Patent classifications
C08F216/18
Decorative film, method for producing decorative film, method for producing decorative film-attached three dimensional molded product and fluorinated polymer composition
To provide a decorative film, whereby formation of wrinkles is suppressed when bonded to a three dimensional molded product in a stretched state, a method for producing a decorative film, a method for producing a decorative film-attached three dimensional molded product, and a fluorinated polymer composition. The decorative film of the present invention is a decorative film having at least a base film layer and a fluorinated layer containing a crosslinked fluorinated polymer, wherein the crosslinked fluorinated polymer is a crosslinked product of a crosslinkable polymer comprising units based on a fluoroolefin and units having a crosslinkable group, and the average molecular weight between crosslinking groups of the crosslinked fluorinated polymer is from 500 to 50,000.
Decorative film, method for producing decorative film, method for producing decorative film-attached three dimensional molded product and fluorinated polymer composition
To provide a decorative film, whereby formation of wrinkles is suppressed when bonded to a three dimensional molded product in a stretched state, a method for producing a decorative film, a method for producing a decorative film-attached three dimensional molded product, and a fluorinated polymer composition. The decorative film of the present invention is a decorative film having at least a base film layer and a fluorinated layer containing a crosslinked fluorinated polymer, wherein the crosslinked fluorinated polymer is a crosslinked product of a crosslinkable polymer comprising units based on a fluoroolefin and units having a crosslinkable group, and the average molecular weight between crosslinking groups of the crosslinked fluorinated polymer is from 500 to 50,000.
POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION, METHOD FOR PRODUCING POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION
A polycyclic polyphenolic resin having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by the formulas (1A) and (1B); or a polycyclic polyphenolic resin having repeating units derived from an aromatic hydroxy compound represented by the formula (C-1A), wherein the repeating units are linked to each other by a direct bonding between aromatic rings:
##STR00001##
wherein in the formula (1A), R.sup.1 is a 2n-valent group having 1 to 60 carbon atoms or a single bond, each R.sup.2 is independently an alkyl group having 1 to 40 carbon atoms and optionally having a substituent, an aryl group having 6 to 40 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 40 carbon atoms and optionally having a substituent, a halogen atom, a thiol group, an amino group, a nitro group, a cyano group, a nitro group, a heterocyclic group, a carboxyl group or a hydroxy group, and each m is independently an integer of 0 to 3; each n is independently an integer of 1 to 4; and in the formula (1B), R.sup.2 and m are as defined in the formula (1A), and
##STR00002##
wherein in the formula (C-1A), R.sup.1 is a 2n-valent group having 1 to 60 carbon atoms or a single bond, each R.sup.2 is independently an alkyl group having 1 to 40 carbon atoms and optionally having a substituent, an aryl group having 6 to 40 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 40 carbon atoms and optionally having a substituent, a halogen atom, a thiol group, an amino group, a nitro group, a cyano group, a nitro group, a heterocyclic group, a carboxyl group or a hydroxy group, and each m is independently an integer of 0 to 9; and n is an integer of 1 to 4, and each p is independently an integer of 0 to 3.
POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION, METHOD FOR PRODUCING POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION
A polycyclic polyphenolic resin having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by the formulas (1A) and (1B); or a polycyclic polyphenolic resin having repeating units derived from an aromatic hydroxy compound represented by the formula (C-1A), wherein the repeating units are linked to each other by a direct bonding between aromatic rings:
##STR00001##
wherein in the formula (1A), R.sup.1 is a 2n-valent group having 1 to 60 carbon atoms or a single bond, each R.sup.2 is independently an alkyl group having 1 to 40 carbon atoms and optionally having a substituent, an aryl group having 6 to 40 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 40 carbon atoms and optionally having a substituent, a halogen atom, a thiol group, an amino group, a nitro group, a cyano group, a nitro group, a heterocyclic group, a carboxyl group or a hydroxy group, and each m is independently an integer of 0 to 3; each n is independently an integer of 1 to 4; and in the formula (1B), R.sup.2 and m are as defined in the formula (1A), and
##STR00002##
wherein in the formula (C-1A), R.sup.1 is a 2n-valent group having 1 to 60 carbon atoms or a single bond, each R.sup.2 is independently an alkyl group having 1 to 40 carbon atoms and optionally having a substituent, an aryl group having 6 to 40 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 40 carbon atoms and optionally having a substituent, a halogen atom, a thiol group, an amino group, a nitro group, a cyano group, a nitro group, a heterocyclic group, a carboxyl group or a hydroxy group, and each m is independently an integer of 0 to 9; and n is an integer of 1 to 4, and each p is independently an integer of 0 to 3.
Ultra-Pure Methyl Vinyl Ether-Co-Maleic Anhydride Copolymers and Methods for Preparing Same
Ultra-pure methyl vinyl ether-co-maleic anhydride (PMVE/MA) copolymers and the process to produce such ultra-pure polymers by removing trace impurities are provided. A process to provide an ultra-pure methyl vinyl ether-co-maleic anhydride material by solvent washing PMVE/MA copolymer with a solvent, comprises the steps of: (1) providing a solvent system in which impurities in the copolymer matrix are soluble and in which the PMVE/MA copolymer is not soluble, and wherein the solvent system does not react with the copolymer; (2) washing a dry powder or wet filter cake of PMVE/MA copolymer with the solvent system to efficiently and effectively extract trace impurities from the matrix; (3) filtering said copolymer from the solvent system; and (4) drying the subsequent wet filter cake of said copolymer to obtain an ultra-pure methyl vinyl ether-co-maleic anhydride copolymer.
Ultra-Pure Methyl Vinyl Ether-Co-Maleic Anhydride Copolymers and Methods for Preparing Same
Ultra-pure methyl vinyl ether-co-maleic anhydride (PMVE/MA) copolymers and the process to produce such ultra-pure polymers by removing trace impurities are provided. A process to provide an ultra-pure methyl vinyl ether-co-maleic anhydride material by solvent washing PMVE/MA copolymer with a solvent, comprises the steps of: (1) providing a solvent system in which impurities in the copolymer matrix are soluble and in which the PMVE/MA copolymer is not soluble, and wherein the solvent system does not react with the copolymer; (2) washing a dry powder or wet filter cake of PMVE/MA copolymer with the solvent system to efficiently and effectively extract trace impurities from the matrix; (3) filtering said copolymer from the solvent system; and (4) drying the subsequent wet filter cake of said copolymer to obtain an ultra-pure methyl vinyl ether-co-maleic anhydride copolymer.
Ultra-Pure Methyl Vinyl Ether-Co-Maleic Anhydride Copolymers and Methods for Preparing Same
Ultra-pure methyl vinyl ether-co-maleic anhydride (PMVE/MA) copolymers and the process to produce such ultra-pure polymers by removing trace impurities are provided. A process to provide an ultra-pure methyl vinyl ether-co-maleic anhydride material by solvent washing PMVE/MA copolymer with a solvent, comprises the steps of: (1) providing a solvent system in which impurities in the copolymer matrix are soluble and in which the PMVE/MA copolymer is not soluble, and wherein the solvent system does not react with the copolymer; (2) washing a dry powder or wet filter cake of PMVE/MA copolymer with the solvent system to efficiently and effectively extract trace impurities from the matrix; (3) filtering said copolymer from the solvent system; and (4) drying the subsequent wet filter cake of said copolymer to obtain an ultra-pure methyl vinyl ether-co-maleic anhydride copolymer.
POLYVINYL ESTERS AND METHODS RELATED THERETO
Disclosed herein are isotactic polyvinyl ethers and improved methods of making same. The method disclosed herein can produce polyvinyl ethers having a higher isotacticity as compared to polyvinyl ethers prepared with conventional methods.
Amide and imide photoinitiators
Polymers are provided, in which a pendant photoinitiator moiety is linked to the polymer structure via an amide or a succinimide.
Amide and imide photoinitiators
Polymers are provided, in which a pendant photoinitiator moiety is linked to the polymer structure via an amide or a succinimide.