A household appliance component has a base element with at least one photoluminescent layer and at least one light guide. The light guide is configured to couple in and transmit light containing at least one excitation wavelength of the photoluminescent layer to the photoluminescent layer. An optical switch is assigned to the light guide to route light coupled in the light guide depending on the temperature of the optical switch. Further a household appliance contains the at least one household appliance component.

A household appliance component has a base element with at least one photoluminescent layer and at least one light guide. The light guide is configured to couple in and transmit light containing at least one excitation wavelength of the photoluminescent layer to the photoluminescent layer. An optical switch is assigned to the light guide to route light coupled in the light guide depending on the temperature of the optical switch. Further a household appliance contains the at least one household appliance component.

Provided is a pressure-sensitive adhesive composition to be used in a pressure-sensitive adhesive tape for semiconductor processing, which has an excellent unevenness-embedding property and an excellent pressure-sensitive adhesive property, and can prevent adhesive residue on an adherend at the time of its peeling. The pressure-sensitive adhesive composition to be used in a pressure-sensitive adhesive tape for semiconductor processing includes a base polymer and a photopolymerization initiator, wherein the base polymer is a polymer obtained by polymerizing a monomer composition containing a polymer having a hydroxy group and a monomer represented by the following formula:

##STR00001##

where “n” represents an integer of 1 or more.

Provided is a pressure-sensitive adhesive composition to be used in a pressure-sensitive adhesive tape for semiconductor processing, which has an excellent unevenness-embedding property and an excellent pressure-sensitive adhesive property, and can prevent adhesive residue on an adherend at the time of its peeling. The pressure-sensitive adhesive composition to be used in a pressure-sensitive adhesive tape for semiconductor processing includes a base polymer and a photopolymerization initiator, wherein the base polymer is a polymer obtained by polymerizing a monomer composition containing a polymer having a hydroxy group and a monomer represented by the following formula:

##STR00001##

where “n” represents an integer of 1 or more.

Provided is a photochromic curable composition which forms a cured body that develops excellent photochromic properties. The photochromic curable composition (A) includes: a polyrotaxane monomer wherein, in a polyrotaxane compound having a composite molecular structure composed of an axial molecule and a plurality of cyclic molecules threaded onto the axial molecule, and side chains having OH groups introduced into the cyclic molecules, 1 mol % or more to less than 100 mol % of OH groups in the side chains are modified with a compound having a radical-polymerizable group, (B) a photochromic compound, and (C) a polymerizable monomer other than the (A) polyrotaxane monomer.

Provided is a photochromic curable composition which forms a cured body that develops excellent photochromic properties. The photochromic curable composition (A) includes: a polyrotaxane monomer wherein, in a polyrotaxane compound having a composite molecular structure composed of an axial molecule and a plurality of cyclic molecules threaded onto the axial molecule, and side chains having OH groups introduced into the cyclic molecules, 1 mol % or more to less than 100 mol % of OH groups in the side chains are modified with a compound having a radical-polymerizable group, (B) a photochromic compound, and (C) a polymerizable monomer other than the (A) polyrotaxane monomer.

Curable compositions comprise at least one (meth)acrylate monomer; silver; and a photoinitiator system. The photoinitiator system comprises at least one cyclic β-diketone represented by the formula (I) or a tautomer thereof, wherein: R.sup.1 represents H or an organic moiety having from 1 to 32 carbon atoms and optionally 1 to 12 heteroatoms selected from O, N, and combinations thereof; each R.sup.2 independently represents H or an aliphatic group having from 1 to 12 carbon atoms, and up to two of oxygen and sulfur atoms; and n represents 1, 2, or 3; and at least one Type II photoinitiator. Methods of making and using the compositions are also disclosed.

Curable compositions comprise at least one (meth)acrylate monomer; silver; and a photoinitiator system. The photoinitiator system comprises at least one cyclic β-diketone represented by the formula (I) or a tautomer thereof, wherein: R.sup.1 represents H or an organic moiety having from 1 to 32 carbon atoms and optionally 1 to 12 heteroatoms selected from O, N, and combinations thereof; each R.sup.2 independently represents H or an aliphatic group having from 1 to 12 carbon atoms, and up to two of oxygen and sulfur atoms; and n represents 1, 2, or 3; and at least one Type II photoinitiator. Methods of making and using the compositions are also disclosed.

An antifoggant composition including a copolymer (A), a blocked polyisocyanate hardener (B), colloidal silica (C), a surfactant (D), and water (E), wherein the copolymer (A) is a (meth)acrylate copolymer obtained from a monomer mixture comprising monomer (a-1) represented by general formula (1), monomer (a-2) represented by general formula (2), and monomer (a-3) represented by general formula (3) and the amounts of the blocked polyisocyanate hardener (B), colloidal silica (C), and water (E) are 35-300 parts by mass, 80-600 parts by mass, and 650 parts by mass or more, respectively, per 100 parts by mass of the copolymer (A).

An antifoggant composition including a copolymer (A), a blocked polyisocyanate hardener (B), colloidal silica (C), a surfactant (D), and water (E), wherein the copolymer (A) is a (meth)acrylate copolymer obtained from a monomer mixture comprising monomer (a-1) represented by general formula (1), monomer (a-2) represented by general formula (2), and monomer (a-3) represented by general formula (3) and the amounts of the blocked polyisocyanate hardener (B), colloidal silica (C), and water (E) are 35-300 parts by mass, 80-600 parts by mass, and 650 parts by mass or more, respectively, per 100 parts by mass of the copolymer (A).