The composition includes a polyester resin comprising at least one α,β-unsaturated ester group, an epoxy resin, a compound comprising at least one hydroxyl group; and a photoinitiator that generates acid on exposure to actinic radiation. A method of repairing a damaged surface using the composition is also described.

The composition includes a polyester resin comprising at least one α,β-unsaturated ester group, an epoxy resin, a compound comprising at least one hydroxyl group; and a photoinitiator that generates acid on exposure to actinic radiation. A method of repairing a damaged surface using the composition is also described.

Provided is an eyelash extension adhesive comprising the following components (a) and (b): (a) a monofunctional monomer of formula (I) wherein R.sup.1 represents a hydrogen atom or a methyl group, and R.sup.2 to R.sup.6 each independently represent a hydrogen atom or a C1 to C6 alkyl group, and (b) a photopolymerization initiator. The eyelash extension adhesive is excellent in durability and water resistance, can adhere easily to eyelashes even in a wet state, and is very useful as a photopolymerizable adhesive for eyelash extension attachment not including a cyanoacrylate compound.

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Provided is an eyelash extension adhesive comprising the following components (a) and (b): (a) a monofunctional monomer of formula (I) wherein R.sup.1 represents a hydrogen atom or a methyl group, and R.sup.2 to R.sup.6 each independently represent a hydrogen atom or a C1 to C6 alkyl group, and (b) a photopolymerization initiator. The eyelash extension adhesive is excellent in durability and water resistance, can adhere easily to eyelashes even in a wet state, and is very useful as a photopolymerizable adhesive for eyelash extension attachment not including a cyanoacrylate compound.

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A pattern forming method includes: applying an actinic ray-sensitive or radiation- sensitive resin composition onto a substrate to form a resist film; forming an upper layer film on the resist film, using a composition for forming an upper layer film; exposing the resist film having the upper layer film formed thereon; and developing the exposed resist film using a developer including an organic solvent to form a pattern. The composition for forming an upper layer film contains a resin having a repeating unit (a) with a ClogP value of 2.85 or more and a compound (b) with a ClogP of 1.30 or less, and the receding contact angle of the upper layer film with water is 70 degrees or more, a resist pattern formed by the pattern forming method, and a method for manufacturing an electronic device, including the pattern forming method.

A positive resist composition comprising a base polymer comprising recurring units having a carboxyl group whose hydrogen is substituted by a pyridine ring-containing tertiary hydrocarbyl group.

A positive resist composition comprising a base polymer comprising recurring units having a carboxyl group whose hydrogen is substituted by a pyridine ring-containing tertiary hydrocarbyl group.

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) which contains a repeating unit (a1) having a specific ring structure, a compound (B) which generates an acid by an irradiation with an actinic ray or a radiation, and a specific compound (C) which is decomposed by an irradiation with an actinic ray or a radiation so that an acid-trapping property is lowered; an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition; and a method for manufacturing an electronic device.

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) which contains a repeating unit (a1) having a specific ring structure, a compound (B) which generates an acid by an irradiation with an actinic ray or a radiation, and a specific compound (C) which is decomposed by an irradiation with an actinic ray or a radiation so that an acid-trapping property is lowered; an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition; and a method for manufacturing an electronic device.

A radiation-sensitive resin composition includes: a polymer which has a first structural unit including a phenolic hydroxyl group, and a second structural unit represented by formula (1); and a radiation-sensitive acid generating agent which has a compound represented by formula (2). R.sup.1 represents a hydrogen atom, or the like; R.sup.2 represents a hydrogen atom or the like; and R.sup.3 represents a divalent monocyclic alicyclic hydrocarbon group having 3 to 12 ring atoms. Ar.sup.1 represents a group obtained by removing (q+1) hydrogen atoms on an aromatic ring from an arene formed by condensation of at least two benzene rings; R.sup.4 represents a monovalent organic group having 1 to 20 carbon atoms; q is an integer of 0 to 7; and R.sup.5 represents a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, or the like.

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