A compound of formula (I) having the structure shown below:

##STR00001##

wherein R.sup.B, R.sup.F1, R.sup.A1, X.sup.a and X.sup.b are as defined herein.

A compound of formula (I) having the structure shown below:

##STR00001##

wherein R.sup.B, R.sup.F1, R.sup.A1, X.sup.a and X.sup.b are as defined herein.

The present invention relates to an anti-reflective film including: a hard coating layer; and a low refractive layer that is formed on one side of the hard coating layer, and includes porous inorganic nanoparticles with a diameter of 5 nm to 70 nm including micropores with a diameter of 0.5 nm to 10 nm, and a binder resin, and a method for preparing an anti-reflective film.

The present disclosure relates to novel fluoromonomer and fluorooligomer compounds, a photopolymerizable composition including these compounds, methods for producing these compounds, and a hydrophobic film using the photopolymerizable composition.

A resist composition including a resin component having a structural unit derived form a compound represented by formula (a0-1) (in the formula, W represents a polymerizable group-containing group; Ra.sup.01 is a group which is bonded to Ra.sup.03 to form an aliphatic cyclic group, or bonded to Ra.sup.04 to form an aliphatic cyclic group;

Ra.sup.02 represents a hydrocarbon group which may have a substituent; Ra.sup.03 is a hydrogen atom or a monovalent organic group in the case where Ra.sup.01 is not bonded thereto; Ra.sup.04 is a hydrogen atom or a monovalent organic group in the case where Ra.sup.01 is not bonded thereto; and Ra.sup.05 to Ra.sup.07 each independently represents a hydrogen atom or a monovalent organic group).

##STR00001##

The present disclosure relates to novel fluoromonomer and fluorooligomer compounds, a photopolymerizable composition including these compounds, methods for producing these compounds, and a hydrophobic film using the photopolymerizable composition.

The present invention relates to an anti-reflective film including: a hard coating layer; and a low refractive layer that is formed on one side of the hard coating layer, and includes porous inorganic nanoparticles with a diameter of 5 nm to 70 nm including micropores with a diameter of 0.5 nm to 10 nm, and a binder resin, and a method for preparing an anti-reflective film.

A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic carbonate and a structural unit represented by formula (I), the resin has no acid-labile group; (A2) a resin which has an acid-labile group; and an acid generator: ##STR00001##
wherein R.sup.3 represents a hydrogen atom or a methyl group, R.sup.4 represents a C.sub.1 to C.sub.24 saturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group, R.sup.1 represents a hydrogen atom or a methyl group, and L.sup.1 represents a single bond or a C.sub.1 to C.sub.18 divalent saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and R.sup.2 represents a C.sub.3 to C.sub.18 alicyclic hydrocarbon group where a hydrogen atom may be replaced by a C.sub.1 to C.sub.8 aliphatic hydrocarbon group or a hydroxy group, provided that the carbon atom directly bonded to L.sup.1 has no aliphatic hydrocarbon group by which a hydrogen atom has been replaced.

A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), and a structural unit having an adamantane lactone group, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator. ##STR00001##
In the formula (a4), R.sup.3 represents a hydrogen atom or a methyl group, and R.sup.4 represents a C.sub.1 to C.sub.24 saturated hydrocarbon group having a fluorine atom, and a methylene group of the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.

A resist composition include (A1) a resin which includes a structural unit represented by formula (a4), and which resin has neither an acid-labile group nor an aromatic ring, (A2) a resin having an acid-labile group, and an acid generator, ##STR00001## wherein R.sup.3 represents a hydrogen atom or a methyl group, R.sup.4 represents a C.sub.1 to C.sub.24 saturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group; and a structural unit having a ketone group.