A urethane compound (A) including units formed from (A1) an isocyanate and (A2) a long-chain alcohol represented by the formula HO—Z(Y—R).sub.n [wherein the R moieties are each independently —O—, —NH—, —O—C(═O)—, —NH—C(═O)—, —C(═O)—NH—, —O—C(═O)—NH—, —NH—C(═O)—O—, —NH—C(═O)—NH—, —NH—S(═O).sub.2—, —S(═O).sub.2—NH—, —NH—(CH.sub.2).sub.m—NH—S(═O).sub.2—, —NH—(CH.sub.2).sub.m—S(═O).sub.2—NH—, etc. (m is an integer of 1-5), Z is a direct bond or a di- or trivalent hydrocarbon group having 1-5 carbon atoms, and n is 1 or 2]. Also disclosed is a urethane mixture containing the urethane compound (A), and at least one selected from the polyisocyanate (A1), the long-chain alcohol (A2), a blocking agent (A3) and an alcohol compound (A4); an aqueous urethane composition; a method for producing the aqueous urethane composition; a method of treating a substrate; and a treated textile product.

A urethane compound (A) including units formed from (A1) an isocyanate and (A2) a long-chain alcohol represented by the formula HO—Z(Y—R).sub.n [wherein the R moieties are each independently —O—, —NH—, —O—C(═O)—, —NH—C(═O)—, —C(═O)—NH—, —O—C(═O)—NH—, —NH—C(═O)—O—, —NH—C(═O)—NH—, —NH—S(═O).sub.2—, —S(═O).sub.2—NH—, —NH—(CH.sub.2).sub.m—NH—S(═O).sub.2—, —NH—(CH.sub.2).sub.m—S(═O).sub.2—NH—, etc. (m is an integer of 1-5), Z is a direct bond or a di- or trivalent hydrocarbon group having 1-5 carbon atoms, and n is 1 or 2]. Also disclosed is a urethane mixture containing the urethane compound (A), and at least one selected from the polyisocyanate (A1), the long-chain alcohol (A2), a blocking agent (A3) and an alcohol compound (A4); an aqueous urethane composition; a method for producing the aqueous urethane composition; a method of treating a substrate; and a treated textile product.

A water repellent composition includes a polyurethane resin compound, a non-fluorine water repellent compound, a surfactant, and a liquid medium. The polyurethane resin compound includes at least one kind selected from the group consisting of a first polyurethane resin compound, a second polyurethane resin compound, and a third polyurethane resin compound:

A water repellent composition includes a polyurethane resin compound, a non-fluorine water repellent compound, a surfactant, and a liquid medium. The polyurethane resin compound includes at least one kind selected from the group consisting of a first polyurethane resin compound, a second polyurethane resin compound, and a third polyurethane resin compound:

An actinic ray-sensitive or radiation-sensitive resin composition includes a salt including a sulfonium cation having an aryl group substituted with an acid-decomposable group-containing group and having at least three fluorine atoms; and a resin having a polarity that increases through decomposition by an action of an acid, in which the acid-decomposable group-containing group includes a group having a polarity that increases through decomposition by an action of an acid, and the acid-decomposable group-containing group includes no fluorine atom.

An actinic ray-sensitive or radiation-sensitive resin composition includes a salt including a sulfonium cation having an aryl group substituted with an acid-decomposable group-containing group and having at least three fluorine atoms; and a resin having a polarity that increases through decomposition by an action of an acid, in which the acid-decomposable group-containing group includes a group having a polarity that increases through decomposition by an action of an acid, and the acid-decomposable group-containing group includes no fluorine atom.

A pattern forming method includes: applying an actinic ray-sensitive or radiation- sensitive resin composition onto a substrate to form a resist film; forming an upper layer film on the resist film, using a composition for forming an upper layer film; exposing the resist film having the upper layer film formed thereon; and developing the exposed resist film using a developer including an organic solvent to form a pattern. The composition for forming an upper layer film contains a resin having a repeating unit (a) with a ClogP value of 2.85 or more and a compound (b) with a ClogP of 1.30 or less, and the receding contact angle of the upper layer film with water is 70 degrees or more, a resist pattern formed by the pattern forming method, and a method for manufacturing an electronic device, including the pattern forming method.

A pattern forming method includes: applying an actinic ray-sensitive or radiation- sensitive resin composition onto a substrate to form a resist film; forming an upper layer film on the resist film, using a composition for forming an upper layer film; exposing the resist film having the upper layer film formed thereon; and developing the exposed resist film using a developer including an organic solvent to form a pattern. The composition for forming an upper layer film contains a resin having a repeating unit (a) with a ClogP value of 2.85 or more and a compound (b) with a ClogP of 1.30 or less, and the receding contact angle of the upper layer film with water is 70 degrees or more, a resist pattern formed by the pattern forming method, and a method for manufacturing an electronic device, including the pattern forming method.

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) which contains a repeating unit (a1) having a specific ring structure, a compound (B) which generates an acid by an irradiation with an actinic ray or a radiation, and a specific compound (C) which is decomposed by an irradiation with an actinic ray or a radiation so that an acid-trapping property is lowered; an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition; and a method for manufacturing an electronic device.

The present application provides a dispersion dispersed satisfactorily cellulose nanofibers, powdery cellulose nanofibers obtained by pulverizing thereof, a resin composition obtained by blending thereof and a molding raw material for a 3D printer by using thereof. It is possible to obtain a composition uniformly finely dispersed the cellulose nanofibers by treating a mixture containing unmodified cellulose nanofibers and a dispersant using a high speed agitating Medialess disperser, and followed by pulverizing the composition to blend with a resin and a rubber component. Also, a resin composition improved in mechanical properties and heat resistance, obtained by blending the powdery cellulose nanofibers above with a thermoplastic resin or a thermosetting resin, is useful as a molding material for a 3D printer.