The present invention relates to a method for in situ biomimetic mineralization of polymeric hydrogels, where the incorporated CaP phase can be selectively tuned in chemical composition and morphology to mimic bone and dental mineral. The present invention also relates to a method to coat a substrate with apatite material, the resulting product and the use of the product.

The present disclosure relates to compositions that include at least one of

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where each of R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, and R.sub.6 includes at least one of a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom, and/or a halogen atom, each of R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, and R.sub.6 may be different or the same, and 1z50,000.

The present disclosure relates to compositions that include at least one of

##STR00001##

where each of R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, and R.sub.6 includes at least one of a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom, and/or a halogen atom, each of R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, and R.sub.6 may be different or the same, and 1z50,000.

Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising SiO linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.

Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising SiO linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.

Described herein, inter alia, are compositions and methods for using polymeric micellar nanoparticles for nuclear magnetic resonance imaging in a subject in need thereof.

Described herein, inter alia, are compositions and methods for using polymeric micellar nanoparticles for nuclear magnetic resonance imaging in a subject in need thereof.

Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising SiO linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.

Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising SiO linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.

A method for producing a copolymer for semiconductor lithography containing less metal impurities, and a method for purifying a polymerization initiator for production of the copolymer, are provided. The method for purifying a polymerization initiator to be used for production of a polymer includes a filtering step wherein a solution of a polymerization initiator dissolved in an organic solvent is allowed to pass through a filter having a nominal pore size of not more than 1.0 m, to reduce the sodium content of the polymerization initiator solution to not more than 300 ppb with respect to the weight of the polymerization initiator. Further, the method for producing a copolymer for semiconductor lithography includes a polymerization step wherein the polymer for semiconductor lithography is synthesized by a radical polymerization reaction in the presence of a polymerization initiator purified by the above purification method.