A process of preparing an aqueous solution of a cycloimide-containing polymer includes heating an aqueous solution of a cycloanhydride-containing polymer with a first neutralizing agent at a ratio of cycloanhydride to neutralizing agent of about 1:1 to about 1:1.5 at a temperature and for a time sufficient to form the aqueous solution of the cycloimide-containing polymer having a cycloimide to acid group ratio of about 1:2 to about 1.5:2.

A process of preparing an aqueous solution of a cycloimide-containing polymer includes heating an aqueous solution of a cycloanhydride-containing polymer with a first neutralizing agent at a ratio of cycloanhydride to neutralizing agent of about 1:1 to about 1:1.5 at a temperature and for a time sufficient to form the aqueous solution of the cycloimide-containing polymer having a cycloimide to acid group ratio of about 1:2 to about 1.5:2.

A suspension stabilizer with high yield value and high transparency and a preparation process and use thereof, which relate to the field of suspension stabilizers. The suspension stabilizer includes the following components by mass fraction: water-soluble monomer 5.5%-70.5%; oil-soluble monomer 10.4%-83.1%; monomer with multiple active groups 0-18.7%; functional monomer 0-5.2%; graft-modified monomer 0-15.0%; emulsifier 0.5%-7.0%; and initiator 0.01-2.0%; wherein, the graft-modified monomer is a hydrophilic monomer and/or a hydrophilic group graft-modified monomer.

A suspension stabilizer with high yield value and high transparency and a preparation process and use thereof, which relate to the field of suspension stabilizers. The suspension stabilizer includes the following components by mass fraction: water-soluble monomer 5.5%-70.5%; oil-soluble monomer 10.4%-83.1%; monomer with multiple active groups 0-18.7%; functional monomer 0-5.2%; graft-modified monomer 0-15.0%; emulsifier 0.5%-7.0%; and initiator 0.01-2.0%; wherein, the graft-modified monomer is a hydrophilic monomer and/or a hydrophilic group graft-modified monomer.

A water-based acrylic resin and a method for producing the same are provided. The water-based acrylic resin includes a polymerizable composition. The polymerizable composition includes deionized water, a reactive emulsifier, a first acrylic monomer, a second acrylic monomer, a third acrylic monomer, a fourth acrylic monomer, and an acrylic polyol. The reactive emulsifier is a nonylphenyl-free reactive emulsifier. The first acrylic monomer is an alkyl-containing (meth)acrylate. The second acrylic monomer is a hydroxyl-containing (meth)acrylate. The third acrylic monomer is a carboxyl-containing (meth)acrylate. The fourth acrylic monomer is an ethylenically-unsaturated-functional-groups-containing (meth)acrylate. The acrylic polyol is one or both of a hydroxyl-containing polyester acrylic polyol and a hydroxyl-containing polyether acrylic polyol.

A water-based acrylic resin and a method for producing the same are provided. The water-based acrylic resin includes a polymerizable composition. The polymerizable composition includes deionized water, a reactive emulsifier, a first acrylic monomer, a second acrylic monomer, a third acrylic monomer, a fourth acrylic monomer, and an acrylic polyol. The reactive emulsifier is a nonylphenyl-free reactive emulsifier. The first acrylic monomer is an alkyl-containing (meth)acrylate. The second acrylic monomer is a hydroxyl-containing (meth)acrylate. The third acrylic monomer is a carboxyl-containing (meth)acrylate. The fourth acrylic monomer is an ethylenically-unsaturated-functional-groups-containing (meth)acrylate. The acrylic polyol is one or both of a hydroxyl-containing polyester acrylic polyol and a hydroxyl-containing polyether acrylic polyol.

A resist composition comprising a base polymer and an acid generator containing a sulfonium salt having the formula (1) or an iodonium salt having the formula (2). ##STR00001##

The present invention relates to an ionomer resin, comprising: a (meth)acrylic acid unit (A); a neutralized (meth)acrylic acid unit (B); and an ethylene unit (C), wherein the total amount of the unit (A) and the unit (B) is from 6 to 10 mol % based on the entire monomeric units constituting the ionomer resin, and wherein the amount of a salt composed of a strong acid and a strong base in the ionomer resin is from 1 to 400 mg/kg.

The present invention relates to an ionomer resin, comprising: a (meth)acrylic acid unit (A); a neutralized (meth)acrylic acid unit (B); and an ethylene unit (C), wherein the total amount of the unit (A) and the unit (B) is from 6 to 10 mol % based on the entire monomeric units constituting the ionomer resin, and wherein the amount of a salt composed of a strong acid and a strong base in the ionomer resin is from 1 to 400 mg/kg.

A photoresist composition comprising: a resin which has a structural unit represented by formula (I): ##STR00001##
wherein R.sup.1 represents a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group which optionally has a halogen atom, and R.sup.2 represents a C1 to C42 hydrocarbon group which optionally has a substituent; an alkali-soluble resin; an acid generator; and a solvent.