The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) which contains a repeating unit (a1) having a specific ring structure, a compound (B) which generates an acid by an irradiation with an actinic ray or a radiation, and a specific compound (C) which is decomposed by an irradiation with an actinic ray or a radiation so that an acid-trapping property is lowered; an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition; and a method for manufacturing an electronic device.

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) which contains a repeating unit (a1) having a specific ring structure, a compound (B) which generates an acid by an irradiation with an actinic ray or a radiation, and a specific compound (C) which is decomposed by an irradiation with an actinic ray or a radiation so that an acid-trapping property is lowered; an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition; and a method for manufacturing an electronic device.

Aqueous latex of vinylidene chloride copolymer An aqueous latex [latex (L)] of a vinylidene chloride copolymer [copolymer (A)], wherein the copolymer (A) consists essentially of recurring units derived from vinylidene chloride (VDC) in an amount comprised between 89.0 and 91.0 wt % of the copolymer, recurring units derived from methacrylonitrile (MAN) in an amount comprised between 2.00 and 5.50 wt % of the copolymer, recurring units derived from at least one ionic comonomer (ICO) in an amount comprised between 0.5 and 1.4 wt % of the copolymer (A), and recurring units derived from methylmethacrylate (MMA) in an amount such that the total of recurring units of VDC, MAN, ICO and MMA is 100 wt %, and wherein the latex (L) comprises at least one surfactant [surfactant (S)] in an amount comprised between 0.09 and 1.50 wt % of the copolymer (A).
Process for the manufacture of the aqueous latex (L), film made therefrom and retort pouch prepared with such film.

Aqueous latex of vinylidene chloride copolymer An aqueous latex [latex (L)] of a vinylidene chloride copolymer [copolymer (A)], wherein the copolymer (A) consists essentially of recurring units derived from vinylidene chloride (VDC) in an amount comprised between 89.0 and 91.0 wt % of the copolymer, recurring units derived from methacrylonitrile (MAN) in an amount comprised between 2.00 and 5.50 wt % of the copolymer, recurring units derived from at least one ionic comonomer (ICO) in an amount comprised between 0.5 and 1.4 wt % of the copolymer (A), and recurring units derived from methylmethacrylate (MMA) in an amount such that the total of recurring units of VDC, MAN, ICO and MMA is 100 wt %, and wherein the latex (L) comprises at least one surfactant [surfactant (S)] in an amount comprised between 0.09 and 1.50 wt % of the copolymer (A).
Process for the manufacture of the aqueous latex (L), film made therefrom and retort pouch prepared with such film.

Free-standing non-fouling polymers and polymeric compositions, monomers and macromonomers for making the polymers and polymeric compositions, objects made from the polymers and polymeric compositions, and methods for making and using the polymers and polymeric compositions.

Free-standing non-fouling polymers and polymeric compositions, monomers and macromonomers for making the polymers and polymeric compositions, objects made from the polymers and polymeric compositions, and methods for making and using the polymers and polymeric compositions.

The present application relates to a binder. The present application can provide a binder which can be applied to production of silicon series negative electrodes to cope well with shrinkage and expansion by repeated charge and discharge, and has excellent binding force between active materials and adhesive force to a current collector, and an active material composition, an electrode and a secondary battery, comprising the same.

The present application relates to a binder. The present application can provide a binder which can be applied to production of silicon series negative electrodes to cope well with shrinkage and expansion by repeated charge and discharge, and has excellent binding force between active materials and adhesive force to a current collector, and an active material composition, an electrode and a secondary battery, comprising the same.

A toner comprising a toner particle comprising a binder resin, wherein the binder resin comprises a resin A and a resin B, in a differential scanning calorimetric measurement, a peak top temperature of the largest endothermic peak is present within a specific temperature range and an endothermic amount of an endothermic peak derived from the resin A is 30 to 70 J/g per 1 g of the toner, a ratio of content of the resin A in the toner particle is 60.0 to 90.0 mass %, the resin A comprises 40.0 to 70.0 mass % of a monomer unit (a) represented by formula (1) below, and the resin B comprises 5.0 to 30.0 mass % of a monomer unit (b) represented by formula (2) below:

##STR00001## in formulae (1) and (2), R.sup.1 and R.sup.2 denote a hydrogen atom or a methyl group, n and m denote a specific integer.

A toner comprising a toner particle comprising a binder resin, wherein the binder resin comprises a resin A and a resin B, in a differential scanning calorimetric measurement, a peak top temperature of the largest endothermic peak is present within a specific temperature range and an endothermic amount of an endothermic peak derived from the resin A is 30 to 70 J/g per 1 g of the toner, a ratio of content of the resin A in the toner particle is 60.0 to 90.0 mass %, the resin A comprises 40.0 to 70.0 mass % of a monomer unit (a) represented by formula (1) below, and the resin B comprises 5.0 to 30.0 mass % of a monomer unit (b) represented by formula (2) below:

##STR00001## in formulae (1) and (2), R.sup.1 and R.sup.2 denote a hydrogen atom or a methyl group, n and m denote a specific integer.