Embodiments in accordance with the present invention encompass compositions comprising a long shelf stabilized organopalladium compound of formula (I) as described herein. The composition further contains a photoacid generator, a photosensitizer and one or more olefinic monomers as described herein. The shelf life of the compositions can further be extended by employing a stabilizer, such as for example, a hindered amine. The composition undergoes vinyl addition polymerization when it is exposed to a suitable actinic radiation to form a substantially transparent film or a three dimensional object. More specifically, the compositions of this invention are stable at room temperature for several days to several months and can also be stored at higher temperatures from about 40° C. to 60° C. for several days and undergo mass polymerization only when subjected to suitable actinic radiation. The monomers employed therein have a range of optical and mechanical properties, and thus these compositions can be tailored to form films and/or three dimensional objects having various opto-electronic properties. Accordingly, compositions of this invention are useful in various applications, including as coatings, encapsulants, fillers, leveling agents, sealants, adhesives, among others.

Embodiments in accordance with the present invention encompass compositions encompassing a procatalyst, a photoacid generator, a photosensitizer and one or more monomers which undergo vinyl addition polymerization when said composition is exposed to suitable UV irradiation and heated to a temperature from 50° C. to 100° C. to form a substantially transparent film. The monomers employed therein have a range of refractive index from 1.4 to 1.6 and thus these compositions can be tailored to form transparent films of varied refractive indices. Accordingly, compositions of this invention are useful in various opto-electronic applications, including as coatings, encapsulants, fillers, leveling agents, among others.

Recent progress in photoinitiated ring-opening metathesis polymerization (photo-ROMP) has enabled the lithographic production of patterned films from olefinic resins. The use of a latent ruthenium catalyst (e.g., HeatMet) in combination with a photosensitizer (e.g., 2-isopropylthioxanthone) to rapidly photopolymerize metathesis-monomers (e.g., dicyclopentadiene (DCPD)) upon irradiation with UV light has previously been demonstrated. See U.S. application Ser. No. 17/677,558. In addition to the exemplary catalysts and photosensitizers described in that work, a variety of alternative catalysts and photosensitizers are commercially available that allows for tuning of thermomechanical properties, potlifes, activation rates, and irradiation wavelengths. As an example, fourteen catalysts and eight photosensitizers were surveyed for the photo-ROMP of DCPD and the structure-activity relationships of the catalysts examined. Properties relevant to photopolymerization-based additive manufacturing—potlifes, printing irradiation dose, conversion—were characterized to develop catalyst and photosensitizer libraries. Two optimized catalyst/photosensitizer systems were demonstrated in the rapid stereolithographic printing of complex, multidimensional pDCPD structures with microscale features under ambient conditions.

Recent progress in photoinitiated ring-opening metathesis polymerization (photo-ROMP) has enabled the lithographic production of patterned films from olefinic resins. The use of a latent ruthenium catalyst (e.g., HeatMet) in combination with a photosensitizer (e.g., 2-isopropylthioxanthone) to rapidly photopolymerize metathesis-monomers (e.g., dicyclopentadiene (DCPD)) upon irradiation with UV light has previously been demonstrated. See U.S. application Ser. No. 17/677,558. In addition to the exemplary catalysts and photosensitizers described in that work, a variety of alternative catalysts and photosensitizers are commercially available that allows for tuning of thermomechanical properties, potlifes, activation rates, and irradiation wavelengths. As an example, fourteen catalysts and eight photosensitizers were surveyed for the photo-ROMP of DCPD and the structure-activity relationships of the catalysts examined. Properties relevant to photopolymerization-based additive manufacturing—potlifes, printing irradiation dose, conversion—were characterized to develop catalyst and photosensitizer libraries. Two optimized catalyst/photosensitizer systems were demonstrated in the rapid stereolithographic printing of complex, multidimensional pDCPD structures with microscale features under ambient conditions.

A composition is described comprising a ring opening metathesis polymerization catalyst or precatalyst thereof; and an unreactive dispersant having a viscosity at 25° C. of at least 10 Pa.Math.sec at a shear rate of 1 1/sec. Also described is a cartridge (e.g. or a dispensing and mixing apparatus) comprising such composition. The cartridge typically comprises a first chamber comprising unpolymerized cyclic olefin; and a second chamber comprising the catalyst and dispersant. Also described are compositions including two-part compositions and methods of bonding a substrate.

A composition is described comprising a ring opening metathesis polymerization catalyst or precatalyst thereof; and an unreactive dispersant having a viscosity at 25° C. of at least 10 Pa.Math.sec at a shear rate of 1 1/sec. Also described is a cartridge (e.g. or a dispensing and mixing apparatus) comprising such composition. The cartridge typically comprises a first chamber comprising unpolymerized cyclic olefin; and a second chamber comprising the catalyst and dispersant. Also described are compositions including two-part compositions and methods of bonding a substrate.

The present specification provides a compound, a photoresist composition comprising the same, a photoresist pattern comprising the same, and a method for preparing a photoresist pattern.

The present specification provides a compound, a photoresist composition comprising the same, a photoresist pattern comprising the same, and a method for preparing a photoresist pattern.

The present invention relates to a vertical alignment layer including a cyclic olefin copolymer, and more specifically, the present invention relates to a vertical alignment layer capable of having alignment even in a low temperature process, and exhibiting excellent liquid crystal vertical alignment by including a cyclic olefin copolymer having a specific substituent.

An oligomer, composition, and composite material employing the same are provided. The oligomer can be a reaction product of a reactant (a) and a reactant (b). The reactant (a) is a reaction product of a reactant (c) and a reactant (d). The reactant (b) can be

##STR00001##

or a combination thereof, wherein a is 0 or 1, and R.sup.1 is independently hydrogen

##STR00002##

or and wherein b is 0-6; c is 0 or 1; and, d is 0-6. The reactant (c) is

##STR00003##

wherein R.sup.2 is C.sub.5-10 alkyl group. The reactant (d) is

##STR00004##

wherein e is 0-10.