A conductive polymer formed by the photochemical condensation polymerization of polyacetylene. E,E,1,4-diiodobuta-1,4-diene ICH=CHCH+CHI (DIBD) in a crystalline urea inclusion compound is illuminated with low power broad spectrum pulsed UV visible radiation to form an irradiated DIBD urea inclusion compound that exhibits superconductivity and can be configured into an energy storage device that is rechargeable via magnetic induction. Altnernatively, (E,E,E)-1,6-diiodohexa-1,3-5-triene may be used as the guest monomer that is polymerized in the crystalline urea inclusion compound and the resulting polyacetylene urea composite crystal may be formed into a circuit for use as a superconductor.

The present invention relates to a preparation method of a highly aromatic hydrocarbon hydrogenated resin, comprising the processes of fraction cutting, pretreatment, catalytic polymerization, two-stage hydrogenation, etc. The highly aromatic hydrocarbon hydrogenated resin obtained by the present invention has excellent compatibility with elastomers such as SBS, SIS and the like, and is suitable for hot melt adhesives, coatings, rubber modification, etc.

The present invention relates to a preparation method of a highly aromatic hydrocarbon hydrogenated resin, comprising the processes of fraction cutting, pretreatment, catalytic polymerization, two-stage hydrogenation, etc. The highly aromatic hydrocarbon hydrogenated resin obtained by the present invention has excellent compatibility with elastomers such as SBS, SIS and the like, and is suitable for hot melt adhesives, coatings, rubber modification, etc.

A block copolymer is synthesized by polymerizing a silane-functionalized norbornene monomer in the presence of a catalyst system that includes a Ziegler-Natta catalyst and cocatalyst, followed by sequential addition and polymerization of a matrix-reactive functionalized norbornene monomer. In some embodiments, an enhanced substrate for a PCB is produced by applying the block copolymer to a substrate that includes glass fiber, followed by applying the base polymer to the substrate having the block copolymer applied thereto.

A resist composition which generates an acid through exposure and whose solubility in a developer changes by the action of an acid. The resist composition contains a polymer compound having at least two kinds of specific constituent units. A resist pattern forming method, including forming a resist film on a support using the resist composition, subjecting the resist film to exposure, and forming a resist pattern through patterning by developing the resist film having undergone exposure by using a developer.

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, which includes a polymeric compound having at least two specific structural units.

A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid, including a base material including a copolymer having a structural unit represented by general formula (a9-1) or a structural unit represented by general formula (a9-2), 30 mol % or more of a structural unit represented by general formula (a10-1) and 45 mol % or more of a structural unit having an acid-decomposable group which increases a polarity under the action of an acid. In each formula, Rs is a hydrogen atom or the like; Ya.sup.91 and Ya.sup.X1 are a single bond or a divalent linking group; R.sup.91 is a hydrocarbon group having 1 to 20 carbon atoms or the like; R.sup.92 is an oxygen atom or the like; j and n.sub.ax1 are integers of 1 to 3; Wa.sup.x1 is a (n.sub.ax1+1)-valent aromatic hydrocarbon group.

##STR00001##

An AB-type block copolymer for use in printed circuit board (PCB) fabrication is provided having a structure represented by the following formula: ##STR00001##
wherein R.sub.1 is a silane pendant group that includes a silicon-containing moiety capable of bonding to a glass surface, and wherein R.sub.2 is a matrix-reactive pendant group that includes at least one moiety (e.g., a vinyl-, allyl-, amine-, amide- or epoxy-containing moiety) capable of reacting with a base polymer.