The present invention relates to a process for preparing an aqueous dispersion of multiphase occluded polymer particles comprising the steps of a) contacting, under emulsion polymerization conditions, first monomers and a chain transfer agent to form an aqueous dispersion of first polymer particles having a T.sub.g in the range of from −30° C. to 30° C.; then b) contacting the aqueous dispersion of first polymer particles with a second monomer under emulsion polymerization conditions to form an aqueous dispersion of second polymer particles occluded within the first polymer particles, wherein the first monomers a phosphorus acid monomer or a salt thereof; and the second monomer comprises at least 90 weight percent methyl methacrylate. The aqueous dispersion of occluded polymer particles arising from the process of the present invention is useful in a formulation that can be used to prepare a water-resistant blister free LASD coating.

The present invention relates to a process for preparing an aqueous dispersion of multiphase occluded polymer particles comprising the steps of a) contacting, under emulsion polymerization conditions, first monomers and a chain transfer agent to form an aqueous dispersion of first polymer particles having a T.sub.g in the range of from −30° C. to 30° C.; then b) contacting the aqueous dispersion of first polymer particles with a second monomer under emulsion polymerization conditions to form an aqueous dispersion of second polymer particles occluded within the first polymer particles, wherein the first monomers a phosphorus acid monomer or a salt thereof; and the second monomer comprises at least 90 weight percent methyl methacrylate. The aqueous dispersion of occluded polymer particles arising from the process of the present invention is useful in a formulation that can be used to prepare a water-resistant blister free LASD coating.

The present invention relates to a process for preparing an aqueous dispersion of multiphase occluded polymer particles comprising the steps of a) contacting, under emulsion polymerization conditions, first monomers and a chain transfer agent to form an aqueous dispersion of first polymer particles having a T.sub.g in the range of from −30° C. to 30° C.; then b) contacting the aqueous dispersion of first polymer particles with a second monomer under emulsion polymerization conditions to form an aqueous dispersion of second polymer particles occluded within the first polymer particles, wherein the first monomers a phosphorus acid monomer or a salt thereof; and the second monomer comprises at least 90 weight percent methyl methacrylate. The aqueous dispersion of occluded polymer particles arising from the process of the present invention is useful in a formulation that can be used to prepare a water-resistant blister free LASD coating.

Provided is a resin composition including at least one (meth)acrylate monomer, a urethane (meth)acrylate oligomer, and at least one photo initiator. The urethane (meth)acrylate oligomer includes a phosphate ester group and is represented by Formula 1. Accordingly, the resin composition may exhibit satisfactory compatibility before curing and may exhibit excellent adhesion after curing. ##STR00001##

Provided is a resin composition including at least one (meth)acrylate monomer, a urethane (meth)acrylate oligomer, and at least one photo initiator. The urethane (meth)acrylate oligomer includes a phosphate ester group and is represented by Formula 1. Accordingly, the resin composition may exhibit satisfactory compatibility before curing and may exhibit excellent adhesion after curing. ##STR00001##

A method of producing a substrate includes: applying a composition on a metal basal plate to form a coating film; and forming a metal-containing layer on at least a part of the coating film. The composition contains a solvent, and a polymer having a first terminal structure and a second terminal structure in a single molecule. Each of the first terminal structure and the second terminal structure is at least one selected from the group consisting of a structure represented by formula (1) and a structure represented by formula (2). A.sup.1 and A.sup.2 each independently represent a monovalent group having a functional group capable of forming a chemical bond with a metal atom. L.sup.2 represents —S—, —NR—, or —NA.sup.22-, wherein A.sup.22 represents a monovalent group having a functional group capable of forming a chemical bond with a metal atom. ##STR00001##

A method of producing a substrate includes: applying a composition on a metal basal plate to form a coating film; and forming a metal-containing layer on at least a part of the coating film. The composition contains a solvent, and a polymer having a first terminal structure and a second terminal structure in a single molecule. Each of the first terminal structure and the second terminal structure is at least one selected from the group consisting of a structure represented by formula (1) and a structure represented by formula (2). A.sup.1 and A.sup.2 each independently represent a monovalent group having a functional group capable of forming a chemical bond with a metal atom. L.sup.2 represents —S—, —NR—, or —NA.sup.22-, wherein A.sup.22 represents a monovalent group having a functional group capable of forming a chemical bond with a metal atom. ##STR00001##

Disclosed are a near-infrared absorbing composition, an optical structure, and a camera module and an electronic device including the same. The near-infrared absorbing composition includes a copper complex represented by Chemical Formula 1. ##STR00001##
Definitions of Chemical Formula 1 are the same as described in the detailed description.

Disclosed are a near-infrared absorbing composition, an optical structure, and a camera module and an electronic device including the same. The near-infrared absorbing composition includes a copper complex represented by Chemical Formula 1. ##STR00001##
Definitions of Chemical Formula 1 are the same as described in the detailed description.

The invention relates to a hydrogel based on vinyl caprolactam, with or without additional monomers, and at least two crosslinkers. The invention also relates to a method for obtaining said material and to the use thereof to culture cells/engineer cell monolayers, as well as supports for cell culture and transplant.