The present invention addresses the problem of providing a fluorine-containing aromatic polymer; a method for producing the fluorine-containing aromatic polymer; etc. The problem can be solved by: a polymer having a monomer unit represented by formula (1) (wherein R.sup.1 in each occurrence is independently a halogen atom, NR.sup.11R.sup.12 (wherein R.sup.11 and R.sup.12 are independently a hydrogen atom or an organic group), or an organic group; n1 is an integer of 0 to 4; two R.sup.1s that can be present in the ortho-positions may form a ring together with two carbon atoms on the adjacent benzene ring, wherein the formed ring may have an organic group as a substituent; and L.sup.1 is a single bond, an oxygen atom, a sulfur atom, -L.sup.11-O—, —O-L.sup.12-O—, -L.sup.13-S—, or —S-L.sup.14-S— (wherein L.sup.11 to L.sup.14 are each independently an alkylene group optionally having one or more substituents); etc.

A process for manufacturing an aromatic diether, including the reaction of a compound A including at least two halogenated aromatic groups with a compound B, B being an aromatic alkoxide, optionally in the presence of a compound C acting as reaction solvent, the molar proportion of compound B to compound A being at least 2:1 and the molar amount of compound C to compound A being, where appropriate, not more than 10:1. Also, a process for manufacturing a polyaryl ether ketone.

The present invention addresses the problem of providing a fluorine-containing aromatic polymer; a method for producing the fluorine-containing aromatic polymer; etc. The problem can be solved by: a polymer having a monomer unit represented by formula (1) (wherein R.sup.1 in each occurrence is independently a halogen atom, NR.sup.11R.sup.12 (wherein R.sup.11 and R.sup.12 are independently a hydrogen atom or an organic group), or an organic group; n1 is an integer of 0 to 4; two R.sup.1s that can be present in the ortho-positions may form a ring together with two carbon atoms on the adjacent benzene ring, wherein the formed ring may have an organic group as a substituent; and L.sup.1 is a single bond, an oxygen atom, a sulfur atom, -L.sup.11-O—, —O-L.sup.12-O—, -L.sup.13-S—, or —S-L.sup.14-S— (wherein L.sup.11 to L.sup.14 are each independently an alkylene group optionally having one or more substituents); etc.

A resist underlayer film forming composition capable of forming a flat film that exhibits high etching resistance, a good dry etching rate ratio and a good optical constant, while having good coverage even with respect to a so-called multileveled substrate and having a small difference in the film thickness after embedding. Also, a method for producing a polymer that is suitable for the resist underlayer film forming composition; a resist underlayer film which uses the resist underlayer film forming composition; and a method for producing a semiconductor device. This resist underlayer film forming composition contains: a reaction product of an aromatic compound (A) that has from 6 to 120 carbon atoms, and a compound that is represented by formula (1); and a solvent.

A method for forming a polyaryletherketone is described. More particularly, a reaction mixture is initially supplied to the reactor vessel that contains one or more precursor monomers. A heteroaryl compound is also added to the reaction mixture. The reaction can be carried out according to, e.g., an electrophilic aromatic substitution reaction or a nucleophilic aromatic substitution reaction. The heteroaryl compound can serve as a dispersant to the polymer as it is formed. This minimizes the likelihood of gelling of the product polymer within the reactor vessel and limits the impact of process disruptions on the production of the polyaryletherketone.

A crosslinked resin made up of polymerized units of a linear polyamine with at least 3 primary and/or secondary amine functionalities and a bisacrylamide. The crosslinked polymers are porous spherical particles with a BET surface area in the range of 50-120 m.sup.2/g. A method of the synthesizing the crosslinked polymer is specified. A method for using the crosslinked resin as an adsorbent material in removing pollutants including organic dyes (e.g. Congo red, Rhodamine B) and heavy metals from an aqueous solution or an industrial wastewater sample is also described.

Aspects of the present disclosure generally describe polyarylether ketones and methods of use. In some aspects, a composition includes one or more polymers of formulae (I), (II), or (III):

##STR00001##

Aspects of the present disclosure generally describe polyarylether ketones and methods of use. In some aspects, a composition includes one or more polymers of formula (IV):

##STR00001##

The present disclosure provides a process for producing a polymer, said process comprising polymerising a monomer system comprising a compound of formula: Ar—O—Ar—C(═O)—X—C(═O)—Ar—O—Ar in a reaction medium comprising a Lewis acid where: X is an aliphatic moiety and Ar is an aromatic moiety.

A method for manufacturing 1,4-bis(4-phenoxybenzoyl)benzene, including: reacting terephthaloyl chloride with diphenyl ether in a reaction solvent and in the presence of a Lewis acid, so as to obtain a product mixture including a 1,4-bis(4-phenoxybenzoyl)benzene-Lewis acid complex; contacting the product mixture with an aqueous solution, so as to obtain an aqueous phase containing the Lewis acid and an organic phase containing 1,4-bis(4-phenoxybenzoyl)benzene; heating at least the second phase up to a maximum temperature, followed by cooling the second phase down to a separation temperature; subjecting at least the second phase to a solid/liquid separation step at the separation temperature, so as to recover solid 1,4-bis(4-phenoxybenzoyl)benzene.