Patent classifications
C08G2261/3326
NOVEL POLYFLUORENE-BASED IONOMER, ANION EXCHANGE MEMBRANE, METHOD FOR PREPARING THE POLYFLUORENE-BASED IONOMER AND METHOD FOR FABRICATING THE ANION EXCHANGE MEMBRANE
A novel polyfluorene-based ionomer, an anion exchange membrane, a method for preparing the polyfluorene-based ionomer, and a method for fabricating the anion exchange membrane are proposed. The polyfluorene-based ionomer contains no aryl ether bonds in the polymer backbone and includes piperidinium groups incorporated into the repeating units. The anion exchange membrane is fabricated from the polyfluorene-based ionomer. The anion exchange membrane has good thermal and chemical stability, excellent mechanical properties, and high ion conductivity. Due to these advantages, the anion exchange membrane can be applied as a membrane for an alkaline fuel cell and to a binder for an alkaline fuel cell or water electrolysis.
HARD MASK-FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT
A hard mask-forming composition which forms a hard mask used in lithography, including: a resin containing an aromatic ring and a polar group; and a compound containing at least one of an oxazine ring fused to an aromatic ring, and a fluorene ring.
Proton exchange membrane material and methods of making the same
Hydrocarbon proton exchange membranes are disclosed that are composed of a material including a hydrophobic main chain, and acidic side chains. The main chain includes a polyaryl structure that is substantially free of ether linkages and also includes a fluoromethyl substituted carbon. The acidic side chains include a hydrocarbon tether terminated by a strongly acidic group, such as a fluoroalkyl sulfonate group. Chemical stability of the material is increased by removing the ether linkages from the main chain. The hydrophobic main chain and substantially hydrophilic side chains create a phase-separated morphology that affords enhanced transport of protons and water across the membrane even at low relative humidity levels. These materials are advantageous as membranes for use in fuel cells, redox flow batteries, water hydrolysis systems, sensors, electrochemical hydrogen compressors, actuators, water purifiers, gas separators, etc.
Hard mask-forming composition and method for manufacturing electronic component
A hard mask-forming composition which forms a hard mask used in lithography, including: a resin containing an aromatic ring and a polar group; and a compound containing at least one of an oxazine ring fused to an aromatic ring, and a fluorene ring.
PATTERNED FILM STRUCTURE, PATTERNED FILM COMPOSITE STRUCTURE, METHOD OF SELECTIVE INHIBITION OF FORMATION OF ORGANIC FILM AND METHOD OF SELECTIVE ADJUSTMENT OF THICKNESS OF ORGANIC FILM
A patterned film structure consists of a substrate and of a patterned polymeric layer which selectively covers and exposes part of the surface of the substrate. The patterned polymeric layer is selected form at least one of an unsubstituted poly-para-xylylene and a substituted poly-para-xylylene.
POLYBENZOXAZINE PRECURSOR AND METHOD FOR PREPARING SAME
This invention relates to a polybenzoxazine precursor and a method of preparing the same, and more particularly, to a polybenzoxazine precursor which includes benzoxazine obtained by reacting a phenol novolak resin with an aldehyde compound and allylamine and diaminodiphenylmethane as an amine compound, and to a method of preparing the same. The polybenzoxazine precursor may serve to prepare a hardened material having excellent thermal and electrical characteristics and dimensional stability. Accordingly, the polybenzoxazine precursor may be available for use in a copper clad laminate, a semiconductor encapsulant, a printed circuit board, an adhesive, a paint, and a mold.
ANIONIC ELECTROCHEMICAL COMPRESSOR AND REFRIGERATION SYSTEM EMPLOYING SAME
An electrochemical compressor utilizes an anion conducting layer disposed between an anode and a cathode for transporting a working fluid. The working fluid may include carbon dioxide that is dissolved in water and is partially converted to carbonic acid that is equilibrium with bicarbonate anion. An electrical potential across the anode and cathode creates a pH gradient that drives the bicarbonate anion across the anion conducting layer to the cathode, wherein it is reformed into carbon dioxide. Therefore, carbon dioxide is pumped across the anion conducting layer. The compressor may be part of a refrigeration system that pumps the working fluid in a closed loop through a condenser and an evaporator.
Hard-mask forming composition and method for manufacturing electronic component
A hard-mask forming composition, which is used for forming a hard mask used in lithography, including a first resin and a second resin, in which an amount of carbon contained in the first resin is 85% by mass or more with respect to the total mass of all elements constituting the first resin, and the amount of carbon contained in the second resin is 70% by mass or more with respect to the total mass of all elements constituting the second resin and less than the amount of carbon contained in the first resin.
ANION EXCHANGE POLYMERS AND ANION EXCHANGE MEMBRANES INCORPORATING SAME
An anion exchange membrane is made by mixing 2 trifluoroMethyl Ketone [nominal] (1.12 g, 4.53 mmol), 1 BiPhenyl (0.70 g, 4.53 mmol), methylene chloride (3.0 mL). trifluoromethanesulfonic acid (TFSA) (3.0 mL) to produce a pre-polymer. The pre-polymer is then functionalized to produce an anion exchange polymer. The pre-polymer may be functionalized with trimethylamamine in solution with water. The pre-polymer may be imbibed into a porous scaffold material, such as expanded polytetrafluoroethylene to produce a composite anion exchange membrane.
Polymer, organic layer composition, and method of forming patterns
Disclosed are a polymer including a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2, an organic layer composition including the polymer, and a method of forming patterns using the organic layer composition. ##STR00001## The Chemical Formulae 1 and 2 are the same as defined in the specification.