An amine-functionalized, crosslinked porous copolymer can be synthesized by linking 1,4-benzenediamine and pyrrole with p-formaldehyde in the presence of concentrated hydrochloric acid catalyst. The polymer is permanently microporous, with a BET surface area of 250 to 350 m.sup.2/g. Due to the high concentration of polar amines within its backbone, the polymer exhibits a CO.sub.2 uptake of 17.5 to 30 cm3/g at 298 K and 1 bar, but demonstrated a remarkably high selectivity for CO.sub.2 over N.sub.2 at 298 K. Dynamic breakthrough experiments indicate that this material is an effective adsorbent for selectively separating CO.sub.2 from a dry and wet gas mixture containing N.sub.2 for over 45 cycles without significant loss of performance. Furthermore, the polymer can be regenerated at room temperature after each cycle by a simple N.sub.2 flow.

The present invention relates generally to substrates for making polymers and methods for making polymers. The present invention also relates generally to polymers and devices comprising the same.

Polymer/carbon nanotube composites made up of melamine, aldehyde, diaminoalkane monomeric units and carbon nanotubes having activated carbonyl groups. A method for removing heavy metals, such as Pb(II) from an aqueous solution or an industrial wastewater sample with these composites is introduced. A process of synthesizing the polymer/carbon nanotube composites is also described.

Polymer/carbon nanotube composites made up of melamine, aldehyde, diaminoalkane monomeric units and carbon nanotubes having activated carbonyl groups. A method for removing heavy metals, such as Pb(II) from an aqueous solution or an industrial wastewater sample with these composites is introduced. A process of synthesizing the polymer/carbon nanotube composites is also described.

A use of dicyandiamide is provided as a modifier in a melamine-formaldehyde resin for use in a floor panel including a substrate and a top layer. The top layer defines an upper surface of the floor panel. The floor panel is provided with embossments extending from the upper surface, such that the thickness of the floor panel varies along a cross-section of the floor panel. The top layer has a modified melamine-formaldehyde resin including formaldehyde and melamine in an F/M molar ratio within the range of from 1.60 to 1.80, and at least one modifier, thereby providing a floor panel having improved transparency at the embossments.

A resist underlayer film-forming composition exhibiting high etching resistance, high heat resistance, and excellent coatability; a resist underlayer film obtained using the resist underlayer film-forming composition and a method for producing the same; a method for forming a resist pattern; and a method for producing a semiconductor device. A resist underlayer film-forming composition including a polymer and a compound represented by Formula (1) as a solvent.

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In Formula (1), R.sup.1, R.sup.2, and R.sup.3 in Formula (1) each independently represent a hydrogen atom or an alkyl group having 1 to 20 carbon atoms, which may be interrupted by an oxygen atom, a sulfur atom, or an amide bond, and R.sup.1, R.sup.2, and R.sup.3 may be the same or different and may bond to each other to form a ring structure.

Polymer/carbon nanotube composites made up of melamine, aldehyde, diaminoalkane monomeric units and carbon nanotubes having activated carbonyl groups. A method for removing heavy metals, such as Pb(II) from an aqueous solution or an industrial wastewater sample with these composites is introduced. A process of synthesizing the polymer/carbon nanotube composites is also described.

Polymer/carbon nanotube composites made up of melamine, aldehyde, diaminoalkane monomeric units and carbon nanotubes having activated carbonyl groups. A method for removing heavy metals, such as Pb(II) from an aqueous solution or an industrial wastewater sample with these composites is introduced. A process of synthesizing the polymer/carbon nanotube composites is also described.

A resist underlayer composition and a method of forming patterns, the composition including a solvent; and a polymer that includes a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2,

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A resist underlayer composition and a method of forming patterns, the composition including a solvent; and a polymer that includes a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2,

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