A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be applied to various articles, or used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked polymer, and reaction with a disulfide-reactive material. Such thiosulfate polymer compositions can also be used to sequester metals in nanoparticulate form, and as a way for shaping human hair in hairdressing operations.

A monomer having a plurality of tertiary alcoholic hydroxyl groups is provided. A useful polymer is obtained by polymerizing the monomer. From a resist composition comprising the polymer, a negative pattern which is insoluble in alkaline developer and has high etch resistance is formed at a high resolution.

A monomer having a plurality of tertiary alcoholic hydroxyl groups is provided. A useful polymer is obtained by polymerizing the monomer. From a resist composition comprising the polymer, a negative pattern which is insoluble in alkaline developer and has high etch resistance is formed at a high resolution.

A multi-copolymer, methods for producing the same and using thereof in wastewater treatment application are provided. The method includes pre-mixing by mass 10-30 parts by mass of alkenyl succinic anhydrides, 10-30 parts of vinylbenzyltrimethylammonium chloride, and 10-30 parts of dimethylaminoethyl methacrylate with water to form a first mixture; reacting the first mixture comprising passing thereof through inert gases to provide reflux protection, and adding by mass 10-30 parts of vinyl acetate and 10-30 parts of acrylamide to form a second mixture, followed by heating the second mixture and adding an initiator therein to initiate the reaction. The present invention is simple, at low cost, safe, non-toxic, environmentally friendly, easy to operate, with a better water purification efficiency than that of conventional macromolecule flocculants, multi-functional, good product stability, strong adsorption bridging ability, less dosage requirement for the water treatment agent, and results in a sturdy sludge cake and easily separated flocs.

A multi-copolymer, methods for producing the same and using thereof in wastewater treatment application are provided. The method includes pre-mixing by mass 10-30 parts by mass of alkenyl succinic anhydrides, 10-30 parts of vinylbenzyltrimethylammonium chloride, and 10-30 parts of dimethylaminoethyl methacrylate with water to form a first mixture; reacting the first mixture comprising passing thereof through inert gases to provide reflux protection, and adding by mass 10-30 parts of vinyl acetate and 10-30 parts of acrylamide to form a second mixture, followed by heating the second mixture and adding an initiator therein to initiate the reaction. The present invention is simple, at low cost, safe, non-toxic, environmentally friendly, easy to operate, with a better water purification efficiency than that of conventional macromolecule flocculants, multi-functional, good product stability, strong adsorption bridging ability, less dosage requirement for the water treatment agent, and results in a sturdy sludge cake and easily separated flocs.

Provided is a polymer capable of forming a resist pattern in which pattern top loss is inhibited when used as a main chain scission-type positive resist. The polymer includes a monomer unit (A) represented by general formula (I), shown below, and a monomer unit (B) represented by general formula (II), shown below, and the proportion of components having a molecular weight of 100,000 or more in the polymer is 10% or more. In general formula (I), X is a fluorine, chlorine, bromine, iodine, or astatine atom, and R.sup.1 is an organic group including 3 to 7 fluorine atoms. In general formula (II), R.sup.2 is a hydrogen atom, fluorine atom, unsubstituted alkyl group, or fluorine atom-substituted alkyl group, R.sup.3 is a hydrogen atom, unsubstituted alkyl group, or fluorine atom-substituted alkyl group, p and q are integers of 0 to 5, and p+q=5.

##STR00001##

An upper layer film-forming composition exhibits good solubility in hydrophobic solvents and can bring about vertical alignment of a block copolymer without dissolution, swelling or the like of a layer containing the block copolymer formed on a substrate. This upper layer film-forming composition is used for phase separation of a layer containing a block copolymer formed on a substrate, and contains: (A) a copolymer containing a unit structure derived from a maleimide structure (a) and a unit structure derived from a styrene structure; and (B) as a solvent, a non-aromatic hydrocarbon compound that is a liquid at normal temperature and pressure.

Provided is a positive resist composition capable of improving the adhesion between a resist film formed through pre-baking and a workpiece and reducing changes in the molecular weight of the polymer in the resist film before and after pre-baking step over broader ranges of heating temperature and heating time (at lower heating temperatures) during pre-baking. The positive resist composition comprises a polymer and a solvent, wherein the polymer has a monomer unit (A) represented by the following general formula (I) and a monomer unit (B) represented by the following general formula (II), and wherein the solvent is at least one selected from the group consisting of isoamyl acetate, n-butyl formate, isobutyl formate, n-amyl formate, and isoamyl formate: ##STR00001##

The present application may provide a block copolymer and a use thereof. The block copolymer of the present application has excellent self-assembly properties or phase separation characteristics, to which various functions to be required can also be freely imparted.

The present application may provide a block copolymer and a use thereof. The block copolymer of the present application has excellent self-assembly properties or phase separation characteristics, to which various functions to be required can also be freely imparted.