Compositions are provided which may comprise a plurality of organic additive particles, the particles comprising a polymerization product of reactants comprising a dioxane/dioxolane monomer and a vinyl co-monomer, wherein the dioxane/dioxolane monomer is an ester of (meth)acrylic acid with an alcohol comprising a dioxane moiety, an ester of (meth)acrylic acid with an alcohol comprising a dioxolane moiety, or both. Toner and additive manufacturing compositions comprising the organic additive particles are also provided.

Compositions are provided which may comprise a plurality of organic additive particles, the particles comprising a polymerization product of reactants comprising a dioxane/dioxolane monomer and a vinyl co-monomer, wherein the dioxane/dioxolane monomer is an ester of (meth)acrylic acid with an alcohol comprising a dioxane moiety, an ester of (meth)acrylic acid with an alcohol comprising a dioxolane moiety, or both. Toner and additive manufacturing compositions comprising the organic additive particles are also provided.

The present invention is a resist material containing a base polymer and an acid generator, where the resist material contains, as the acid generator, a sulfonium salt or iodonium salt of a sulfonic acid bonded to a maleimide group. In a chemically amplified resist material in which an acid is used as a catalyst, it is desired to develop an acid generator that makes it possible to reduce LWR of line patterns and critical dimension uniformity (CDU) of hole patterns, and to improve sensitivity. For this purpose, it is necessary to reduce image blurs due to acid diffusion considerably. An object of the present invention is to provide: a resist material having high sensitivity and low CDU in both a positive resist material and a negative resist material; and a patterning process using the same.

The present invention is a resist material containing a base polymer and an acid generator, where the resist material contains, as the acid generator, a sulfonium salt or iodonium salt of a sulfonic acid bonded to a maleimide group. In a chemically amplified resist material in which an acid is used as a catalyst, it is desired to develop an acid generator that makes it possible to reduce LWR of line patterns and critical dimension uniformity (CDU) of hole patterns, and to improve sensitivity. For this purpose, it is necessary to reduce image blurs due to acid diffusion considerably. An object of the present invention is to provide: a resist material having high sensitivity and low CDU in both a positive resist material and a negative resist material; and a patterning process using the same.

The present invention provides a material for intraocular lens which has improved hydrolysis resistance. The material for intraocular lens according to the present invention is obtained by polymerizing a monomer composition comprising: a base monomer, a hydrophilic monomer, and a cross-likable monomer, wherein the base monomer comprises an aromatic ring-containing acrylate monomer and an alkoxyalkyl methacrylate monomer having an alkoxyalkyl group having four or less carbon atoms. A blending ratio on a molar basis of the methacrylate monomer with respect to the acrylate monomer in all the monomer components contained in the monomer composition is 0.25 to 1.00.

A photocurable resin composition which can improve adhesion between light transmitting members. The photocurable resin composition contains a monofunctional acrylic monomer having a heating residue of 85.0% or less after being heated at 60° C. for 30 minutes, a crosslinking agent, a photopolymerization initiator, and a softening agent composed of at least one of plasticizer and tackifier, and the heating residue after being heated at 60° C. for 30 minutes is less than 96.0%.

A photocurable resin composition which can improve adhesion between light transmitting members. The photocurable resin composition contains a monofunctional acrylic monomer having a heating residue of 85.0% or less after being heated at 60° C. for 30 minutes, a crosslinking agent, a photopolymerization initiator, and a softening agent composed of at least one of plasticizer and tackifier, and the heating residue after being heated at 60° C. for 30 minutes is less than 96.0%.

A method for assessing polymeric additive content A in a polymeric particle mixture may comprise determining a concentration B of a metal cation in a polymeric particle mixture comprising parent polymeric particles and polymeric additive particles, wherein the metal cation is selected from alkali earth metals and alkali metals, other than sodium (Na), and the metal cation is capable of forming a water-soluble base; determining a concentration C of the metal cation in the parent polymeric particles; determining a concentration D of the metal cation in the polymeric additive particles; and calculating a polymeric additive content A using formula A=(B−C)/D.

A method for assessing polymeric additive content A in a polymeric particle mixture may comprise determining a concentration B of a metal cation in a polymeric particle mixture comprising parent polymeric particles and polymeric additive particles, wherein the metal cation is selected from alkali earth metals and alkali metals, other than sodium (Na), and the metal cation is capable of forming a water-soluble base; determining a concentration C of the metal cation in the parent polymeric particles; determining a concentration D of the metal cation in the polymeric additive particles; and calculating a polymeric additive content A using formula A=(B−C)/D.

Provided is an eyelash extension adhesive comprising the following components (a) and (b): (a) a monofunctional monomer of formula (I) wherein R.sup.1 represents a hydrogen atom or a methyl group, and R.sup.2 to R.sup.6 each independently represent a hydrogen atom or a C1 to C6 alkyl group, and (b) a photopolymerization initiator. The eyelash extension adhesive is excellent in durability and water resistance, can adhere easily to eyelashes even in a wet state, and is very useful as a photopolymerizable adhesive for eyelash extension attachment not including a cyanoacrylate compound.

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