C08F20/02

POLYMER COMPOUND, INTERMEDIATE COMPOSITION, NEGATIVE ELECTRODE, ELECTRICITY STORAGE DEVICE, SLURRY FOR NEGATIVE ELECTRODES, METHOD FOR PRODUCING POLYMER COMPOUND, AND METHOD FOR PRODUCING NEGATIVE ELECTRODE

A polymer compound, which is used as a binder for a negative electrode of an electricity storage device, is obtained by condensation of a vinyl polymer that contains a carboxyl group and a third compound that is selected from among an aromatic multifunctional amine, phosphorous acid, phosphorous acid ester, trialkoxysilane, and phosphoric acid.

POLYMER COMPOUND, INTERMEDIATE COMPOSITION, NEGATIVE ELECTRODE, ELECTRICITY STORAGE DEVICE, SLURRY FOR NEGATIVE ELECTRODES, METHOD FOR PRODUCING POLYMER COMPOUND, AND METHOD FOR PRODUCING NEGATIVE ELECTRODE

A polymer compound, which is used as a binder for a negative electrode of an electricity storage device, is obtained by condensation of a vinyl polymer that contains a carboxyl group and a third compound that is selected from among an aromatic multifunctional amine, phosphorous acid, phosphorous acid ester, trialkoxysilane, and phosphoric acid.

Resin, resist composition and method for producing resist pattern

Disclosed is a resin comprising a structural unit derived from a compound represented by formula (I′) and a structural unit having an acid-labile group: ##STR00001## ##STR00002##
wherein R.sup.1 and R.sup.2 each independently represent an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom,
Ar represents an aromatic hydrocarbon group which may have a substituent,
L.sup.1 represents a group represented by formula (X.sup.1-1), etc.,
L.sup.11, L.sup.13, L.sup.15 and L.sup.17 each independently represent an alkanediyl group,
L.sup.12, L.sup.14, L.sup.16 and L.sup.18 each independently represent —O—, —CO—, —CO—O—, —O—CO— or —O—CO—O—, and
* and ** are bonds, and ** represents a bond to an iodine atom.

Fluorine-containing monomer, fluorine-containing polymer, pattern forming composition using same, and pattern forming method of same

Provided is a fluorine-containing polymer which has no perfluoroalkyl group of 4 or more carbon atoms and which, when formed together with a photoacid generator into a film, shows water repellency after film formation, but becomes hydrophilic by the action of an acid generated under light irradiation, and thus serves as a pattern forming material capable of forming a film with high sensitivity and resolution. A fluorine-containing polymer according to the present invention has a repeating unit of the formula (1) ##STR00001##
where R.sup.1 is a hydrogen atom, a fluorine atom or a C.sub.1-C.sub.10 alkyl group; R.sup.2 to R.sup.5 are each independently a hydrogen atom or a C.sub.1-C.sub.10 alkyl group; X is a single bond or a divalent group; Y is a C.sub.1-C.sub.3 fluoroalkyl or carboxylate (—COOR) group; R is a C.sub.1-C.sub.3 fluoroalkyl group; and seven or less of hydrogen atoms contained in the substituent group may be substituted with fluorine.

Fluorine-containing monomer, fluorine-containing polymer, pattern forming composition using same, and pattern forming method of same

Provided is a fluorine-containing polymer which has no perfluoroalkyl group of 4 or more carbon atoms and which, when formed together with a photoacid generator into a film, shows water repellency after film formation, but becomes hydrophilic by the action of an acid generated under light irradiation, and thus serves as a pattern forming material capable of forming a film with high sensitivity and resolution. A fluorine-containing polymer according to the present invention has a repeating unit of the formula (1) ##STR00001##
where R.sup.1 is a hydrogen atom, a fluorine atom or a C.sub.1-C.sub.10 alkyl group; R.sup.2 to R.sup.5 are each independently a hydrogen atom or a C.sub.1-C.sub.10 alkyl group; X is a single bond or a divalent group; Y is a C.sub.1-C.sub.3 fluoroalkyl or carboxylate (—COOR) group; R is a C.sub.1-C.sub.3 fluoroalkyl group; and seven or less of hydrogen atoms contained in the substituent group may be substituted with fluorine.

Method for Producing Polymer

A method for producing a polymer containing metal atoms or halogen atoms at the terminals thereof with excellent efficiency while minimizing or eliminating side reactions or the like is provided. The method can also freely control molecular weight characteristics of the polymer.

Polymer compound, intermediate composition, negative electrode, electricity storage device, slurry for negative electrodes, method for producing polymer compound, and method for producing negative electrode

A polymer compound, which is used as a binder for a negative electrode of an electricity storage device, is obtained by condensation of a vinyl polymer that contains a carboxyl group and a third compound that is selected from among an aromatic multifunctional amine, phosphorous acid, phosphorous acid ester, trialkoxysilane, and phosphoric acid.

Polymer compound, intermediate composition, negative electrode, electricity storage device, slurry for negative electrodes, method for producing polymer compound, and method for producing negative electrode

A polymer compound, which is used as a binder for a negative electrode of an electricity storage device, is obtained by condensation of a vinyl polymer that contains a carboxyl group and a third compound that is selected from among an aromatic multifunctional amine, phosphorous acid, phosphorous acid ester, trialkoxysilane, and phosphoric acid.

Fluorine-Containing Monomer, Fluorine-Containing Polymer, Pattern Forming Composition Using Same, and Pattern Forming Method of Same
20200089116 · 2020-03-19 ·

Provided is a fluorine-containing polymer which has no perfluoroalkyl group of 4 or more carbon atoms and which, when formed together with a photoacid generator into a film, shows water repellency after film formation, but becomes hydrophilic by the action of an acid generated under light irradiation, and thus serves as a pattern forming material capable of forming a film with high sensitivity and resolution. A fluorine-containing polymer according to the present invention has a repeating unit of the formula (1)

##STR00001##

where R.sup.1 is a hydrogen atom, a fluorine atom or a C.sub.1-C.sub.10 alkyl group; R.sup.2 to R.sup.5 are each independently a hydrogen atom or a C.sub.1-C.sub.10 alkyl group; X is a single bond or a divalent group; Y is a C.sub.1-C.sub.3 fluoroalkyl or carboxylate (COOR) group; R is a C.sub.1-C.sub.3 fluoroalkyl group; and seven or less of hydrogen atoms contained in the substituent group may be substituted with fluorine.

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Disclosed is a resin comprising a structural unit derived from a compound represented by formula (I) and a structural unit having an acid-labile group:

##STR00001## ##STR00002##

wherein R.sup.1 and R.sup.2 each independently represent an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom,

Ar represents an aromatic hydrocarbon group which may have a substituent,

L.sup.1 represents a group represented by formula (X.sup.1-1), etc.,

L.sup.11, L.sup.13, L.sup.15 and L.sup.17 each independently represent an alkanediyl group,

L.sup.12, L.sup.14, L.sup.16 and L.sup.18 each independently represent O, CO, COO, OCO or OCOO, and

* and ** are bonds, and ** represents a bond to an iodine atom.