Patent classifications
C08G2261/57
COMPOUND FOR USES IN OPTICAL AND ELECTROOPTICAL DEVICES
A compound having the following formula:
##STR00001##
which can also be embedded into a conjugated oligomeric of polymeric backbone, is proposed for optical and electro optical applications.
SCRATCH-RESISTANT AND OPTICALLY TRANSPARENT MATERIALS AND ARTICLES
Embodiments of a scratch-resistant and optically transparent material comprising silicon, aluminum, nitrogen, and optionally oxygen are disclosed. In one or more embodiments, the material exhibits an extinction coefficient (k) at a wavelength of 400 nm of less than about 1×10.sup.−3, and an average transmittance of about 80% or greater, over an optical wavelength regime in the range from about 380 nm to about 780 nm, as measured through the material having a thickness of about 0.4 micrometer. In one or more embodiments, the material comprises an intrinsic maximum hardness of about 12 GPa or greater as measured on a major surface of the material having a thickness of about 400 by a Berkovich Indenter Hardness Test along an indentation depth of about 100 nm or greater, low compressive stress and low roughness (Ra). Articles and devices incorporating the material are also disclosed.
Scratch-resistant and optically transparent materials and articles
Embodiments of a scratch-resistant and optically transparent material comprising silicon, aluminum, nitrogen, and optionally oxygen are disclosed. In one or more embodiments, the material exhibits an extinction coefficient (k) at a wavelength of 400 nm of less than about 1×10.sup.−3, and an average transmittance of about 80% or greater, over an optical wavelength regime in the range from about 380 nm to about 780 nm, as measured through the material having a thickness of about 0.4 micrometer. In one or more embodiments, the material comprises an intrinsic maximum hardness of about 12 GPa or greater as measured on a major surface of the material having a thickness of about 400 by a Berkovich Indenter Hardness Test along an indentation depth of about 100 nm or greater, low compressive stress and low roughness (Ra). Articles and devices incorporating the material are also disclosed.
RESIN COMPOSITION, MOLDED BODY, OPTICAL LENS, AND OPTICAL LENS UNIT
Provided is an optical resin composition for lenses that contains a resin having a structural unit represented by formula (1), and a binaphthalene compound and/or a binaphthalene compound oligomer having a structural unit represented by formula (2). A, p, K.sub.1, K.sub.2, Z, and q in formula (1) are as described in the present specification. R.sub.1-R.sub.10, a, and b in formula (2) are as described in the present specification.
##STR00001##
PHASE CONTRAST FILM AND PRODUCTION METHOD THEREFOR
A phase difference film formed of a resin containing a polymer having crystallizability, wherein: a coefficient of variation CV(Re) of an in-plane retardation of the phase difference film at a measurement wavelength of 590 nm is 1.0% or less.
SCRATCH-RESISTANT AND OPTICALLY TRANSPARENT MATERIALS AND ARTICLES
Embodiments of a scratch-resistant and optically transparent material comprising silicon, aluminum, nitrogen, and optionally oxygen are disclosed. In one or more embodiments, the material exhibits an extinction coefficient (k) at a wavelength of 400 nm of less than about 110.sup.3, and an average transmittance of about 80% or greater, over an optical wavelength regime in the range from about 380 nm to about 780 nm, as measured through the material having a thickness of about 0.4 micrometer. In one or more embodiments, the material comprises an intrinsic maximum hardness of about 12 GPa or greater as measured on a major surface of the material having a thickness of about 400 by a Berkovich Indenter Hardness Test along an indentation depth of about 100 nm or greater, low compressive stress and low roughness (Ra). Articles and devices incorporating the material are also disclosed.
Scratch-resistant and optically transparent materials and articles
Embodiments of a scratch-resistant and optically transparent material comprising silicon, aluminum, nitrogen, and optionally oxygen are disclosed. In one or more embodiments, the material exhibits an extinction coefficient (k) at a wavelength of 400 nm of less than about 110.sup.3, and an average transmittance of about 80% or greater, over an optical wavelength regime in the range from about 380 nm to about 780 nm, as measured through the material having a thickness of about 0.4 micrometer. In one or more embodiments, the material comprises an intrinsic maximum hardness of about 12 GPa or greater as measured on a major surface of the material having a thickness of about 400 by a Berkovich Indenter Hardness Test along an indentation depth of about 100 nm or greater, low compressive stress and low roughness (Ra). Articles and devices incorporating the material are also disclosed.
Compound for uses in optical and electrooptical devices
A compound having the following formula: ##STR00001##
which can also be embedded into a conjugated oligomeric of polymeric backbone, is proposed for optical and electro optical applications.
Resin composition, molded body, optical lens, and optical lens unit
Provided is an optical resin composition for lenses that contains a resin having a structural unit represented by formula (1), and a binaphthalene compound and/or a binaphthalene compound oligomer having a structural unit represented by formula (2). A, p, K.sub.1, K.sub.2, Z, and q in formula (1) are as described in the present specification. R.sub.1-R.sub.10, a, and b in formula (2) are as described in the present specification. ##STR00001##
RECORDING MEDIUM, METHOD FOR RECORDING INFORMATION, AND METHOD FOR READING INFORMATION
A recording medium of an aspect of the present disclosure includes a recording layer containing a polymer P. The polymer P contains a group G having nonlinear light absorption characteristics and has a glass transition temperature of higher than or equal to 200 C. A method for recording information of an aspect of the present disclosure includes preparing a light source emitting light having a wavelength of longer than or equal to 390 nm and shorter than or equal to 420 nm and focusing the light from the light source and applying the light to the recording layer of the recording medium.