Patent classifications
C08F220/1803
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition which has an excellent resolution and is capable of forming a pattern having suppressed defects. Another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition.
The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin of which polarity increases through decomposition by an action of an acid, and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the resin of which polarity increases through decomposition by an action of an acid includes one or more selected from the group consisting of repeating units represented by Formulae (1) to (5), and the compound that generates an acid upon irradiation with actinic rays or radiation includes any one or more of a compound (I) or a compound (II).
Adhesion improver for amine curing epoxy resin paint
An adhesion improver for amine curing epoxy resin paint which, when added in a small amount to amine curing epoxy resin paint, is capable of preventing the inhibition of adhesion caused by amine blushing and of giving good interlayer adhesion is provided. This adhesion improver is a composition which contains a polymer obtained by the polymerization of (A) acrylic acid ester and/or methacrylic acid ester which has a formula as follows: ##STR00001##
wherein R.sub.1 denotes a hydrogen atom or a methyl group, and R.sub.2 denotes a branched alkyl group having 3 to 18 carbon atoms, and (B) acrylic acid ester other than (A) above and/or methacrylic acid ester other than (A) above and/or vinyl ether.
Early-strength polycarboxylate superplasticizer with MOF structure and preparation method thereof
An early-strength polycarboxylate superplasticizer with an MOF structure and a preparation method thereof are provided. The preparation method includes the following steps: 1) performing an amidation reaction on amine-containing nanocrystalline MOFs and a halogen acyl halide organic molecule to form the halogen-containing ATRP initiator; 2) performing an ATRP reaction on the obtained ATRP initiator, an unsaturated ester monomer, an unsaturated polyether macromonomer and a transition metal complex to obtain the early-strength polycarboxylate superplasticizer with the MOF structure. The present invention regulates the number and length of branch chains and product performance by controlling the number of amine groups contained in the nanocrystalline MOFs and ATRP, and has the advantages of rapid reaction, high efficiency, non-toxic and non-pollution, and simple operation. The prepared early-strength polycarboxylate superplasticizer with the MOF structure has early-strength performance and stable product performance.
Early-strength polycarboxylate superplasticizer with MOF structure and preparation method thereof
An early-strength polycarboxylate superplasticizer with an MOF structure and a preparation method thereof are provided. The preparation method includes the following steps: 1) performing an amidation reaction on amine-containing nanocrystalline MOFs and a halogen acyl halide organic molecule to form the halogen-containing ATRP initiator; 2) performing an ATRP reaction on the obtained ATRP initiator, an unsaturated ester monomer, an unsaturated polyether macromonomer and a transition metal complex to obtain the early-strength polycarboxylate superplasticizer with the MOF structure. The present invention regulates the number and length of branch chains and product performance by controlling the number of amine groups contained in the nanocrystalline MOFs and ATRP, and has the advantages of rapid reaction, high efficiency, non-toxic and non-pollution, and simple operation. The prepared early-strength polycarboxylate superplasticizer with the MOF structure has early-strength performance and stable product performance.
GREASE-RESISTANT FILM, GREASE-RESISTANT BASE MATERIAL, AND GREASE-RESISTANT PAPER
An oil-resistant film may be provided by an oil-resistant base material that is excellent in the oil resistance even in not only a plane part but also a bent part of a package can be obtained and also to the provision of an oil-resistant base material having the oil-resistant film and an oil-resistant paper having the oil-resistant film. An oil-resistant film may contain a polyvinyl alcohol-based polymer (A) and a polymer particle (B) containing a polymer having a glass transition temperature of 40° C. or lower, wherein the content of the polymer particle (B) is 1 part by mass or more and less than 150 parts by mass based on 100 parts by mass of the polyvinyl alcohol-based polymer (A); and an oil-resistant base material (oil-resistant paper) having the oil-resistant film on a base material (paper).
GREASE-RESISTANT FILM, GREASE-RESISTANT BASE MATERIAL, AND GREASE-RESISTANT PAPER
An oil-resistant film may be provided by an oil-resistant base material that is excellent in the oil resistance even in not only a plane part but also a bent part of a package can be obtained and also to the provision of an oil-resistant base material having the oil-resistant film and an oil-resistant paper having the oil-resistant film. An oil-resistant film may contain a polyvinyl alcohol-based polymer (A) and a polymer particle (B) containing a polymer having a glass transition temperature of 40° C. or lower, wherein the content of the polymer particle (B) is 1 part by mass or more and less than 150 parts by mass based on 100 parts by mass of the polyvinyl alcohol-based polymer (A); and an oil-resistant base material (oil-resistant paper) having the oil-resistant film on a base material (paper).
REFRIGERATING MACHINE OIL, AND WORKING FLUID COMPOSITION FOR REFRIGERATING MACHINES
The present invention provides a refrigerating machine oil comprising, as a base oil, a polymer having a structural unit represented by the following formula (1):
##STR00001##
wherein R.sup.1, R.sup.2 and R.sup.3, which may be the same as or different from each other, represent a hydrogen atom or a hydrocarbon group; and R.sup.4 represents a hydrocarbon group or an organic group containing an oxygen atom, and having a number average molecular weight Mn of 300 or more and 3000 or less and a ratio of a weight-average molecular weight Mw to a number average molecular weight Mn (Mw/Mn) of 1.10 or more and 2.00 or less, and the refrigerating machine oil being used with a refrigerant selected from the group consisting of difluoromethane, a mixture of difluoromethane and pentafluoroethane, a mixture of difluoromethane, pentafluoroethane and 1,1,1,2-tetrafluoroethane, a mixture of pentafluoroethane, 1,1,1,2-tetrafluoroethane and 1,1,1-trifluoroethane, unsaturated hydrofluorocarbons, hydrocarbons and carbon dioxide.
REFRIGERATING MACHINE OIL, AND WORKING FLUID COMPOSITION FOR REFRIGERATING MACHINES
The present invention provides a refrigerating machine oil comprising, as a base oil, a polymer having a structural unit represented by the following formula (1):
##STR00001##
wherein R.sup.1, R.sup.2 and R.sup.3, which may be the same as or different from each other, represent a hydrogen atom or a hydrocarbon group; and R.sup.4 represents a hydrocarbon group or an organic group containing an oxygen atom, and having a number average molecular weight Mn of 300 or more and 3000 or less and a ratio of a weight-average molecular weight Mw to a number average molecular weight Mn (Mw/Mn) of 1.10 or more and 2.00 or less, and the refrigerating machine oil being used with a refrigerant selected from the group consisting of difluoromethane, a mixture of difluoromethane and pentafluoroethane, a mixture of difluoromethane, pentafluoroethane and 1,1,1,2-tetrafluoroethane, a mixture of pentafluoroethane, 1,1,1,2-tetrafluoroethane and 1,1,1-trifluoroethane, unsaturated hydrofluorocarbons, hydrocarbons and carbon dioxide.
MATERIAL FOR 3D PRINTING, PROCESS FOR PREPARING THE SAME AND ARTICLE THEREOF
The present invention provides a composition for 3D printing, a process for preparing the same and an article thereof. By the solidifying method of UV irradiation, 3D printing is implemented. During said implementation, there is no need of high temperature heating, thus energy consumption is reduced, and there is no need for special solvent, thus harm to the environment is reduced. Meanwhile, the present invention uses micro-nano powder as the main material and polymer resin as adhesive, and at the same time, adds irradiation sensitizer. After electron beam irradiation, the polymer resin forms three-dimensional crosslinked network, thereby the strength, heat resistance and chemical resistance are improved after resin adhesion. Additionally, the present invention, by the addition of UV crosslinking agent, and by UV irradiation, cross-links the unsaturated resin after extrusion in 3D printing to form three-dimensional network structure, thus greatly improves the heat resistance, chemical resistance and mechanical strength of the shaping material, and makes the unsaturated resin have broader application prospects in 3D printing material.
Pattern forming material, composition for pattern formation, pattern forming method and method of manufacturing semiconductor device
According to one embodiment, a pattern forming material is disclosed. The pattern forming material contains a polymer. The polymer includes a specific first monomer unit. The monomer unit has a structure having ester of a carboxyl group at a terminal of a side chain. In the ester, a carbon atom bonded to an oxygen atom next to a carbonyl group is a primary carbon, a secondary carbon or a tertiary carbon. The pattern forming material is used for manufacturing a composite film as a mask pattern for processing a target film on a substrate. The composite film is formed by a process including, forming an organic film on the target film with the pattern forming material, patterning the organic film, and forming the composite film by infiltering a metal compound into the patterned organic film.