C08G2261/3424

COATING METHOD OF IMPLANT USING PARYLENE
20230053155 · 2023-02-16 · ·

The present disclosure relates to a coating method of implant using parylene, for coating a surface of a dental implant, including a pretreating step of pretreating the implant; and a coating step of coating a surface of the pretreated implant with a coating material to form a polymer coating layer, wherein the coating material is provided as parylene.

According to the present disclosure, a parylene thin film may be uniformly coated on the surface of the dental implant, and according to such a thin film, the growth of anaerobic bacteria can be effectively inhibited in spaces where the fixture and the upper structure of the dental implant are joined to each other, and where the upper structure and the crown are joined to each other.

COMPOSITE COATING AND FABRICATION METHOD THEREOF
20230027265 · 2023-01-26 ·

The present disclosure provides a composite coating and a method for fabricating the composite coating. The composite coating comprises a polymer layer, a metal interlayer and an amorphous metal coating. The polymer layer is formed on a substrate and acts as a diffusion barrier layer, which is thick and dense enough to prevent the corrosive substances from penetrating into the substrate. The metal interlayer is formed between the polymer layer and the amorphous metal coating for improving the adhesion of the amorphous metal coating to the substrate.

FLUORINATED AROMATIC POLYMER AND METHOD FOR PRODUCING SAME

The present invention addresses the problem of providing a fluorine-containing aromatic polymer; a method for producing the fluorine-containing aromatic polymer; etc. The problem can be solved by: a polymer having a monomer unit represented by formula (1) (wherein R.sup.1 in each occurrence is independently a halogen atom, NR.sup.11R.sup.12 (wherein R.sup.11 and R.sup.12 are independently a hydrogen atom or an organic group), or an organic group; n1 is an integer of 0 to 4; two R.sup.1s that can be present in the ortho-positions may form a ring together with two carbon atoms on the adjacent benzene ring, wherein the formed ring may have an organic group as a substituent; and L.sup.1 is a single bond, an oxygen atom, a sulfur atom, -L.sup.11-O—, —O-L.sup.12-O—, -L.sup.13-S—, or —S-L.sup.14-S— (wherein L.sup.11 to L.sup.14 are each independently an alkylene group optionally having one or more substituents); etc.

HIGH-PERFORMANCE LADDER POLYMERS FOR MEMBRANE GAS SEPARATION

Disclosed herein are ladder polymers comprising fused aromatic and non-aromatic rings. Also disclosed are the manufacture and use of these ladder polymers, e.g., in separation membranes, such as membrane for gas separation.

Solvent-linked porous covalent organic polymers and method of preparing the same

Solvent-linked porous covalent organic polymers (COPs) and a method of preparing the same are described. The porous covalent organic polymers are linked by a solvent and are thus suitable for the transportation and storage of natural gas. A method of preparing the porous covalent organic polymers by conducting alkylation polymerization between an aromatic monomer and a chlorine-based solvent in the presence of a Lewis acid catalyst is described. Porous stretchable covalent organic polymers having pores with various sizes can be synthesized simply and quickly at room temperature and atmospheric pressure without a heating or purification step. The covalent organic polymers have very high natural gas storage capacity due to the flexible porous network structure thereof and thus are suitable for storage and transportation of natural gas and useful as a natural gas adsorbent.

LIGHT-EMITTING COMPOSITION
20220380523 · 2022-12-01 · ·

A light-emitting composition comprising: a light-emitting group and a polymer comprising: a repeat unit of formula Ar.sup.1 wherein Ar.sup.1 is an arylene repeat unit which is unsubstituted or substituted with one or more substituents; and a repeat unit of formula (I): (I) wherein Ar.sup.2 and Ar.sup.3 each independently represent a C.sub.6-20 arylene group or a 5-20 membered heteroarylene group which is unsubstituted or substituted with one or more substituents and CB represents a conjugation-breaking group which does not provide a conjugation path between Ar.sup.2 and Ar.sup.3; wherein the polymer has a solubility in water or a C.sub.1-8 alcohol at 20° C. of at least 0.1 mg/ml. The composition may be a light-emitting polymer in which the polymer contains the light-emitting group. The light-emitting composition may be part of a particle containing the polymer and a matrix material, e.g. silica. The light-emitting composition may be used in an assay for detection of a target analyte.

Resist underlayer film forming composition using a fluorene compound

Provided are: a resist underlayer film formation composition combining high etching resistance, high heat resistance, and excellent coating properties; a resist underlayer film in which the resist underlayer film formation composition is used and a method for manufacturing the resist underlayer film; a method for forming a resist pattern; and a method for manufacturing a semiconductor device. The resist underlayer film formation composition is characterized by including the compound represented by Formula (1), or a polymer derived from the compound represented by Formula (1) (where: AA represents a single bond or a double bond; X.sup.1 represents —N(R.sup.1)—; X.sup.2 represents —N(R.sup.2)—; X.sup.3 represents —CH(R.sup.3)—; X.sup.4 represents —CH(R.sup.4)— etc.; R.sup.1, R.sup.2, R.sup.3, and R.sup.4 represent hydrogen atoms, C1-20 straight chain, branched, or cyclic alkyl groups, etc.; R.sup.5, R.sup.6, R.sup.9, and R.sup.10 represent hydrogen atoms, hydroxy groups, alkyl groups, etc.; R.sup.7 and R.sup.8 represent benzene rings or naphthalene rings; and n and o are 0 or 1). A semiconductor device is manufactured by: coating the composition on a semiconductor substrate, firing the coated composition, and forming a resist underlayer film; forming a resist film thereon with an inorganic resist underlayer film interposed therebetween selectively as desired; forming a resist pattern by irradiating light or electron radiation and developing; etching the underlayer film using the resist pattern; and processing the semiconductor substrate using the patterned underlayer film.

Tackifier for Elastomer Compounds
20230095190 · 2023-03-30 ·

A low molar mass polymeric hydrocarbon tackifier having a number average molar mass Mn of from 200 to 1,500 g/mol provides increased green tack stability over an extended period of time in rubber compounds.

GLASS-FIBRE TEXTILE STRUCTURE WITH PARYLENE COATING

The invention relates to a glass-fiber textile structure, characterized in that it has a parylene (poly(para-xylylene)) coating with a thickness of between 5 μm and 30 μm, preferably between 6 μm and 25 μm, in particular between 7 and 20 μm. The invention also relates to a method for reinforcing a solid material, which comprises introducing such a textile structure having a parylene coating into a fluid base material, preferably a base material comprising water and a hydraulic binder, and curing the base material.

TWIN-MONOMER COMPOSITION AND DIELECTRIC FILM THEREOF

A composition comprising a monomer of the general formula (M1) wherein M is a metal or semimetal of main group 3 or 4 of the periodic table; X.sup.M1, X.sup.M2 are each O; R.sup.M1, R.sup.M2 are the same or different and are each an —CR.sup.aR.sup.b—Ar—O—R.sup.c; Ar is a C.sub.6 to C.sub.30 carbocyclic ring system; R.sup.a, R.sup.b are the same or different and are each H or C.sub.1 to C.sub.6 alkyl; R.sup.c is C.sub.1-C.sub.22-alkyl, benzyl or phenyl; q according to the valency and charge of M is 0 or 1; X.sup.M3, X.sup.M4 are the same or different and are each O, C.sub.6 to C.sub.10 aryl, or —CH.sub.2—; R.sup.M3, R.sup.M4 are the same or different and are each R.sup.M1, H, C.sub.1-C.sub.22 alkyl, or a polymer selected from a polyalkylene, a polysiloxane, or a polyether.

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