A polishing pad includes a polyurethane, wherein the polyurethane includes a fluorinated repeating unit represented by Formula 1, wherein the number of defects on a substrate after polishing with the polishing pad and a fumed silica slurry is 40 or less; ##STR00001## wherein R.sub.11 and R.sub.12 are each independently selected from the group consisting of hydrogen, C.sub.1-C.sub.10 alkyl groups, and fluorine, with the proviso that at least one of R.sub.11 and R.sub.12 is fluorine, L is a C.sub.1-C.sub.5 alkylene group or —O—, R.sub.13 and R.sub.14 are each independently selected from the group consisting of hydrogen, C.sub.1-C.sub.10 alkyl groups, and fluorine, with the proviso that at least one of R.sub.13 and R.sub.14 is fluorine, and n and m are each independently an integer from 0 to 20, with the proviso that n and m are not simultaneously 0.

A polishing pad includes a polyurethane, wherein the polyurethane includes a fluorinated repeating unit represented by Formula 1, wherein the number of defects on a substrate after polishing with the polishing pad and a fumed silica slurry is 40 or less; ##STR00001## wherein R.sub.11 and R.sub.12 are each independently selected from the group consisting of hydrogen, C.sub.1-C.sub.10 alkyl groups, and fluorine, with the proviso that at least one of R.sub.11 and R.sub.12 is fluorine, L is a C.sub.1-C.sub.5 alkylene group or —O—, R.sub.13 and R.sub.14 are each independently selected from the group consisting of hydrogen, C.sub.1-C.sub.10 alkyl groups, and fluorine, with the proviso that at least one of R.sub.13 and R.sub.14 is fluorine, and n and m are each independently an integer from 0 to 20, with the proviso that n and m are not simultaneously 0.

Modeling material formulations usable for forming a polyurea material in additive manufacturing, and methods for additive manufacturing of three-dimensional objects made of these formulations are provided. The modeling material formulation comprises at least one isocyanate-containing material and at least one amine-containing material such that at least one isocyanate-containing material comprises at least one polyisocyanate material and at least one amine-containing material comprises at least one aromatic polyamine material.

A polishing pad includes a polyurethane, wherein the polyurethane includes a fluorinated repeating unit represented by Formula 1, wherein the number of defects on a substrate after polishing with the polishing pad and a fumed silica slurry is 40 or less;

##STR00001## wherein R.sub.11 and R.sub.12 are each independently selected from the group consisting of hydrogen, C.sub.1-C.sub.10 alkyl groups, and fluorine, with the proviso that at least one of R.sub.11 and R.sub.12 is fluorine, L is a C.sub.1-C.sub.5 alkylene group or O, R.sub.13 and R.sub.14 are each independently selected from the group consisting of hydrogen, C.sub.1-C.sub.10 alkyl groups, and fluorine, with the proviso that at least one of R.sub.13 and R.sub.14 is fluorine, and n and m are each independently an integer from 0 to 20, with the proviso that n and m are not simultaneously 0.

A polishing pad includes a polyurethane, wherein the polyurethane includes a fluorinated repeating unit represented by Formula 1, wherein the number of defects on a substrate after polishing with the polishing pad and a fumed silica slurry is 40 or less;

##STR00001## wherein R.sub.11 and R.sub.12 are each independently selected from the group consisting of hydrogen, C.sub.1-C.sub.10 alkyl groups, and fluorine, with the proviso that at least one of R.sub.11 and R.sub.12 is fluorine, L is a C.sub.1-C.sub.5 alkylene group or O, R.sub.13 and R.sub.14 are each independently selected from the group consisting of hydrogen, C.sub.1-C.sub.10 alkyl groups, and fluorine, with the proviso that at least one of R.sub.13 and R.sub.14 is fluorine, and n and m are each independently an integer from 0 to 20, with the proviso that n and m are not simultaneously 0.

A method of manufacturing a polishing pad includes producing an urethane prepolymer having a viscosity of 20,000 cps (at 25 C.) to 40,000 cps (at 25 C.) by mixing a plurality of polymers, mixing the urethane prepolymer with an inert gas and a low-boiling blowing agent having a boiling point of 60 C. to 150 C., and manufacturing a polishing layer including porous pores by causing a mixture produced at the mixing to be subjected to gelation and curing in a predetermined cast.

A method of manufacturing a polishing pad includes producing an urethane prepolymer having a viscosity of 20,000 cps (at 25 C.) to 40,000 cps (at 25 C.) by mixing a plurality of polymers, mixing the urethane prepolymer with an inert gas and a low-boiling blowing agent having a boiling point of 60 C. to 150 C., and manufacturing a polishing layer including porous pores by causing a mixture produced at the mixing to be subjected to gelation and curing in a predetermined cast.

A shoe press roll cover for a machine for producing and/or finishing a fibrous web, such as a paper, card or tissue web, is formed of a matrix material composed of polyurethane, formed essentially from 4,4-MDI as isocyanate, at least one polyol and at least one crosslinker. The polyurethane matrix material is biobased to an extent of at least 20% by weight. The polyol and the crosslinker are selected from one of several combinations: a) biobased PTMEG as polyol and a mixture of MCDEA and PTMEG as crosslinker; b) polycarbonate as polyol and a mixture of MCDEA and biobased polycarbonate polyol as crosslinker; c) a mixture of biobased polycarbonate polyol and PTMEG as polyol and 1,4-BDO as crosslinker; d) PTMEG as polyol and a mixture of PTMEG and MCDEA as crosslinker, with the 4,4-MDI in the isocyanate and the PTMEG in the polyol being biobased.

A shoe press roll cover for a machine for producing and/or finishing a fibrous web, such as a paper, card or tissue web, is formed of a matrix material composed of polyurethane, formed essentially from 4,4-MDI as isocyanate, at least one polyol and at least one crosslinker. The polyurethane matrix material is biobased to an extent of at least 20% by weight. The polyol and the crosslinker are selected from one of several combinations: a) biobased PTMEG as polyol and a mixture of MCDEA and PTMEG as crosslinker; b) polycarbonate as polyol and a mixture of MCDEA and biobased polycarbonate polyol as crosslinker; c) a mixture of biobased polycarbonate polyol and PTMEG as polyol and 1,4-BDO as crosslinker; d) PTMEG as polyol and a mixture of PTMEG and MCDEA as crosslinker, with the 4,4-MDI in the isocyanate and the PTMEG in the polyol being biobased.

A method of manufacturing a polishing pad includes producing an urethane prepolymer having a viscosity of 20,000 cps (at 25 C.) to 40,000 cps (at 25 C.) by mixing a plurality of polymers, mixing the urethane prepolymer with an inert gas and a low-boiling blowing agent having a boiling point of 60 C. to 150 C., and manufacturing a polishing layer including porous pores by causing a mixture produced at the mixing to be subjected to gelation and curing in a predetermined cast.