Carbon dioxide-reversibly-protected chain extension-crosslinking agents and a preparation method and use thereof are disclosed, The carbon dioxide-reversibly-protected chain extension-crosslinking agents have chemical structures represented by Formula I, Formula II, Formula III or Formula IV, wherein, n, m and p are integers, R is either OCH.sub.2CH(CH.sub.3) or OCH.sub.2CH.sub.2, 1≤n≤20, 1≤m≤10, and 1≤p≤10. ##STR00001##

Carbon dioxide-reversibly-protected chain extension-crosslinking agents and a preparation method and use thereof are disclosed, The carbon dioxide-reversibly-protected chain extension-crosslinking agents have chemical structures represented by Formula I, Formula II, Formula III or Formula IV, wherein, n, m and p are integers, R is either OCH.sub.2CH(CH.sub.3) or OCH.sub.2CH.sub.2, 1≤n≤20, 1≤m≤10, and 1≤p≤10. ##STR00001##

Carbon dioxide-reversibly-protected chain extension-crosslinking agents and a preparation method and use thereof are disclosed, The carbon dioxide-reversibly-protected chain extension-crosslinking agents have chemical structures represented by Formula I, Formula II, Formula III or Formula IV, wherein, n, m and p are integers, R is either OCH.sub.2CH(CH.sub.3) or OCH.sub.2CH.sub.2, 1≤n≤20, 1≤m≤10, and 1≤p≤10.

##STR00001##

Carbon dioxide-reversibly-protected chain extension-crosslinking agents and a preparation method and use thereof are disclosed, The carbon dioxide-reversibly-protected chain extension-crosslinking agents have chemical structures represented by Formula I, Formula II, Formula III or Formula IV, wherein, n, m and p are integers, R is either OCH.sub.2CH(CH.sub.3) or OCH.sub.2CH.sub.2, 1≤n≤20, 1≤m≤10, and 1≤p≤10.

##STR00001##

A liquid coating composition is disclosed that is prepared from a reaction mixture comprising an amine component comprising (a) an amine component comprising a polyamine complexed with CO.sub.2 and (b) a crosslinker, wherein the amine component is liquid at ambient conditions.

A chemical mechanical polishing pad is provided, comprising: a chemical mechanical polishing layer having a polishing surface; wherein the chemical mechanical polishing layer is formed by combining (a) a poly side (P) liquid component, comprising: an amine-carbon dioxide adduct; and, at least one of a polyol, a polyamine and a alcohol amine; and (b) an iso side (I) liquid component, comprising: polyfunctional isocyanate; wherein the chemical mechanical polishing layer has a porosity of 10 vol %; wherein the chemical mechanical polishing layer has a Shore D hardness of <40; and, wherein the polishing surface is adapted for polishing a substrate. Methods of making and using the same are also provided.

A foamed resin-forming composition for obtaining a polyurea-based resin foam, including a reaction product (A) of a cyclic polyamine compound (a1) and carbon dioxide, a polyisocyanate compound (B), and an aromatic polyamine compound (C), a polyurea-based resin foam obtained by foam molding the foamed resin-forming composition, and a method for producing a polyurea-based resin foam including foam molding the foamed resin-forming composition. A polyurea-based resin foam capable of reducing environmental impacts and having improved foamability can be obtained.