Described herein are amorphous fluorinated copolymers produced by the polymerization of one or more fluorinated ring monomers and one or more fluorinated comonomers containing multiple ether oxygens. The copolymers are suitable in many high-technology applications, such as optical fibers, anti-reflection coatings, protective coatings, and gas separation membranes. In one aspect, the copolymers are useful is in the field of membrane-based gas separation processes. In one aspect, amorphous copolymer is produced by polymerizing (a) one or more fluorinated ring monomers in the amount of 1 mol % to 99.5 mol %, wherein the fluorinated ring monomer is at least a five membered ring and (b) a comonomer in the amount of from 0.5 mol % to 99 mol %, wherein the comonomer comprises a fluorinated compound with two or more ether oxygens.

Described herein are amorphous fluorinated copolymers produced by the polymerization of one or more fluorinated ring monomers and one or more fluorinated comonomers containing multiple ether oxygens. The copolymers are suitable in many high-technology applications, such as optical fibers, anti-reflection coatings, protective coatings, and gas separation membranes. In one aspect, the copolymers are useful is in the field of membrane-based gas separation processes. In one aspect, amorphous copolymer is produced by polymerizing (a) one or more fluorinated ring monomers in the amount of 1 mol % to 99.5 mol %, wherein the fluorinated ring monomer is at least a five membered ring and (b) a comonomer in the amount of from 0.5 mol % to 99 mol %, wherein the comonomer comprises a fluorinated compound with two or more ether oxygens.

Provided herein are compositions suitable for recording holograms containing thiol and/or thioether functionality, and optionally including additional allyl and/or propargyl functional groups. These monomers can be used to synthesize holographic poly-mers having high Lin values. Also provided herein are methods of making holographic polymers and methods recording holograms using these polymers.

Provided herein are compositions suitable for recording holograms containing thiol and/or thioether functionality, and optionally including additional allyl and/or propargyl functional groups. These monomers can be used to synthesize holographic poly-mers having high Lin values. Also provided herein are methods of making holographic polymers and methods recording holograms using these polymers.

A thermoset resin for forming parts to be metal plated includes a vat photopolymerization (VPP) thermoset resin and an etchable phase disposed in the VPP thermoset resin. The etchable phase is etched from a surface of a part formed from the VPP thermoset resin such that a plurality of micro-mechanical locking sites is formed on the surface of the part. The etchable phase is at least one of organic particles, organic resins, inorganic particles, and copolymers of the VPP thermoset resin. For example, the etchable phase can be a polybutadiene phase and/or a mineral such as calcium carbonate.

Provided are a fluorine-containing copolymer composition containing a fluorine-containing copolymer and a fluorine-containing compound having two maleimide groups, and a cross-linked product thereof, and a compound.

Provided are a fluorine-containing copolymer composition containing a fluorine-containing copolymer and a fluorine-containing compound having two maleimide groups, and a cross-linked product thereof, and a compound.

A copolymer is formed by reacting (A) aromatic monomer, an oligomer thereof, or a polymer thereof, with (B) aliphatic monomer, an oligomer thereof, or a polymer thereof. The aromatic monomer has a chemical structure of

##STR00001##

in which each of R.sup.1 is independently H or CH.sub.3, and n=1-4. R.sup.2 is a single bond, —O—,

##STR00002##

Each of R.sup.3 is independently

##STR00003##

A copolymer is formed by reacting (A) aromatic monomer, an oligomer thereof, or a polymer thereof, with (B) aliphatic monomer, an oligomer thereof, or a polymer thereof. The aromatic monomer has a chemical structure of

##STR00001##

in which each of R.sup.1 is independently H or CH.sub.3, and n=1-4. R.sup.2 is a single bond, —O—,

##STR00002##

Each of R.sup.3 is independently

##STR00003##

A hardmask composition, a hardmask layer including a cured product of the hardmask composition, and a method of forming patterns from the hardmask composition, the hardmask composition includes a compound represented by Chemical Formula 1, and a solvent,

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