The present invention relates to a preparation method of a highly aromatic hydrocarbon hydrogenated resin, comprising the processes of fraction cutting, pretreatment, catalytic polymerization, two-stage hydrogenation, etc. The highly aromatic hydrocarbon hydrogenated resin obtained by the present invention has excellent compatibility with elastomers such as SBS, SIS and the like, and is suitable for hot melt adhesives, coatings, rubber modification, etc.

The present invention relates to a preparation method of a highly aromatic hydrocarbon hydrogenated resin, comprising the processes of fraction cutting, pretreatment, catalytic polymerization, two-stage hydrogenation, etc. The highly aromatic hydrocarbon hydrogenated resin obtained by the present invention has excellent compatibility with elastomers such as SBS, SIS and the like, and is suitable for hot melt adhesives, coatings, rubber modification, etc.

The present disclosure provides copolymers comprising from about 0.5 wt % to about 25 wt % cyclic olefin content and films comprising the copolymers. In one embodiment, a copolymer includes a C.sub.2-C.sub.40 monomer content of from about 75 wt % to about 99.5 wt %; and a C.sub.5-C.sub.40 cyclic olefin comonomer content of from about 0.5 wt % to about 25 wt %. The copolymer has a density of about 0.91 g/cm.sup.3 to about 0.933 g/cm.sup.3. Films of the present disclosure can have advantageous mechanical properties (such as melt strength) and optical properties (such as haze %).

A polymer capable of securing pattern uniformity in a photoresist pattern, the polymer containing a photoacid generator by including a structure unit represented by Chemical Formula 1a; and a structure unit represented by Chemical Formula 1b as shown in the specification.

A polymer capable of securing pattern uniformity in a photoresist pattern, the polymer containing a photoacid generator by including a structure unit represented by Chemical Formula 1a; and a structure unit represented by Chemical Formula 1b as shown in the specification.

A resin composition contains a preliminary reaction product (A) obtained by previously reacting a polyphenylene ether compound (a1) having a hydroxyl group in a molecule and an acid anhydride (a2) having an acid anhydride group in a molecule, and a curable resin (B) containing a reactive compound having an unsaturated double bond in a molecule, in which an equivalent ratio of the acid anhydride group in the acid anhydride (a2) to the hydroxyl group in the polyphenylene ether compound (a1) is 1.5 or less, and a content of the curable resin (B) is 20 to 85 parts by mass with respect to 100 parts by mass of a sum of the preliminary reaction product (A) and the curable resin (B).

A resin composition contains a preliminary reaction product (A) obtained by previously reacting a polyphenylene ether compound (a1) having a hydroxyl group in a molecule and an acid anhydride (a2) having an acid anhydride group in a molecule, and a curable resin (B) containing a reactive compound having an unsaturated double bond in a molecule, in which an equivalent ratio of the acid anhydride group in the acid anhydride (a2) to the hydroxyl group in the polyphenylene ether compound (a1) is 1.5 or less, and a content of the curable resin (B) is 20 to 85 parts by mass with respect to 100 parts by mass of a sum of the preliminary reaction product (A) and the curable resin (B).

A polymer capable of securing pattern uniformity in a photoresist pattern, the polymer containing a photoacid generator by including a structure unit represented by Chemical Formula 1a; and a structure unit represented by Chemical Formula 1b as shown in the specification.

A polymer capable of securing pattern uniformity in a photoresist pattern, the polymer containing a photoacid generator by including a structure unit represented by Chemical Formula 1a; and a structure unit represented by Chemical Formula 1b as shown in the specification.

A conductive polymer formed by the photochemical condensation polymerization of polyacetylene. E,E,1,4-diiodobuta-1,4-diene ICH=CHCH+CHI (DIBD) in a crystalline urea inclusion compound is illuminated with low power broad spectrum pulsed UV visible radiation to form an irradiated DIBD urea inclusion compound that exhibits superconductivity and can be configured into an energy storage device that is rechargeable via magnetic induction. Altnernatively, (E,E,E)-1,6-diiodohexa-1,3-5-triene may be used as the guest monomer that is polymerized in the crystalline urea inclusion compound and the resulting polyacetylene urea composite crystal may be formed into a circuit for use as a superconductor.