A compound represented by Formula (1) given below. (In the formula, R.sup.1 represents a hydrogen atom or a methyl group, X.sup.1 represents a C.sub.1 to 9 alkylene group, or a C.sub.3 to 6 alkylene group in which at least one hydrogen is replaced with an acryloxy group or a methacryloxy group, l.sup.1 represents an integer from 0 to 3, Q.sup.1 represents a hydrogen atom or Formula (2) given below (In the formula, R.sup.2 represents a hydrogen atom or a methyl group, X.sup.2 represents a C.sub.1 to 9 alkylene group, or a C.sub.3 to 6 alkylene group in which at least one hydrogen is replaced with an acryloxy group or a methacryloxy group, l.sup.2 represents an integer from 0 to 3, and * represents a bonding site), and Q.sup.2 represents a hydrogen atom or Formula (3) given below (In the formula, R.sup.3 represents a hydrogen atom or a methyl group, X.sup.3 represents a C.sub.1 to 9 alkylene group, or a C.sub.3 to 6 alkylene group in which at least one hydrogen is replaced with an acryloxy group or a methacryloxy group, l.sup.3 represents an integer from 0 to 3, and * represents a bonding site).)

A compound represented by Formula (1) given below. (In the formula, R.sup.1 represents a hydrogen atom or a methyl group, X.sup.1 represents a C.sub.1 to 9 alkylene group, or a C.sub.3 to 6 alkylene group in which at least one hydrogen is replaced with an acryloxy group or a methacryloxy group, l.sup.1 represents an integer from 0 to 3, Q.sup.1 represents a hydrogen atom or Formula (2) given below (In the formula, R.sup.2 represents a hydrogen atom or a methyl group, X.sup.2 represents a C.sub.1 to 9 alkylene group, or a C.sub.3 to 6 alkylene group in which at least one hydrogen is replaced with an acryloxy group or a methacryloxy group, l.sup.2 represents an integer from 0 to 3, and * represents a bonding site), and Q.sup.2 represents a hydrogen atom or Formula (3) given below (In the formula, R.sup.3 represents a hydrogen atom or a methyl group, X.sup.3 represents a C.sub.1 to 9 alkylene group, or a C.sub.3 to 6 alkylene group in which at least one hydrogen is replaced with an acryloxy group or a methacryloxy group, l.sup.3 represents an integer from 0 to 3, and * represents a bonding site).)

There is provided a decorative sheet having excellent design properties, i.e., low gloss, and having fingerprint resistance, high durability (particularly scratch resistance or contamination resistance), and processability. A decorative sheet (1) according to this embodiment includes: a base material layer (2); and a surface protective layer (5) provided on one surface of the base material layer (2), in which the surface protective layer (5) has ridge-like parts provided to project in a ridge-like shape and form an irregular shape on the surface, RSm/Ra of the irregular shape of the surface protective layer (5) is within the range of 10 or more and 300 or less, the surface protective layer (5) contains an ionizing radiation curable resin as a main material, the ionizing radiation curable resin contains, as a main component, a trifunctional acrylic resin containing a repeating structure, the repeating structure is any one of the structures of ethylene oxide, propylene oxide, and ε-caprolactone, and the number of repetitions of the repeating structure is 3 or more.

There is provided a decorative sheet having excellent design properties, i.e., low gloss, and having fingerprint resistance, high durability (particularly scratch resistance or contamination resistance), and processability. A decorative sheet (1) according to this embodiment includes: a base material layer (2); and a surface protective layer (5) provided on one surface of the base material layer (2), in which the surface protective layer (5) has ridge-like parts provided to project in a ridge-like shape and form an irregular shape on the surface, RSm/Ra of the irregular shape of the surface protective layer (5) is within the range of 10 or more and 300 or less, the surface protective layer (5) contains an ionizing radiation curable resin as a main material, the ionizing radiation curable resin contains, as a main component, a trifunctional acrylic resin containing a repeating structure, the repeating structure is any one of the structures of ethylene oxide, propylene oxide, and ε-caprolactone, and the number of repetitions of the repeating structure is 3 or more.

Provided are a photosensitive resin composition having low viscosity and high compatibility prepared by providing a semiconductor nanoparticle-ligand composite comprising a ligand represented by Formula 1, an optical film having uniform and remarkably excellent quantum efficiency using the photosensitive resin composition, and an electroluminescent diode comprising the optical film and an electronic device comprising an electroluminescent diode.

Provided are a photosensitive resin composition having low viscosity and high compatibility prepared by providing a semiconductor nanoparticle-ligand composite comprising a ligand represented by Formula 1, an optical film having uniform and remarkably excellent quantum efficiency using the photosensitive resin composition, and an electroluminescent diode comprising the optical film and an electronic device comprising an electroluminescent diode.

Provided is a composition that is capable of forming a polarizer layer having an excellent degree of alignment and excellent adhesiveness to another layer in a case of being applied to a laminate, a polarizer layer, a laminate, and an image display device. The composition of the present invention is a composition including at least a polymer liquid crystal compound, a dichroic material, and a low-molecular-weight liquid crystal compound, in which the polymer liquid crystal compound is a copolymer having a repeating unit (1) represented by Formula (1), the low-molecular-weight liquid crystal compound is a compound represented by Formula (LC), and relationships represented by Expressions |log P(SP1)−log P(SPL1)|≤2.0 (11), |log P(MG1)−log P(SP1)|≥4.5 (12), and |log P(ML)−log P(SPL1)|≥4.0 (13) are satisfied.

##STR00001##

Compounds of formula (I) are photoinitiators or photosensitizers in a photopolymerizable composition: ##STR00001##
R.sub.1 represents a monovalent, linear, branched or cyclic, aliphatic hydrocarbon group having 1 to 20 carbon atoms, optionally substituted with substituent(s) selected from —Cl, —Br, —OH, ═O, —NH—CO—OR.sub.2, —NH—CO—R.sub.2 or free-radically or ionically polymerizable groups. Each R.sub.2 is independently —H or C.sub.1-6 alkyl; n is ≥1. If n=1, Z and Y are absent and X represents —OR.sub.3; if n is >1, Z represents —OR.sub.4—, Y represents —OR.sub.5— and X represents —H or —OH. R.sub.3 represents —H or R.sub.1; and R.sub.4 and R.sub.5 each independently represent a bivalent hydrocarbon group. The polymerizable moieties as optional substituents of R.sub.1 are polymerizable double or triple bonds, lactam, lactone and epoxide moieties, which are subjectable to ring-opening polymerization; and two of R.sub.1 to R.sub.5 may be linked to one another to form a ring or a dimer.

Compounds of formula (I) are photoinitiators or photosensitizers in a photopolymerizable composition: ##STR00001##
R.sub.1 represents a monovalent, linear, branched or cyclic, aliphatic hydrocarbon group having 1 to 20 carbon atoms, optionally substituted with substituent(s) selected from —Cl, —Br, —OH, ═O, —NH—CO—OR.sub.2, —NH—CO—R.sub.2 or free-radically or ionically polymerizable groups. Each R.sub.2 is independently —H or C.sub.1-6 alkyl; n is ≥1. If n=1, Z and Y are absent and X represents —OR.sub.3; if n is >1, Z represents —OR.sub.4—, Y represents —OR.sub.5— and X represents —H or —OH. R.sub.3 represents —H or R.sub.1; and R.sub.4 and R.sub.5 each independently represent a bivalent hydrocarbon group. The polymerizable moieties as optional substituents of R.sub.1 are polymerizable double or triple bonds, lactam, lactone and epoxide moieties, which are subjectable to ring-opening polymerization; and two of R.sub.1 to R.sub.5 may be linked to one another to form a ring or a dimer.

The present teachings are directed at 1,1-disubstituted alkene monomers (e.g., methylene beta-ketoester monomers), methods for producing the same, polymerizable compositions including a methylene beta-ketoester monomer, and polymers, compositions and products formed therefrom. The monomer preferably is a high purity monomer. In the method for producing the methylene beta-ketoesters of the invention, a beta-ketoester may be reacted with a source of formaldehyde. The methylene beta-ketoester monomers may be used in monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).