitor is 0.1 ppb or less of the polishing composition on a weight basis.

A photoresist composition, comprising a first polymer comprising a first repeating unit comprising an acid-labile group, and a second polymer comprising a repeating unit derived from one or more monomers of formula (4); a photoacid generator; and a solvent,

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wherein Z.sup.1, Z.sup.2, R.sup.1, R.sup.2, and L are as described herein, and P is a polymerizable group.

A liquid resin composition comprising: a first proportion of acryloyl morpholine monomers; a second proportion of a photoinitiator exhibiting photodissociation into reactive subspecies responsive to selective exposure to radiation within a spectrum, the reactive subspecies polymerizing the first proportion of acryloyl morpholine; a third proportion of a radiation blocker absorbing radiation within the spectrum to limit penetration depth of incident radiation within the spectrum in the liquid resin; a fourth proportion of a polymerization inhibitor limiting an average chain length of acryloyl morpholine polymer polymerized from the first proportion of acryloyl morpholine monomers; and a fifth proportion of a temperature-stabilizer increasing the heat-deflection temperature of acryloyl morpholine polymer polymerized from the first proportion of acryloyl morpholine monomers.

A liquid resin composition comprising: a first proportion of acryloyl morpholine monomers; a second proportion of a photoinitiator exhibiting photodissociation into reactive subspecies responsive to selective exposure to radiation within a spectrum, the reactive subspecies polymerizing the first proportion of acryloyl morpholine; a third proportion of a radiation blocker absorbing radiation within the spectrum to limit penetration depth of incident radiation within the spectrum in the liquid resin; a fourth proportion of a polymerization inhibitor limiting an average chain length of acryloyl morpholine polymer polymerized from the first proportion of acryloyl morpholine monomers; and a fifth proportion of a temperature-stabilizer increasing the heat-deflection temperature of acryloyl morpholine polymer polymerized from the first proportion of acryloyl morpholine monomers.