The present application relates to a block copolymer and its use. The present application can provides a block copolymer that has an excellent self assembling property or phase separation property and therefore can be used in various applications and its use.

The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof.

The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof.

The present invention relates to a one-step process for preparation of “in-situ” or “ex-situ” self-organized and electrically conducting polymer nanocomposites using thermally initiated polymerization of a halogenated 3,4-ethylenedioxythiophene monomer or its derivatives. This approach does not require additional polymerization initiators or catalysts, produce gaseous products that are naturally removed without affecting the polymer matrix, and do not leave by-product contaminants. It is demonstrated that self-polymerization of halogenated 3,4-ethylenedioxythiophene monomer is not affected by the presence of a solid-state phase in the form of nanoparticles and results in formation of 3,4-polyethylenedioxythiophene (PEDOT) nanocomposites.

The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.

The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.

The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, and can be provided with a variety of required functions without constraint.

The present application relates to a monomer, a method for preparing a block copolymer, a block copolymer, and uses thereof. Each monomer of the present application exhibits an excellent self-assembling property and is capable of forming a block copolymer to which a variety of required functions are granted as necessary without constraint.

Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.

The present invention discloses a terpolymer based on 2,5-bis(2-thienyl)thiazolo[5,4-d]thiazolyl. In the invention, by introducing 2,5-bis(2-thienyl)thiazolo[5,4-d]thiazole units, the conjugated length of the polymers is enlarged and the aggregation in solution becomes weak. The introducing of 2,5-bis(2-thienyl)thiazolo[5,4-d]thiazole unit can easily tune the photophysical properties and the aggregation structure of the terploymers, and the terpolymers show excellent photovoltaic performance. The terpolymers have the following general formula:

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