A resin has a structure defined by Formula (I)

##STR00001##

wherein: (a) each R.sub.5 is independently a methylene group (CH.sub.2), or a methylene group substituted with one or more —H, —CH.sub.3, or halogen functionalities; (b) each R.sub.6 is independently a bond or a straight-chain or branched, linear or cyclic, saturated or unsaturated, substituted or unsubstituted, aliphatic or aromatic group having between 1 and 2 carbon atoms; (c) each X is independently a functionality possessing at least one non-aromatic alkene or alkyne moiety; (d) each Z is independently either H or X; (e) each Z is independently either H or X, and each p is independently an integer from 1-4; (f) each w is independently 0, or an integer greater than or equal to 1, and (i) when w is 0, the bracket region represents a bond and n is 0, or an integer greater than or equal to 1; and (ii) when n is 0, the bracket region represents a bond. The resin is especially well suited for use in a base station, circuit board, server, router, radome or satellite structure, as well as such processes as digital light printing (DLP), continuous liquid interface printing (CLIP), and Stereolithography (SL).

The present disclosure relates to synthesis of porous polymer networks and applications of such materials. The present disclosure relates to a method of fabricating of a porous polymer network comprising: (a) providing: (i) a first reactant comprising a plurality of compounds comprising at least one acetyl group, said plurality of compounds comprising at least one compound type, and (ii) a second reactant comprising an alkylsulfonic acid, and (b) creating a solution of said reactants, (c) casting said solution in a form, and (d) treating said solution under such conditions so as to produce a porous polymer network. In one embodiment, the invention relates to a porous polymer network which has a basic structure selected from the group consisting of ##STR00001##

The present disclosure relates to a composition that includes ##STR00001##
where R.sub.1 and R.sub.2 include at least one of a hydrogen, a hydroxyl group, and/or an alkyl group, R.sub.3 and R.sub.4 include at least one of hydrogen, a hydroxyl group, an alkyl group, and/or a ketone, and 1≤n≤2000.

A high selectivity and high CO.sub.2 plasticization resistant polymer comprises a plurality of repeating units of formula (I) for gas separation applications. The polymer may be synthesized from a superacid catalyzed poly(hydroalkylation) reaction.

##STR00001##

Membranes made from the polymer and gas separation processes using the membranes made from the polymer are also described.

Methods of forming a porphene polymeric material are provided. The resulting material can be a porphene or a metalloporphene polymeric material. The structure of the polymer can be selected based on a material provided in the monomer material. Methods of using the polymeric material are also provided.

The present disclosure relates to a carbazole-based anion exchange material, a preparation method therefor and use thereof, and more particularly, to an anion exchange material used in membranes for water electrolysis, redox flow batteries, fuel cells, carbon dioxide reduction, electrochemical ammonia production and decomposition, electrodialysis (ED), reverse electrodialysis (RED) or capacitive deionization (CDI), a separator comprising the same, a preparation method therefor and use thereof. According to the present disclosure, it is possible to prepare a separation membrane with improved mechanical and chemical stability and durability by remarkably improving the molecular weight together with solubility in solvent by providing the anion exchange material in which all bonds between monomers in the main chain are C—C bonds based on the carbazole-based material with high stability.

A copolymer, poly(thiophene-co-benzothiophene-co-dibenzothiophene), and method of preparation thereof. The copolymer, poly(thiophene-co-benzothiophene-co-dibenzothiophene), having a formula (I):

##STR00001##

wherein x=H or R, y=H or R, z=H or R, and n=500-58000, wherein R is selected from alkyl or alicyclic chain substituents, and Ar is an aromatic ring.

A resin has a structure defined by Formula (I) ##STR00001## wherein: (a) each R.sub.5 is independently a methylene group (CH.sub.2), or a methylene group substituted with one or more —H, —CH.sub.3, or halogen functionalities; (b) each R.sub.6 is independently a bond or a straight-chain or branched, linear or cyclic, saturated or unsaturated, substituted or unsubstituted, aliphatic or aromatic group having between 1 and 2 carbon atoms; (c) each X is independently a functionality possessing at least one non-aromatic alkene or alkyne moiety; (d) each Z is independently either H or X; (e) each Z is independently either H or X, and each p is independently an integer from 1-4; (f) each w is independently 0, or an integer greater than or equal to 1, and (i) when w is 0, the bracket region represents a bond and n is 0, or an integer greater than or equal to 1; and (ii) when n is 0, the bracket region represents a bond. The resin is especially well suited for use in a base station, circuit board, server, router, radome or satellite structure, as well as such processes as digital light printing (DLP), continuous liquid interface printing (CLIP), and Stereolithography (SL).

Provided is production of a resin film excellent in all of the folding resistance, the low water-absorption property, and the heat resistance. A resin film formed of a resin containing an alicyclic structure-containing polymer having crystallizability, the resin film having a folding endurance of 2,000 times or more, a water-absorption rate of 0.1% or less, and a heat-resistant temperature of 180° C. or higher; a resin film formed of a resin containing an alicyclic structure-containing polymer having crystallizability, the resin film having a crystallinity degree of the alicyclic structure-containing polymer of 10% or more, a folding endurance of 2,000 times or more, and a water-absorption rate of 0.1% or less, and a smooth surface; and production method thereof.

The present application relates to a block copolymer and its use. The present application can provides a block copolymer that has an excellent self assembling property or phase separation property and therefore can be used in various applications and its use.